D. E. Hardy

508 total citations
25 papers, 405 citations indexed

About

D. E. Hardy is a scholar working on Electrical and Electronic Engineering, Computational Mechanics and Biomedical Engineering. According to data from OpenAlex, D. E. Hardy has authored 25 papers receiving a total of 405 indexed citations (citations by other indexed papers that have themselves been cited), including 20 papers in Electrical and Electronic Engineering, 8 papers in Computational Mechanics and 8 papers in Biomedical Engineering. Recurrent topics in D. E. Hardy's work include Advancements in Photolithography Techniques (15 papers), Nanofabrication and Lithography Techniques (6 papers) and Surface Roughness and Optical Measurements (5 papers). D. E. Hardy is often cited by papers focused on Advancements in Photolithography Techniques (15 papers), Nanofabrication and Lithography Techniques (6 papers) and Surface Roughness and Optical Measurements (5 papers). D. E. Hardy collaborates with scholars based in United States and Belgium. D. E. Hardy's co-authors include T. M. Bloomstein, M. Rothschild, Roderick R. Kunz, Russell B. Goodman, S. T. Palmacci, S. Deneault, Vladimir Liberman, Jan Sedláček, Andrew Grenville and Augustus W. Fountain and has published in prestigious journals such as Optics Express, Analytical and Bioanalytical Chemistry and Journal of Chromatographic Science.

In The Last Decade

D. E. Hardy

25 papers receiving 362 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
D. E. Hardy United States 11 253 229 84 60 56 25 405
M. L. Thomas United States 9 283 1.1× 86 0.4× 55 0.7× 87 1.4× 129 2.3× 16 370
T. H. Fedynyshyn United States 11 239 0.9× 142 0.6× 72 0.9× 110 1.8× 52 0.9× 22 343
Masaki Koike Japan 10 299 1.2× 197 0.9× 13 0.2× 71 1.2× 54 1.0× 30 446
L. Bruchhaus France 12 243 1.0× 227 1.0× 55 0.7× 120 2.0× 88 1.6× 20 444
Zissis Dardas United States 9 126 0.5× 83 0.4× 47 0.6× 185 3.1× 103 1.8× 13 405
I. V. Bykov Russia 11 103 0.4× 127 0.6× 19 0.2× 125 2.1× 124 2.2× 46 368
Vincent Mirallès France 8 140 0.6× 323 1.4× 27 0.3× 85 1.4× 23 0.4× 14 460
Nico Klingner Germany 12 141 0.6× 47 0.2× 46 0.5× 147 2.5× 41 0.7× 30 339
Hifumi Tamura Japan 10 156 0.6× 52 0.2× 46 0.5× 156 2.6× 29 0.5× 44 321
A. O. Kucherik Russia 13 108 0.4× 247 1.1× 17 0.2× 175 2.9× 81 1.4× 80 428

Countries citing papers authored by D. E. Hardy

Since Specialization
Citations

This map shows the geographic impact of D. E. Hardy's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by D. E. Hardy with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites D. E. Hardy more than expected).

Fields of papers citing papers by D. E. Hardy

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by D. E. Hardy. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by D. E. Hardy. The network helps show where D. E. Hardy may publish in the future.

Co-authorship network of co-authors of D. E. Hardy

This figure shows the co-authorship network connecting the top 25 collaborators of D. E. Hardy. A scholar is included among the top collaborators of D. E. Hardy based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with D. E. Hardy. D. E. Hardy is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Kunz, Roderick R., Katherine E. Gregory, & D. E. Hardy. (2010). The Role of Stationary Phase Selection on Performance For Explosives Analysis Using GC-ECD. Journal of Chromatographic Science. 48(4). 310–316. 1 indexed citations
2.
Kunz, Roderick R., et al.. (2009). Measurement of trace explosive residues in a surrogate operational environment: implications for tactical use of chemical sensing in C-IED operations. Analytical and Bioanalytical Chemistry. 395(2). 357–369. 10 indexed citations
3.
French, Roger H., Hoang V. Tran, Jerald Feldman, et al.. (2007). High-index immersion lithography with second-generation immersion fluids to enable numerical aperatures of 1.55 for cost effective 32-nm half pitches. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6520. 65201O–65201O. 18 indexed citations
4.
Bloomstein, T. M., et al.. (2006). 22-nm immersion interference lithography. Optics Express. 14(14). 6434–6434. 52 indexed citations
5.
Swint, R.B., P Juodawlkis, Douglas C. Oakley, et al.. (2005). Nanoscale selective area epitaxy: towards lithographically defined quantum dots at 1.5 /spl mu/m using direct lithographic patterning. 913–914. 2 indexed citations
6.
Liberman, Vladimir, S. T. Palmacci, D. E. Hardy, M. Rothschild, & Andrew Grenville. (2005). Controlled contamination studies in 193-nm immersion lithography. 13–13. 8 indexed citations
7.
Grenville, Andrew, Scott D. Hector, Leonardus H. A. Leunissen, et al.. (2005). Experimental measurements of diffraction for periodic patterns by 193-nm polarized radiation compared to rigorous EMF simulations. 56–56. 7 indexed citations
8.
Fritze, M., T. M. Bloomstein, Brian Tyrrell, et al.. (2005). Hybrid optical maskless lithography: Scaling beyond the 45nm node. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 23(6). 2743–2748. 18 indexed citations
9.
Bloomstein, T. M., P Juodawlkis, R.B. Swint, et al.. (2005). Direct patterning of spin-on glass with 157nm lithography: Application to nanoscale crystal growth. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 23(6). 2617–2623. 10 indexed citations
10.
Rothschild, M., T. M. Bloomstein, Roderick R. Kunz, et al.. (2004). Liquid immersion lithography: Why, how, and when?. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 22(6). 2877–2881. 35 indexed citations
11.
Bloomstein, T. M., et al.. (2003). Angle-resolved scattering measurements of polished surfaces and optical coatings at 157 nm. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5040. 742–742. 4 indexed citations
12.
Bloomstein, T. M., Jan Sedláček, S. T. Palmacci, et al.. (2003). Contamination rates of optical surfaces at 157 nm: impurities outgassed from construction materials and from photoresists. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5040. 650–650. 2 indexed citations
13.
Bloomstein, T. M., Vladimir Liberman, M. Rothschild, et al.. (2002). Contamination rates of optical surfaces at 157 nm in the presence of hydrocarbon impurities. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4691. 709–709. 4 indexed citations
14.
Bloomstein, T. M., Vladimir Liberman, M. Rothschild, et al.. (2001). UV cleaning of contaminated 157-nm reticles. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4346. 669–669. 4 indexed citations
15.
Kunz, Roderick R., et al.. (1999). Outlook for 157 nm resist design. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 17(6). 3267–3272. 34 indexed citations
16.
Rothschild, M., T. M. Bloomstein, T. H. Fedynyshyn, et al.. (1999). 157 nm: Deepest deep-ultraviolet yet. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 17(6). 3262–3266. 41 indexed citations
17.
Bloomstein, T. M., Vladimir Liberman, M. Rothschild, D. E. Hardy, & Russell B. Goodman. (1999). Optical materials and coatings at 157 nm. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3676. 342–342. 11 indexed citations
18.
Kunz, Roderick R., et al.. (1999). Outlook for 157-nm resist design. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3678. 13–13. 42 indexed citations
19.
Bloomstein, T. M., et al.. (1998). Critical issues in 157 nm lithography. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 16(6). 3154–3157. 51 indexed citations
20.
Hilmer, R. V., R. W. Spiro, G. H. Voigt, et al.. (1993). Status of the Development of the Magnetospheric Specification and Forecast Model. 2. 467. 7 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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