Roderick R. Kunz

3.1k total citations
130 papers, 2.5k citations indexed

About

Roderick R. Kunz is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Spectroscopy. According to data from OpenAlex, Roderick R. Kunz has authored 130 papers receiving a total of 2.5k indexed citations (citations by other indexed papers that have themselves been cited), including 89 papers in Electrical and Electronic Engineering, 55 papers in Biomedical Engineering and 25 papers in Spectroscopy. Recurrent topics in Roderick R. Kunz's work include Advancements in Photolithography Techniques (70 papers), Nanofabrication and Lithography Techniques (29 papers) and Semiconductor materials and devices (21 papers). Roderick R. Kunz is often cited by papers focused on Advancements in Photolithography Techniques (70 papers), Nanofabrication and Lithography Techniques (29 papers) and Semiconductor materials and devices (21 papers). Roderick R. Kunz collaborates with scholars based in United States, Switzerland and Germany. Roderick R. Kunz's co-authors include M. Rothschild, T. M. Mayer, S. M. Gates, C. Michael Greenlief, Robert D. Allen, S. T. Palmacci, Russell B. Goodman, T. M. Bloomstein, Adam E. Cohen and Mark W. Horn and has published in prestigious journals such as Journal of the American Chemical Society, Nano Letters and Applied Physics Letters.

In The Last Decade

Roderick R. Kunz

128 papers receiving 2.3k citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Roderick R. Kunz United States 30 1.4k 1.0k 511 427 352 130 2.5k
L.J. van IJzendoorn Netherlands 26 1.8k 1.3× 1.1k 1.0× 894 1.7× 164 0.4× 227 0.6× 129 3.5k
Bo Zheng China 30 1.8k 1.3× 2.5k 2.4× 1.2k 2.3× 194 0.5× 165 0.5× 103 3.9k
Karsten Hinrichs Germany 30 1.2k 0.8× 877 0.8× 836 1.6× 482 1.1× 93 0.3× 164 2.8k
James N. Hilfiker United States 24 966 0.7× 522 0.5× 763 1.5× 238 0.6× 207 0.6× 79 2.0k
Greg Gillen United States 30 1.1k 0.8× 732 0.7× 960 1.9× 211 0.5× 1.4k 3.9× 111 3.0k
Ronald L. Jones United States 32 721 0.5× 874 0.8× 1.4k 2.8× 546 1.3× 240 0.7× 123 3.0k
J. J. Benattar France 24 531 0.4× 381 0.4× 704 1.4× 481 1.1× 182 0.5× 74 2.2k
Dominique Ausserré France 25 569 0.4× 539 0.5× 1.1k 2.1× 560 1.3× 426 1.2× 63 2.2k
J. Bennett United States 19 968 0.7× 575 0.6× 389 0.8× 103 0.2× 376 1.1× 76 1.7k
Wilford N. Hansen United States 28 1.1k 0.7× 476 0.5× 671 1.3× 311 0.7× 133 0.4× 62 2.6k

Countries citing papers authored by Roderick R. Kunz

Since Specialization
Citations

This map shows the geographic impact of Roderick R. Kunz's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Roderick R. Kunz with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Roderick R. Kunz more than expected).

Fields of papers citing papers by Roderick R. Kunz

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Roderick R. Kunz. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Roderick R. Kunz. The network helps show where Roderick R. Kunz may publish in the future.

Co-authorship network of co-authors of Roderick R. Kunz

This figure shows the co-authorship network connecting the top 25 collaborators of Roderick R. Kunz. A scholar is included among the top collaborators of Roderick R. Kunz based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Roderick R. Kunz. Roderick R. Kunz is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Ong, Ta‐Hsuan, et al.. (2022). Vapor Signatures of Double-Base Smokeless Powders and Gunshot Residues for Supporting Canine Odor Imprinting. ACS Omega. 7(26). 22567–22576. 4 indexed citations
2.
Chan, Leslie W., et al.. (2020). Engineering synthetic breath biomarkers for respiratory disease. Nature Nanotechnology. 15(9). 792–800. 65 indexed citations
3.
Wen, Patrick Y., et al.. (2020). Optimization of ultraviolet Raman spectroscopy for trace explosive checkpoint screening. Analytical and Bioanalytical Chemistry. 412(19). 4495–4504. 11 indexed citations
4.
Ong, Ta‐Hsuan, et al.. (2017). Use of Mass Spectrometric Vapor Analysis To Improve Canine Explosive Detection Efficiency. Analytical Chemistry. 89(12). 6482–6490. 41 indexed citations
5.
Wynn, Charles M., et al.. (2016). Use of photoacoustic excitation and laser vibrometry to remotely detect trace explosives. Applied Optics. 55(32). 9054–9054. 6 indexed citations
6.
Wynn, Charles M., S. T. Palmacci, Roderick R. Kunz, & Matthew J. Aernecke. (2011). Noncontact optical detection of explosive particles via photodissociation followed by laser-induced fluorescence. Optics Express. 19(19). 18671–18671. 26 indexed citations
7.
Wynn, Charles M., S. T. Palmacci, Roderick R. Kunz, & M. Rothschild. (2010). Noncontact detection of homemade explosive constituents via photodissociation followed by laser-induced fluorescence. Optics Express. 18(6). 5399–5399. 42 indexed citations
8.
Wynn, Charles M., et al.. (2008). Detection of condensed-phase explosives via laser-induced vaporization, photodissociation, and resonant excitation. Applied Optics. 47(31). 5767–5767. 33 indexed citations
9.
Switkes, M., T. M. Bloomstein, Roderick R. Kunz, et al.. (2004). Scattering in liquid immersion lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5377. 469–469. 5 indexed citations
10.
French, Roger H., Robert C. Wheland, Weiming Qiu, et al.. (2002). 157-nm pellicles: polymer design for transparency and lifetime. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4691. 576–576. 12 indexed citations
11.
Fedynyshyn, Theodore H., et al.. (2002). Fluoroaromatic Resists for 157-nm Lithography.. Journal of Photopolymer Science and Technology. 15(4). 655–666. 2 indexed citations
12.
Cohen, Adam E. & Roderick R. Kunz. (2000). Large-area interdigitated array microelectrodes for electrochemical sensing. Sensors and Actuators B Chemical. 62(1). 23–29. 82 indexed citations
13.
Kunz, Roderick R., et al.. (2000). Experimentation and modeling of organic photocontamination on lithographic optics. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 18(3). 1306–1313. 35 indexed citations
14.
Kunz, Roderick R., et al.. (2000). Experimentation and modeling of organic photocontamination on lithographic optics. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4000. 474–474. 7 indexed citations
15.
Liberman, Vladimir, et al.. (1998). Damage testing of pellicles for 193-nm lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3334. 480–480. 1 indexed citations
16.
Allen, Robert D., Ratnam Sooriyakumaran, Gregory M. Wallraff, et al.. (1996). Protecting groups for 193-nm photoresists. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2724. 334–334. 13 indexed citations
17.
Kunz, Roderick R., Mark A. Hartney, & M. Rothschild. (1993). Resist alternatives for sub-035-μm lithography by using highly attenuated radiation. Applied Optics. 32(34). 7032–7032. 1 indexed citations
18.
Rothschild, M., Russell B. Goodman, Mark A. Hartney, et al.. (1992). Photolithography at 193 nm. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 10(6). 2989–2996. 15 indexed citations
19.
Kunz, Roderick R., Mark W. Horn, Russell B. Goodman, et al.. (1990). Polysilyne thin films as resists for deep ultraviolet lithography. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 8(6). 1820–1825. 12 indexed citations
20.
Hartney, Mark A., Roderick R. Kunz, Daniel J. Ehrlich, & David C. Shaver. (1990). Silylation processes for 193-nm excimer laser lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1262. 119–119. 17 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact

Breakdown of academic impact, for papers by L.J. van IJzendoorn Breakdown of academic impact, for papers by Bo Zheng Breakdown of academic impact, for papers by Karsten Hinrichs Breakdown of academic impact, for papers by James N. Hilfiker Breakdown of academic impact, for papers by Greg Gillen Breakdown of academic impact, for papers by Ronald L. Jones Breakdown of academic impact, for papers by J. J. Benattar Breakdown of academic impact, for papers by Dominique Ausserré Breakdown of academic impact, for papers by J. Bennett Breakdown of academic impact, for papers by Wilford N. Hansen
Rankless by CCL
2026