T. M. Bloomstein

1.1k citations

47 papers · 829 indexed · h-index 16

Impact in

Surfaces, Coatings and Films top 5%
- Optical Coatings and Gratings
Biomedical Engineering top 5%
- Nanofabrication and Lithography Techniques
- Advanced Surface Polishing Techniques
- Plasmonic and Surface Plasmon Research

Papers in

Surfaces, Coatings and Films 15
- Optical Coatings and Gratings 11
Computational Mechanics 16
- Laser Material Processing Techniques 9
- Surface Roughness and Optical Measurements 8

Co-authors: M. Rothschild D. E. Hardy Roderick R. Kunz Russell B. Goodman S. T. Palmacci Vladimir Liberman D. J. Ehrlich M. Switkes
Journals: Applied Physics Letters (2 papers)Journal of Photopolymer Science and Technology (2 papers)Optics Express (1 paper)Applied Surface Science (1 paper)Journal of Biomechanical Engineering (1 paper)
Partner nations: United States Belgium

In The Last Decade

T. M. Bloomstein

47 papers receiving 750 citations

Peers

Countries citing papers authored by T. M. Bloomstein

Since Specialization

Citations

This map shows the geographic impact of T. M. Bloomstein's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by T. M. Bloomstein with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites T. M. Bloomstein more than expected).

Fields of papers citing papers by T. M. Bloomstein

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by T. M. Bloomstein. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by T. M. Bloomstein. The network helps show where T. M. Bloomstein may publish in the future.

Co-authors

The 25 scholars most cited alongside T. M. Bloomstein, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with T. M. Bloomstein Line = papers co-authored together T. M. Bloomstein links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	A Nanoparticle Convective Directed Assembly Process for the Fabrication of Periodic Surface Enhanced Raman Spectroscopy Substrates Advanced Materials ·Vladimir Liberman, Cihan Yılmaz, T. M. Bloomstein, Jia-Li Jiang, Yolanda Echegoyen Sanz, Ahmed Busnaina, M. Don Carriker, K. E. Krohn, 宮下冨士弥, M. Rothschild	2010	98
2	22-nm immersion interference lithography Optics Express ·T. M. Bloomstein, 宮下冨士弥, S. Deneault, D. E. Hardy, M. Rothschild	2006	52
3	Nanoscale selective area epitaxy: towards lithographically defined quantum dots at 1.5 /spl mu/m using direct lithographic patterning R.B. Swint, P Juodawlkis, Douglas C. Oakley, A. Napoleone, C.J. Vineis, 要猿谷, G. W. Turner, J.C. Twichell, T. M. Bloomstein, M. Don Carriker, N. N. Efremow, D. E. Hardy, 宮下冨士弥, M. Rothschild	2005	2
4	A 157-nm immersion microstepper M. Switkes, T. M. Bloomstein, M. Rothschild, 洋平佐藤, J Mousselon	2005	2
5	Experimental measurements of diffraction for periodic patterns by 193-nm polarized radiation compared to rigorous EMF simulations Eva Sandbiller, Andrew Grenville, Scott D. Hector, Sonia Cleofe Huayhuacuri Rojas, Leonardus H. A. Leunissen, Vicky Philipsen, T. M. Bloomstein, D. E. Hardy, M. Rothschild, James N. Hilfiker	2005	7
6	Hybrid optical maskless lithography: Scaling beyond the 45nm node Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·M. Fritze, T. M. Bloomstein, Brian Tyrrell, T. H. Fedynyshyn, N. N. Efremow, D. E. Hardy, M. Don Carriker, D. M. Lennon, S. J. Spector, M. Rothschild, Vladimir Merchán-Jaimes	2005	18
7	Direct patterning of spin-on glass with 157nm lithography: Application to nanoscale crystal growth Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·T. M. Bloomstein, P Juodawlkis, R.B. Swint, M. Don Carriker, S. Deneault, N. N. Efremow, D. E. Hardy, 宮下冨士弥, A. Napoleone, Douglas C. Oakley, M. Rothschild	2005	10
8	Liquid immersion lithography: Why, how, and when? Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·M. Rothschild, T. M. Bloomstein, Roderick R. Kunz, You Peng, M. Switkes, S. T. Palmacci, Jan Sedláček, D. E. Hardy, Andrew Grenville	2004	35
9	Scattering in liquid immersion lithography Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·M. Switkes, T. M. Bloomstein, Roderick R. Kunz, M. Rothschild, Jeffrey W. Ruberti, Timothy A. Shedd, Michael Yeung	2004	5
10	Angle-resolved scattering measurements of polished surfaces and optical coatings at 157 nm Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·T. M. Bloomstein, D. E. Hardy, Leif Hugo Hansen, M. Rothschild	2003	4
11	Contamination rates of optical surfaces at 157 nm in the presence of hydrocarbon impurities Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·T. M. Bloomstein, Vladimir Liberman, M. Rothschild, S. T. Palmacci, D. E. Hardy, Jan Sedláček	2002	4
12	UV cleaning of contaminated 157-nm reticles Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·T. M. Bloomstein, Vladimir Liberman, M. Rothschild, N. N. Efremow, D. E. Hardy, S. T. Palmacci	2001	4
13	Review of technology for 157-nm lithography IBM Journal of Research and Development ·Kopp Benjamin, M. Rothschild, T. M. Bloomstein, T. H. Fedynyshyn, Roderick R. Kunz, Vladimir Liberman, M. Switkes	2001	44
14	Interference lithography at 157 nm Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·M. Switkes, T. M. Bloomstein, M. Rothschild	2000	2
15	Outlook for 157 nm resist design Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Roderick R. Kunz, T. M. Bloomstein, D. E. Hardy, Russell B. Goodman, Genecin, Almala Pınar Ulutaş	1999	34
16	Contoured Elastic-Membrane Microvalves for Microfluidic Network Integration Journal of Biomechanical Engineering ·Anthony Young, T. M. Bloomstein, S. T. Palmacci	1999	10
17	<title>Laser micromachining of silicon: a new technique for fabricating terahertz imaging arrays</title> Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Christopher K. Walker, Aimee Hungerford, Gopal Narayanan, Christopher Groppi, T. M. Bloomstein, S. T. Palmacci, Margaret B. Stern, Almala Pınar Ulutaş	1998	5
18	LASER MICROMACHINING OF SILICON: A NEW TECHNIQUE FOR FABRICATING HIGH QUALITY TERAHERTZ WAVEGUIDE COMPONENTS' Softwaretechnik-Trends ·C. K. Walker, Gopal Narayanan, Simona Boyadzhiyska, Maureen Romero, J. Glenn, Aimee Hungerford, T. M. Bloomstein, S. T. Palmacci, M. B. Stern, Almala Pınar Ulutaş	1997	28
19	Laser-chemical three-dimensional writing for microelectromechanics and application to standard-cell microfluidics Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·T. M. Bloomstein, D. J. Ehrlich	1992	19
20	Stereo laser micromachining of silicon Applied Physics Letters ·T. M. Bloomstein, D. J. Ehrlich	1992	28

About T. M. Bloomstein

T. M. Bloomstein is a scholar working on Surfaces, Coatings and Films, Computational Mechanics, Electrical and Electronic Engineering, Biomedical Engineering and Ophthalmology, having authored 47 papers that have together received 829 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (28 papers), Nanofabrication and Lithography Techniques (14 papers), Advanced Surface Polishing Techniques (11 papers), Optical Coatings and Gratings (11 papers), Laser Material Processing Techniques (9 papers), Surface Roughness and Optical Measurements (8 papers), 3D IC and TSV technologies (6 papers) and Laser Design and Applications (4 papers). The work is most often cited by research in Surfaces, Coatings and Films (143 citations), Biomedical Engineering (484 citations), Electrical and Electronic Engineering (472 citations), Electronic, Optical and Magnetic Materials (127 citations) and Computational Mechanics (115 citations). T. M. Bloomstein has collaborated with scholars based in United States and Belgium. Frequent co-authors include M. Rothschild, D. E. Hardy, Roderick R. Kunz, Russell B. Goodman, S. T. Palmacci, Vladimir Liberman, D. J. Ehrlich, M. Switkes, T. H. Fedynyshyn and Mark W. Horn. Their work appears in journals such as Applied Physics Letters, Journal of Photopolymer Science and Technology, Optics Express, Applied Surface Science and Journal of Biomechanical Engineering.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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