Hiroaki Kakiuchi
About
In The Last Decade
Hiroaki Kakiuchi
101 papers receiving 941 citations
Peers
Comparison fields: 5 of 58
- Electrical and Electronic Engineering 758
- Materials Chemistry 481
- Radiology, Nuclear Medicine and Imaging 187
- Biomedical Engineering 150
- Surfaces, Coatings and Films 125
Countries citing papers authored by Hiroaki Kakiuchi
This map shows the geographic impact of Hiroaki Kakiuchi's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Hiroaki Kakiuchi with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Hiroaki Kakiuchi more than expected).
Fields of papers citing papers by Hiroaki Kakiuchi
This network shows the impact of papers produced by Hiroaki Kakiuchi. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Hiroaki Kakiuchi. The network helps show where Hiroaki Kakiuchi may publish in the future.
Co-authorship network of co-authors of Hiroaki Kakiuchi
This figure shows the co-authorship network connecting the top 25 collaborators of Hiroaki Kakiuchi. A scholar is included among the top collaborators of Hiroaki Kakiuchi based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Hiroaki Kakiuchi. Hiroaki Kakiuchi is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | 0 | |
| 2 | 1 | |
| 3 | 1 | |
| 4 | 1 | |
| 5 | 2 | |
| 6 | 6 | |
| 7 | 1 | |
| 8 | 2 | |
| 9 | 19 | |
| 10 | 3 | |
| 11 | 5 | |
| 12 | 1 | |
| 13 | 6 | |
| 14 | Room-Temperature Deposition of Silicon Nitride Films with Very High Rates Using Atmospheric-Pressure Plasma Chemical Vapor Deposition | 1 |
| 15 | 0 | |
| 16 | 1 | |
| 17 | 0 | |
| 18 | 0 | |
| 19 | 0 | |
| 20 | 1 |
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.