Aki Fujimura

409 total citations
55 papers, 304 citations indexed

About

Aki Fujimura is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films. According to data from OpenAlex, Aki Fujimura has authored 55 papers receiving a total of 304 indexed citations (citations by other indexed papers that have themselves been cited), including 41 papers in Electrical and Electronic Engineering, 15 papers in Biomedical Engineering and 14 papers in Surfaces, Coatings and Films. Recurrent topics in Aki Fujimura's work include Advancements in Photolithography Techniques (38 papers), Electron and X-Ray Spectroscopy Techniques (14 papers) and Integrated Circuits and Semiconductor Failure Analysis (9 papers). Aki Fujimura is often cited by papers focused on Advancements in Photolithography Techniques (38 papers), Electron and X-Ray Spectroscopy Techniques (14 papers) and Integrated Circuits and Semiconductor Failure Analysis (9 papers). Aki Fujimura collaborates with scholars based in United States, Japan and Spain. Aki Fujimura's co-authors include Linyong Pang, P. Jeffrey Ungar, Bo Su, Shosuke Kojo, David Kim, John S. Petersen, M. Igarashi, Tom Cecil, E. Vidal Russell and Tam H. Nguyen and has published in prestigious journals such as Journal of Agricultural and Food Chemistry, IEEE Transactions on Semiconductor Manufacturing and Software Quality Journal.

In The Last Decade

Aki Fujimura

45 papers receiving 226 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Aki Fujimura United States 11 234 80 60 42 38 55 304
Jeong-Taek Kong South Korea 12 375 1.6× 81 1.0× 29 0.5× 21 0.5× 7 0.2× 62 473
Zheng Shi China 11 286 1.2× 165 2.1× 29 0.5× 13 0.3× 3 0.1× 49 358
Bansibadan Maji India 9 178 0.8× 52 0.7× 5 0.1× 30 0.7× 2 0.1× 91 317
Kun Yuan United States 12 525 2.2× 93 1.2× 27 0.5× 7 0.2× 1 0.0× 26 552
Deqiang Cheng China 12 204 0.9× 74 0.9× 3 0.1× 4 0.1× 7 0.2× 30 349
Hong-Shin Jun South Korea 8 155 0.7× 41 0.5× 21 0.3× 5 0.1× 4 0.1× 12 285
Katsuhiro Ota Japan 14 125 0.5× 16 0.2× 13 0.2× 19 0.5× 4 0.1× 88 613
Qiming Zhao China 10 137 0.6× 114 1.4× 5 0.1× 9 0.2× 30 423
Maosen Li China 10 77 0.3× 44 0.6× 7 0.1× 11 0.3× 1 0.0× 16 249
Yabin Ye Germany 17 915 3.9× 27 0.3× 5 0.1× 6 0.1× 5 0.1× 90 1.0k

Countries citing papers authored by Aki Fujimura

Since Specialization
Citations

This map shows the geographic impact of Aki Fujimura's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Aki Fujimura with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Aki Fujimura more than expected).

Fields of papers citing papers by Aki Fujimura

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Aki Fujimura. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Aki Fujimura. The network helps show where Aki Fujimura may publish in the future.

Co-authorship network of co-authors of Aki Fujimura

This figure shows the co-authorship network connecting the top 25 collaborators of Aki Fujimura. A scholar is included among the top collaborators of Aki Fujimura based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Aki Fujimura. Aki Fujimura is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
2.
Pang, Linyong & Aki Fujimura. (2024). Why the mask world is moving to curvilinear. 6154. 40–40. 5 indexed citations
3.
Fujimura, Aki, et al.. (2024). Curvilinear masks overview: manufacturable mask shapes are more reliably manufacturable. Journal of Micro/Nanopatterning Materials and Metrology. 23(4).
4.
Pang, Linyong, et al.. (2024). Curvilinear masks: motivations and metrology. 113–113. 1 indexed citations
5.
Pang, Linyong, Sha Lu, E. Vidal Russell, et al.. (2024). Make the impossible possible: use variable-shaped beam mask writers and curvilinear full-chip inverse lithography technology for 193i contacts/vias with mask-wafer co-optimization. Journal of Micro/Nanopatterning Materials and Metrology. 23(1). 1 indexed citations
6.
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8.
Fujimura, Aki, et al.. (2022). You don’t need 1nm contours for curvilinear shapes: pixel-based computing is the answer. 2017. 3–3. 4 indexed citations
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10.
Baranwal, Ajay Kumar, et al.. (2019). Five deep learning recipes for the mask-making industry. 7–7. 3 indexed citations
11.
Pang, Linyong, et al.. (2019). Making digital twins using the Deep Learning Kit (DLK). 9984. 9–9. 2 indexed citations
12.
Fujimura, Aki, et al.. (2017). Full-chip GPU-accelerated curvilinear EUV dose and shape correction. 8522. 8–8. 5 indexed citations
13.
Fujimura, Aki, et al.. (2017). Mask CD relationship to temperature at the time backscatter is received. 35–35. 1 indexed citations
14.
Fujimura, Aki, et al.. (2017). EUV modeling in the multi-beam mask writing era. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10454. 1045408–1045408. 2 indexed citations
15.
Fujimura, Aki, et al.. (2014). Trends in mask data preparation. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9235. 923508–923508. 1 indexed citations
16.
Zou, Yi, et al.. (2011). Optimization of mask shot count using MB-MDP and lithography simulation. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8166. 816632–816632. 14 indexed citations
17.
Fujimura, Aki, et al.. (2011). Model-based mask data preparation (MB-MDP) for ArF and EUV mask process correction. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8081. 80810U–80810U. 4 indexed citations
18.
Fujimura, Aki. (2010). Design for e-beam: design insights for direct-write maskless lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7823. 782315–782315. 9 indexed citations
19.
Fujimura, Aki, et al.. (2010). Efficiently writing circular contacts on production reticle. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7748. 77481P–77481P. 11 indexed citations
20.
Arora, N.D., et al.. (2005). Interconnect Characterization of X Architecture Diagonal Lines for VLSI Design. IEEE Transactions on Semiconductor Manufacturing. 18(2). 262–271. 10 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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