M. Fritze

1.1k total citations
53 papers, 798 citations indexed

About

M. Fritze is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, M. Fritze has authored 53 papers receiving a total of 798 indexed citations (citations by other indexed papers that have themselves been cited), including 45 papers in Electrical and Electronic Engineering, 18 papers in Biomedical Engineering and 16 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in M. Fritze's work include Advancements in Photolithography Techniques (22 papers), Integrated Circuits and Semiconductor Failure Analysis (13 papers) and Semiconductor materials and devices (13 papers). M. Fritze is often cited by papers focused on Advancements in Photolithography Techniques (22 papers), Integrated Circuits and Semiconductor Failure Analysis (13 papers) and Semiconductor materials and devices (13 papers). M. Fritze collaborates with scholars based in United States, Canada and Germany. M. Fritze's co-authors include D.E. Ackley, P.W. Wyatt, A. V. Nurmikko, D. Yost, C. Colvard, C.L. Keast, A. V. Nurmikko, L. L. Chang, M. B. Stern and W. J. Walecki and has published in prestigious journals such as Physical Review Letters, SHILAP Revista de lepidopterología and Physical review. B, Condensed matter.

In The Last Decade

M. Fritze

50 papers receiving 750 citations

Peers

Countries citing papers authored by M. Fritze

Since Specialization

Citations

This map shows the geographic impact of M. Fritze's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by M. Fritze with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites M. Fritze more than expected).

Fields of papers citing papers by M. Fritze

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by M. Fritze. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by M. Fritze. The network helps show where M. Fritze may publish in the future.

Co-authorship network of co-authors of M. Fritze

This figure shows the co-authorship network connecting the top 25 collaborators of M. Fritze. A scholar is included among the top collaborators of M. Fritze based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with M. Fritze. M. Fritze is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Post-Moore: prospects for novel patterning of low volume ICs 2021 ·M. Fritze	1
2	Split-fabrication obfuscation: Metrics and techniques 2014 ·Meenatchi Jagasivamani, (unknown), (unknown), (unknown), M. Fritze	51
3	Dual threshold voltage adder for robust sub-Vt operation in 65nm technology 2013 ·Meenatchi Jagasivamani, (unknown), M. Fritze	1
4	Hybrid optical maskless lithography: Scaling beyond the 45nm node 2005 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·M. Fritze, T. M. Bloomstein, Brian Tyrrell, T. H. Fedynyshyn, N. N. Efremow, D. E. Hardy, (unknown), D. M. Lennon, S. J. Spector, M. Rothschild, (unknown)	18
5	DC and RF characterization of fully depleted strained SOI MOSFETs 2005 ·(unknown), T. A. Langdo, (unknown), J.G. Fiorenza, P.W. Wyatt, M. T. Currie, C. W. Leitz, G. Braithwaite, M. Fritze, (unknown), D. Yost, Zhiyuan Cheng, Anthony Lochtefeld, (unknown)	2
6	Minimizing mask complexity for advanced optical lithography 2004 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·M. Fritze, Brian Tyrrell	1
7	Subwavelength Optical Lithography with Phase-Shift Photomasks 2003 ·M. Fritze, Brian Tyrrell, (unknown), (unknown), D. Yost, Anthony R. Forte, (unknown), (unknown)	9
8	Fabrication of three-dimensional mode converters for silicon-based integrated optics 2003 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·M. Fritze, J.M. Knecht, C. O. Bozler, C.L. Keast, (unknown), Seth A. Jacobson, (unknown), (unknown), (unknown), (unknown), Michael B. Frish, Christina Manolatou	21
9	Dry etching of amorphous-Si gates for deep sub-100 nm silicon-on-insulator complementary metal–oxide semiconductor 2002 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·D. Yost, (unknown), M. Fritze, (unknown), Vyshnavi Suntharalingam, (unknown), (unknown)	11
10	Characterization of quartz-etched PSM masks for KrF lithography at the 100-nm node 2002 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), M. Fritze, (unknown), (unknown), (unknown), (unknown), Chris A. Mack	0
11	SLOTFET fabrication of self-aligned sub-100-nm fully-depleted SOI CMOS 2002 ·C.K. Chen, (unknown), Pascale Gouker, P.W. Wyatt, D. Yost, J.A. Burns, Vyshnavi Suntharalingam, M. Fritze, C.L. Keast	2
12	100-nm node lithography with KrF? 2001 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·M. Fritze, Brian Tyrrell, (unknown), (unknown), Paul H. Davis, (unknown), (unknown), (unknown), (unknown), Huayu Liu, (unknown), (unknown), (unknown), (unknown), (unknown), (unknown)	5
13	High-Q silicon-based microring resonators fabricated using248 nm optical lithography 2000 ·Conference on Lasers and Electro-Optics ·P. A. Maki, M. Fritze, D. R. Lim, Brent E. Little, S. C. Palmateer, Lionel C. Kimerling, H. A. Haus	2
14	Sub-100 nm silicon on insulator complimentary metal–oxide semiconductor transistors by deep ultraviolet optical lithography 2000 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·M. Fritze, J.A. Burns, P.W. Wyatt, (unknown), Pascale Gouker, (unknown), C.L. Keast, (unknown), D. Yost, (unknown), (unknown), Paul H. Davis, (unknown), S. Deneault, (unknown)	10
15	High-Q sificon-based microring resonators fabricated using 248 nm optical lithography 2000 ·P. A. Maki, M. Fritze, D. R. Lim, Brent E. Little, S. C. Palmateer, Lionel C. Kimerling, H. A. Haus	4
16	Nanofabrication with deep-ultraviolet lithography and resolution enhancements 1999 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·M. Fritze, S. C. Palmateer, P. A. Maki, J.M. Knecht, (unknown), (unknown), (unknown), (unknown), K. E. Krohn, P.W. Wyatt	2
17	Performance of excimer lasers as light sources for 193-nm lithography 1997 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Jan Sedláček, (unknown), M. Fritze, Roderick R. Kunz, M. Rothschild, (unknown), Daniel Corliss	1
18	Fermi-edge singularities in InGaAs and GaAs quantum wires 1994 ·Surface Science ·M. Fritze, A. V. Nurmikko, Paweł Hawrylak	3
19	Fermi-edge singularities inInxGa1−xAs and GaAs quantum wires 1993 ·Physical review. B, Condensed matter ·M. Fritze, A. V. Nurmikko, Paweł Hawrylak	14
20	Chen, Fritze, and Nurmikko reply 1991 ·Physical Review Letters ·(unknown), M. Fritze, A. V. Nurmikko	7

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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