Aki Fujimura

409 citations
55 papers · 304 · h-index 11

Impact in

Papers in

Aki Fujimura

45 papers receiving 226 citations

Peers

Aki Fujimura
Comparison fields: 5 of 53
  • Industrial and Manufacturing Engineering 60
  • Surfaces, Coatings and Films 38
  • Electrical and Electronic Engineering 234
  • Media Technology 33
  • Computer Graphics and Computer-Aided Design 13
Replace Zheng Shi with:
Zheng Shi China
Jeong-Taek Kong South Korea
Yabin Ye Germany
Deqiang Cheng China
Bansibadan Maji India
Kun Yuan United States
Hong-Shin Jun South Korea
Валерий Семенец Ukraine
Maosen Li China
Katsuhiro Ota Japan
Aki Fujimura relative to Zheng Shi China Zheng Shi's profile →
Citations per field
00.5×10×13×
Zheng Shi · 1×
Citations per year

Countries citing papers authored by Aki Fujimura

Since Specialization
Citations

This map shows the geographic impact of Aki Fujimura's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Aki Fujimura with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Aki Fujimura more than expected).

Fields of papers citing papers by Aki Fujimura

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Aki Fujimura. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Aki Fujimura. The network helps show where Aki Fujimura may publish in the future.

Co-authors

The 25 scholars most cited alongside Aki Fujimura, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Aki Fujimura Line = papers co-authored together Aki Fujimura links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown

Showing the 20 most-cited of 55 papers — load more, or switch the sort, to bring in the rest.

#Work
1 200131
2 200523
3 201920
4 201917
5 201015
6 201114
7 201014
8 201011
9 202111
10 200510
11 201910
12 20109
13 20109
14 20179
15 20208
16 20206
17 20166
18 20205
19 20245
20 20175

About Aki Fujimura

Aki Fujimura is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering, Surfaces, Coatings and Films, Industrial and Manufacturing Engineering and Media Technology, having authored 55 papers that have together received 304 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (38 papers), Electron and X-Ray Spectroscopy Techniques (14 papers), Industrial Vision Systems and Defect Detection (9 papers), Integrated Circuits and Semiconductor Failure Analysis (9 papers), Nanofabrication and Lithography Techniques (7 papers), 3D IC and TSV technologies (6 papers), Image Processing Techniques and Applications (5 papers) and Advanced Surface Polishing Techniques (5 papers). The work is most often cited by research in Industrial and Manufacturing Engineering (60 citations), Surfaces, Coatings and Films (38 citations), Electrical and Electronic Engineering (234 citations), Media Technology (33 citations) and Computer Graphics and Computer-Aided Design (13 citations). Aki Fujimura has collaborated with scholars based in United States, Japan and Taiwan. Frequent co-authors include Linyong Pang, P. Jeffrey Ungar, Shosuke Kojo, Bo Su, David Kim, John S. Petersen, M. Igarashi, Takashi Kamikubo, Song Li and Tom Cecil. Their work appears in journals such as Journal of Micro/Nanolithography MEMS and MOEMS, Software Quality Journal, IEEE Transactions on Semiconductor Manufacturing, Journal of Agricultural and Food Chemistry and 2002 IEEE International Solid-State Circuits Conference. Digest of Technical Papers (Cat. No.02CH37315).

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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