Edita Tejnil

548 total citations
47 papers, 421 citations indexed

About

Edita Tejnil is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Industrial and Manufacturing Engineering. According to data from OpenAlex, Edita Tejnil has authored 47 papers receiving a total of 421 indexed citations (citations by other indexed papers that have themselves been cited), including 43 papers in Electrical and Electronic Engineering, 18 papers in Surfaces, Coatings and Films and 11 papers in Industrial and Manufacturing Engineering. Recurrent topics in Edita Tejnil's work include Advancements in Photolithography Techniques (42 papers), Electron and X-Ray Spectroscopy Techniques (15 papers) and Integrated Circuits and Semiconductor Failure Analysis (12 papers). Edita Tejnil is often cited by papers focused on Advancements in Photolithography Techniques (42 papers), Electron and X-Ray Spectroscopy Techniques (15 papers) and Integrated Circuits and Semiconductor Failure Analysis (12 papers). Edita Tejnil collaborates with scholars based in United States, Netherlands and Belgium. Edita Tejnil's co-authors include Jeffrey Bokor, Kenneth A. Goldberg, H. Medecki, Alan R. Stivers, Eric M. Gullikson, David Attwood, Ted Liang, John L. Sturtevant, J. H. Underwood and Pei-yang Yan and has published in prestigious journals such as Optics Letters, Review of Scientific Instruments and IEEE Journal of Quantum Electronics.

In The Last Decade

Edita Tejnil

43 papers receiving 396 citations

Peers

Countries citing papers authored by Edita Tejnil

Since Specialization

Citations

This map shows the geographic impact of Edita Tejnil's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Edita Tejnil with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Edita Tejnil more than expected).

Fields of papers citing papers by Edita Tejnil

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Edita Tejnil. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Edita Tejnil. The network helps show where Edita Tejnil may publish in the future.

Co-authorship network of co-authors of Edita Tejnil

This figure shows the co-authorship network connecting the top 25 collaborators of Edita Tejnil. A scholar is included among the top collaborators of Edita Tejnil based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Edita Tejnil. Edita Tejnil is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	OPC and modeling solution towards 0.55NA EUV stitching 2024 ·(unknown), Werner Gillijns, Stewart Wu, (unknown), (unknown), Vicky Philipsen, (unknown), Edita Tejnil, Germain Fenger	2
2	Accurate, full-chip, three-dimensional electromagnetic field model for non-Manhattan mask corners 2016 ·Journal of Micro/Nanolithography MEMS and MOEMS ·(unknown), (unknown), Mike Oliver, David S. Fryer, Edita Tejnil, (unknown)	4
3	Accurate, full chip 3D electromagnetic field model for non-Manhattan mask corners 2015 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), (unknown), (unknown), David S. Fryer, Edita Tejnil, (unknown)	0
4	The impact of 14-nm photomask uncertainties on computational lithography solutions 2013 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·John L. Sturtevant, Edita Tejnil, Tim Lin, (unknown), (unknown), (unknown), (unknown), (unknown), (unknown), (unknown), (unknown)	13
5	The impact of 14nm photomask variability and uncertainty on computational lithography solutions 2013 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·John L. Sturtevant, Edita Tejnil, (unknown), Steffen Schulze, (unknown), (unknown), (unknown), (unknown), (unknown), (unknown)	1
6	Heuristics for truncating the number of optical kernels in Hopkins image calculations for model-based OPC treatment 2007 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), Edita Tejnil	3
7	A single-exposure approach for patterning 45nm flash/DRAM contact hole mask 2006 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), (unknown), Edita Tejnil, Stephen D. H. Hsu, (unknown), (unknown), Tamer H. Coskun, (unknown), Noel Corcoran, (unknown), (unknown), Jo Finders, (unknown), Robert Socha	1
8	EUVL defect printability at the 32-nm node 2004 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Eric M. Gullikson, Edita Tejnil, Ted Liang, Alan R. Stivers	17
9	Characterization of defect detection sensitivity in inspection of mask substrates and blanks for extreme-ultraviolet lithography 2004 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Edita Tejnil, Eric M. Gullikson, Alan R. Stivers	14
10	Enhanced optical inspectability of patterned EUVL mask 2002 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Ted Liang, Alan R. Stivers, Pei-yang Yan, Edita Tejnil, Guojing Zhang	9
11	Alt-PSM for 0.10-μm and 0.13-μm polypatterning 2000 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Richard E. Schenker, (unknown), Alan R. Stivers, Edita Tejnil	1
12	Options for at-wavelength inspection of patterned extreme ultraviolet lithography masks 1999 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Edita Tejnil, Alan R. Stivers	4
13	Actinic EUVL mask blank defect inspection system 1999 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Seongtae Jeong, Lewis Johnson, (unknown), Senajith Rekawa, Pei-yang Yan, Patrick A. Kearney, Edita Tejnil, J. H. Underwood, Jeffrey Bokor	4
14	At-Wavelength Metrologies for Extreme Ultraviolet Lithography 1998 ·OSTI OAI (U.S. Department of Energy Office of Scientific and Technical Information) ·David Attwood, Erik H. Anderson, (unknown), (unknown), Jeffrey Bokor, Kenneth A. Goldberg, Eric M. Gullikson, Keith Jackson, (unknown), Masato Koike, H. Medecki, Stanley Mrowka, (unknown), Edita Tejnil, J. H. Underwood	0
15	At-wavelength Interferometory for EUV Lithography 1997 ·Journal of Vacuum Science and Technology ·Edita Tejnil	0
16	Characterization of an EUV Schwarzschild objective using phase-shifting point diffraction interferometry 1997 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Kenneth A. Goldberg, Edita Tejnil, Sang Hun Lee, H. Medecki, David Attwood, Keith Jackson, Jeffrey Bokor	19
17	At-wavelength interferometry for extreme ultraviolet lithography 1997 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Edita Tejnil, Kenneth A. Goldberg, Sang-Hun Lee, H. Medecki, (unknown), Paul Denham, Alastair A. MacDowell, Jeffrey Bokor, David Attwood	26
18	Phase-Shifting Point Diffraction Interferometry for At-Wavelength Testing of Lithographic Optics 1996 ·Edita Tejnil, Kenneth A. Goldberg, H. Medecki, (unknown), Jeffrey Bokor, David Attwood	7
19	Interferometry using undulator sources (invited, abstract) 1996 ·Review of Scientific Instruments ·(unknown), Kenneth A. Goldberg, Edita Tejnil, Jeffrey Bokor, H. Medecki, David Attwood, (unknown)	2
20	Progress towards λ/20 extreme ultraviolet interferometry 1995 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Kenneth A. Goldberg, (unknown), Jeffrey Bokor, H. Medecki, David Attwood, (unknown), Edita Tejnil, Gary E. Sommargren	14

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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