Plasma Sources Science and Technology

4.8k papers and 137.8k indexed citations

About

The 4.8k papers published in Plasma Sources Science and Technology in the last decades have received a total of 137.8k indexed citations. Papers published in Plasma Sources Science and Technology usually cover Electrical and Electronic Engineering (4.0k papers), Radiology, Nuclear Medicine and Imaging (2.0k papers) and Atomic and Molecular Physics, and Optics (1.4k papers) specifically the topics of Plasma Diagnostics and Applications (3.6k papers), Plasma Applications and Diagnostics (2.0k papers) and Electrohydrodynamics and Fluid Dynamics (1.1k papers). The most active scholars publishing in Plasma Sources Science and Technology are Gerjan Hagelaar, Jón Tómas Guðmundsson, Leanne C. Pitchford, Annemie Bogaerts, Ronny Brandenburg, Peter Bruggeman, M. A. Lieberman, Jeffrey Hopwood, Stéphane Mazouffre and Mark J. Kushner.

In The Last Decade

Plasma Sources Science and Technology

4.6k papers receiving 129.9k citations

Peers

Plasma Sources Science and Technology
Comparison fields: 5 of 185
  • Electrical and Electronic Engineering 105.9k
  • Radiology, Nuclear Medicine and Imaging 65.2k
  • Mechanics of Materials 30.5k
  • Atomic and Molecular Physics, and Optics 29.6k
  • Materials Chemistry 26.9k
Replace IEEE Transactions on Plasma Science with:
IEEE Transactions on Plasma Science United States
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Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment United States
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Vacuum China
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Journal of Quantitative Spectroscopy and Radiative Transfer United States
Journal of Physics D Applied Physics China
Optics Communications China
IEEE Journal of Quantum Electronics United States
IEEE Transactions on Plasma Science United States View profile →
Citations per field, relative to Plasma Sources Science and Technology
Plasma Sources Science and Technology · 1×
Citations per year, relative to Plasma Sources Science and Technology
Plasma Sources Science and Technology · 1×

Countries where authors publish in Plasma Sources Science and Technology

Since Specialization
Citations

This map shows the geographic impact of research published in Plasma Sources Science and Technology. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by papers published in Plasma Sources Science and Technology with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Plasma Sources Science and Technology more than expected).

Fields of papers published in Plasma Sources Science and Technology

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers published in Plasma Sources Science and Technology. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers published in Plasma Sources Science and Technology.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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2026