S. Deneault

653 total citations
12 papers, 542 citations indexed

About

S. Deneault is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Materials Chemistry. According to data from OpenAlex, S. Deneault has authored 12 papers receiving a total of 542 indexed citations (citations by other indexed papers that have themselves been cited), including 10 papers in Electrical and Electronic Engineering, 5 papers in Biomedical Engineering and 5 papers in Materials Chemistry. Recurrent topics in S. Deneault's work include Advancements in Photolithography Techniques (4 papers), Nanofabrication and Lithography Techniques (4 papers) and Photonic and Optical Devices (3 papers). S. Deneault is often cited by papers focused on Advancements in Photolithography Techniques (4 papers), Nanofabrication and Lithography Techniques (4 papers) and Photonic and Optical Devices (3 papers). S. Deneault collaborates with scholars based in United States. S. Deneault's co-authors include T. M. Lyszczarz, M. W. Geis, K. E. Krohn, J. E. Butler, Robert Wright, D. M. Lennon, R. T. Schulein, S. J. Spector, Fuwan Gan and Franz X. Käertner and has published in prestigious journals such as Applied Physics Letters, Optics Express and IEEE Photonics Technology Letters.

In The Last Decade

S. Deneault

12 papers receiving 518 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
S. Deneault United States	8	333	270	170	164	100	12	542
Masaru Izawa Japan	15	485 1.5×	196 0.7×	86 0.5×	57 0.3×	161 1.6×	50	612
K. Yokoo Japan	16	531 1.6×	500 1.9×	356 2.1×	132 0.8×	22 0.2×	87	963
A. Kaplan United Kingdom	13	157 0.5×	292 1.1×	89 0.5×	145 0.9×	61 0.6×	40	433
Yoshinori Hayafuji Japan	12	367 1.1×	255 0.9×	170 1.0×	56 0.3×	14 0.1×	31	538
Olaf Krüger Germany	14	362 1.1×	126 0.5×	122 0.7×	91 0.6×	32 0.3×	54	526
J.G. Langan United States	16	424 1.3×	190 0.7×	100 0.6×	29 0.2×	185 1.9×	22	581
A. Mefleh Poland	10	217 0.7×	217 0.8×	132 0.8×	71 0.4×	22 0.2×	29	476
Hiroyuki YAMAKAWA Japan	9	151 0.5×	360 1.3×	120 0.7×	107 0.7×	28 0.3×	44	558
J. Kouvetakis United States	14	681 2.0×	214 0.8×	377 2.2×	244 1.5×	23 0.2×	23	870
M. A. Woodall United States	7	298 0.9×	240 0.9×	320 1.9×	345 2.1×	37 0.4×	14	668

Countries citing papers authored by S. Deneault

Since Specialization

Citations

This map shows the geographic impact of S. Deneault's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by S. Deneault with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites S. Deneault more than expected).

Fields of papers citing papers by S. Deneault

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by S. Deneault. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by S. Deneault. The network helps show where S. Deneault may publish in the future.

Co-authorship network of co-authors of S. Deneault

This figure shows the co-authorship network connecting the top 25 collaborators of S. Deneault. A scholar is included among the top collaborators of S. Deneault based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with S. Deneault. S. Deneault is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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12 of 12 papers shown

Kunz, Roderick R., et al.. (2018). Rapid Quantitative Analysis of Multiple Explosive Compound Classes on a Single Instrument via Flow‐Injection Analysis Tandem Mass Spectrometry. Journal of Forensic Sciences. 64(1). 223–230. 18 indexed citations

Geis, M. W., S. J. Spector, Matthew E. Grein, et al.. (2007). CMOS-Compatible All-Si High-Speed Waveguide Photodiodes With High Responsivity in Near-Infrared Communication Band. IEEE Photonics Technology Letters. 19(3). 152–154. 128 indexed citations

Bloomstein, T. M., et al.. (2006). 22-nm immersion interference lithography. Optics Express. 14(14). 6434–6434. 52 indexed citations

Spector, S. J., T. M. Lyszczarz, M. W. Geis, et al.. (2006). Reflections in Silicon on Insulator (SOI) Waveguides and Ring Resonators. ITuH5–ITuH5. 3 indexed citations

Bloomstein, T. M., et al.. (2006). Immersion patterning down to 27nm half pitch. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 24(6). 2789–2797. 7 indexed citations

Bloomstein, T. M., P Juodawlkis, R.B. Swint, et al.. (2005). Direct patterning of spin-on glass with 157nm lithography: Application to nanoscale crystal growth. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 23(6). 2617–2623. 10 indexed citations

Geis, M. W., et al.. (2005). Field emission at 10Vcm−1 with surface emission cathodes on negative-electron-affinity insulators. Applied Physics Letters. 87(19). 33 indexed citations

Geis, M. W., K. E. Krohn, S. Deneault, et al.. (2004). Optically switched conductivity of epitaxial diamond on nitrogen doped diamond substrates. Applied Physics Letters. 84(23). 4620–4622. 4 indexed citations

Sinta, Roger F., et al.. (2004). Fabrication of crystalline organic waveguides with an exceptionally large electro-optic coefficient. Applied Physics Letters. 84(19). 3729–3731. 109 indexed citations

10.

Butler, J. E., M. W. Geis, K. E. Krohn, et al.. (2003). Exceptionally high voltage Schottky diamond diodes and low boron doping. Semiconductor Science and Technology. 18(3). S67–S71. 164 indexed citations

11.

Fritze, M., J.A. Burns, P.W. Wyatt, et al.. (2000). Sub-100 nm silicon on insulator complimentary metal–oxide semiconductor transistors by deep ultraviolet optical lithography. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 18(6). 2886–2890. 10 indexed citations

12.

Palmateer, S. C., et al.. (1999). Metrology methods for quantifying edge roughness: II. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3677. 53–53. 4 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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