Arie den Boef

1.1k total citations · 1 hit paper
34 papers, 824 citations indexed

About

Arie den Boef is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, Arie den Boef has authored 34 papers receiving a total of 824 indexed citations (citations by other indexed papers that have themselves been cited), including 22 papers in Electrical and Electronic Engineering, 17 papers in Surfaces, Coatings and Films and 16 papers in Biomedical Engineering. Recurrent topics in Arie den Boef's work include Advancements in Photolithography Techniques (17 papers), Optical Coatings and Gratings (16 papers) and Advanced Surface Polishing Techniques (10 papers). Arie den Boef is often cited by papers focused on Advancements in Photolithography Techniques (17 papers), Optical Coatings and Gratings (16 papers) and Advanced Surface Polishing Techniques (10 papers). Arie den Boef collaborates with scholars based in Netherlands, Taiwan and South Korea. Arie den Boef's co-authors include D. Lenstra, B.H. Verbeek, G.A. Acket, J. Biesterbos, Johannes F. de Boer, Stefan Witte, Cathy Wang, Nitesh Pandey, Andreas Fuchs and Martin Jak and has published in prestigious journals such as SHILAP Revista de lepidopterología, Optics Express and IEEE Journal of Quantum Electronics.

In The Last Decade

Arie den Boef

31 papers receiving 769 citations

Hit Papers

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What are hit papers?

Hit papers significantly outperform the citation benchmark for their cohort. A paper qualifies if it has ≥500 total citations, achieves ≥1.5× the top-1% citation threshold for papers in the same subfield and year (this is the minimum needed to enter the top 1%, not the average within it), or reaches the top citation threshold in at least one of its specific research topics.

Coherence collapse in single-mode semiconductor lasers due to optical feedback

1985 381 citations D. Lenstra, B.H. Verbeek et al. IEEE Journal of Quantum Electronics profile →

Peers

Countries citing papers authored by Arie den Boef

Since Specialization

Citations

This map shows the geographic impact of Arie den Boef's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Arie den Boef with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Arie den Boef more than expected).

Fields of papers citing papers by Arie den Boef

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Arie den Boef. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Arie den Boef. The network helps show where Arie den Boef may publish in the future.

Co-authorship network of co-authors of Arie den Boef

This figure shows the co-authorship network connecting the top 25 collaborators of Arie den Boef. A scholar is included among the top collaborators of Arie den Boef based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Arie den Boef. Arie den Boef is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Computational vibration mitigation using phase interpolation in digital holographic microscopy for overlay metrology 2024 ·Optics Express ·(unknown), (unknown), Stefan Witte, Johannes F. de Boer, Arie den Boef	1
2	Enhancing diffraction-based overlay metrology capabilities in digital holographic microscopy using model-based signal separation 2024 ·Journal of Micro/Nanopatterning Materials and Metrology ·(unknown), Simon G. J. Mathijssen, (unknown), Stefan Witte, Johannes F. de Boer, Arie den Boef	0
3	Alignment and overlay through opaque metal layers 2023 ·(unknown), (unknown), (unknown), Alain Moussa, (unknown), Cyrus Tabery, (unknown), (unknown), (unknown), (unknown), Arie den Boef, R. A. Synowicki	0
4	Non-isoplanatic lens aberration correction in dark-field digital holographic microscopy for semiconductor metrology 2023 ·SHILAP Revista de lepidopterología ·(unknown), (unknown), W. Coene, (unknown), Teus Tukker, Stefan Witte, Johannes F. de Boer, Arie den Boef	7
5	Illumination spot profile correction in digital holographic microscopy for overlay metrology 2023 ·Journal of Micro/Nanopatterning Materials and Metrology ·(unknown), (unknown), (unknown), Stefan Witte, Johannes F. de Boer, Arie den Boef	2
6	Pupil apodization in digital holographic microscopy for reduction of coherent imaging effects 2022 ·Optics Continuum ·(unknown), (unknown), (unknown), (unknown), Stefan Witte, Johannes F. de Boer, Arie den Boef	6
7	Fast and robust overlay metrology from visible to infrared wavelengths using dark-field digital holographic microscopy 2022 ·Pure Amsterdam UMC ·(unknown), (unknown), Nitesh Pandey, (unknown), (unknown), Stefan Witte, Johannes F. de Boer, Arie den Boef	1
8	Characterization of metrology to device overlay offset and novel methods to minimize it 2021 ·(unknown), Ken Chang, (unknown), Simon G. J. Mathijssen, (unknown), (unknown), Arie den Boef, (unknown), Frank Sun, Justin K. Huang, (unknown), (unknown), Jason C. Hung, (unknown), (unknown), Cathy Wang, (unknown)	1
9	Aberration calibration and correction with nano-scatterers in digital holographic microscopy for semiconductor metrology 2021 ·Optics Express ·(unknown), (unknown), Nitesh Pandey, (unknown), (unknown), (unknown), Stefan Witte, Johannes F. de Boer, Arie den Boef	11
10	Enhancing the applications space of diffraction based overlay metrology by increasing throughput and target pitch flexibility 2020 ·Simon G. J. Mathijssen, (unknown), (unknown), (unknown), (unknown), (unknown), Fei Jia, (unknown), Huajun Qin, Arie den Boef, (unknown), (unknown), Chao Fang, (unknown)	1
11	Impact of coherence length on the field of view in dark-field holographic microscopy for semiconductor metrology: theoretical and experimental comparisons 2020 ·Applied Optics ·(unknown), (unknown), Johannes F. de Boer, Stefan Witte, Arie den Boef	6
12	Color mixing in overlay metrology for greater accuracy and robustness 2019 ·Simon G. J. Mathijssen, (unknown), M. Bozkurt, (unknown), (unknown), Antonios Zagaris, Ken Chang, (unknown), (unknown), Cathy Wang, Arie den Boef, (unknown), (unknown), (unknown), John C. Lin	6
13	Scatterometry for advanced process control in semiconductor device manufacturing 2017 ·(unknown), (unknown), (unknown), (unknown), (unknown), Eric W.P. Bakker, Arie den Boef, (unknown), (unknown), (unknown)	3
14	A complete methodology towards accuracy and lot-to-lot robustness in on-product overlay metrology using flexible wavelength selection 2017 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), Arie den Boef, (unknown), (unknown), Grzegorz Grzela, Andreas Fuchs, Martin Jak, (unknown), Ken Chang, (unknown), (unknown), (unknown), Cathy Wang, (unknown), (unknown), (unknown), (unknown), (unknown), (unknown), (unknown)	11
15	Holistic approach using accuracy of diffraction-based integrated metrology to improve on-product performance, reduce cycle time, and cost at litho 2015 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), Arie den Boef, Martin Jak, Gary Zhang, (unknown), (unknown), (unknown), Andreas Fuchs, Youping Zhang, (unknown), (unknown), (unknown), (unknown), Cathy Wang, (unknown), (unknown)	19
16	Intra-field patterning control using high-speed and small-target optical metrology of CD and focus 2015 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), (unknown), (unknown), (unknown), (unknown), (unknown), (unknown), Paul Hinnen, (unknown), C.M. Leewis, Frank Staals, (unknown), Stuart Young, Wei Guo, Arie den Boef	5
17	Advanced litho-cluster control via integrated in-chip metrology 2013 ·(unknown), (unknown), Arie den Boef, Andreas Fuchs, S. Meyer, (unknown), (unknown), (unknown)	2
18	A novel robust diffraction-based metrology concept for measurement and monitoring of critical layers in memory devices 2010 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), (unknown), (unknown), Jeongho Yeo, Cheol Hong Kim, Suk‐Woo Nam, Joo-Tae Moon, (unknown), Arie den Boef, (unknown), Stephen P. Morgan, Andreas Fuchs	2
19	Fabrication of metrology test structures for future technology nodes using high-resolution variable-shaped e-beam direct write 2009 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), (unknown), (unknown), (unknown), (unknown), (unknown), Christoph Hohle, Kang‐Hoon Choi, (unknown), Johannes Kretz, (unknown), Arie den Boef	2
20	The influence of feedback intensity on longitudinal mode properties and optical noise in index-guided semiconductor lasers 1984 ·IEEE Journal of Quantum Electronics ·G.A. Acket, D. Lenstra, Arie den Boef, B.H. Verbeek	208

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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