David F. Kyser
- Surfaces, Coatings and Films top 1%
- Electron and X-Ray Spectroscopy Techniques 22
- Structural Biology top 5%
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- Advancements in Photolithography Techniques 17
- Semiconductor materials and devices 10
- Integrated Circuits and Semiconductor Failure Analysis 7
- Radiation top 5%
- X-ray Spectroscopy and Fluorescence Analysis 6
- Nuclear Energy and Engineering top 10%
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- Copper Interconnects and Reliability 5
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- Metal and Thin Film Mechanics 4
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- Semiconductor Quantum Structures and Devices 4
- Co-authors
- David B. WittryKenji MurataC. H. TingV. NatarajanMihir ParikhMing-Ren LinCyrus TaberyLeland Chang
- Journals
- Journal of Applied Physics (9 papers)Proceedings of the IEEE (2 papers)Journal of The Electrochemical Society (1 paper)
- Partner nations
- United StatesNetherlandsJapan
In The Last Decade
David F. Kyser
36 papers receiving 1.5k citations
Hit Papers
Peers
Comparison fields: 5 of 65
- Surfaces, Coatings and Films 541
- Structural Biology 39
- Electrical and Electronic Engineering 1.3k
- Radiation 156
- Nuclear Energy and Engineering 7
Countries citing papers authored by David F. Kyser
This map shows the geographic impact of David F. Kyser's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by David F. Kyser with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites David F. Kyser more than expected).
Fields of papers citing papers by David F. Kyser
This network shows the impact of papers produced by David F. Kyser. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by David F. Kyser. The network helps show where David F. Kyser may publish in the future.
Co-authorship network
The 25 scholars most cited alongside David F. Kyser, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 2008 | 1 | |
| 2 | FinFET scaling to 10 nm gate lengthbreakdown → | 2003 | 462 |
| 3 | 1998 | 67 | |
| 4 | 1991 | 1 | |
| 5 | 1989 | 1 | |
| 6 | 1987 | 2 | |
| 7 | Electron beam interactions with solids for microscopy, microanalysis & microlithography : proceedings of the 1st Pfefferkorn Conference, held April 18 to 23, 1982, at the Asilomar Conference Center, Monterey, CA | 1984 | 1 |
| 8 | 1983 | 42 | |
| 9 | Monte Carlo Calculations for Electron Microscopy, Microanalysis, and Microlithography | 1982 | 5 |
| 10 | 1981 | 1 | |
| 11 | 1979 | 71 | |
| 12 | 1979 | 16 | |
| 13 | 1978 | 6 | |
| 14 | 1975 | 77 | |
| 15 | 1975 | 42 | |
| 16 | 1971 | 10 | |
| 17 | 1969 | 43 | |
| 18 | 1967 | 191 | |
| 19 | 1967 | 35 | |
| 20 | 1965 | 18 |
About David F. Kyser
David F. Kyser is a scholar working on Surfaces, Coatings and Films, Structural Biology and Radiation, having authored 36 papers that have together received 1.7k indexed citations. Recurring topics across this work include Electron and X-Ray Spectroscopy Techniques (22 papers), Advancements in Photolithography Techniques (17 papers), Semiconductor materials and devices (10 papers), Integrated Circuits and Semiconductor Failure Analysis (7 papers), X-ray Spectroscopy and Fluorescence Analysis (6 papers), Copper Interconnects and Reliability (5 papers), Metal and Thin Film Mechanics (4 papers) and Semiconductor Quantum Structures and Devices (4 papers). The work is most often cited by research in Surfaces, Coatings and Films (541 citations), Structural Biology (39 citations) and Electrical and Electronic Engineering (1.3k citations). David F. Kyser has collaborated with scholars based in United States, Netherlands and Japan. Frequent co-authors include David B. Wittry, Kenji Murata, C. H. Ting, V. Natarajan, Mihir Parikh, Ming-Ren Lin, Cyrus Tabery, Leland Chang, Tsu-Jae King and Jeffrey Bokor. Their work appears in journals such as Journal of Applied Physics, Proceedings of the IEEE and Journal of The Electrochemical Society.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.