Y. Akasaka

863 total citations
70 papers, 639 citations indexed

About

Y. Akasaka is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, Y. Akasaka has authored 70 papers receiving a total of 639 indexed citations (citations by other indexed papers that have themselves been cited), including 69 papers in Electrical and Electronic Engineering, 20 papers in Atomic and Molecular Physics, and Optics and 8 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in Y. Akasaka's work include Semiconductor materials and devices (64 papers), Advancements in Semiconductor Devices and Circuit Design (46 papers) and Integrated Circuits and Semiconductor Failure Analysis (20 papers). Y. Akasaka is often cited by papers focused on Semiconductor materials and devices (64 papers), Advancements in Semiconductor Devices and Circuit Design (46 papers) and Integrated Circuits and Semiconductor Failure Analysis (20 papers). Y. Akasaka collaborates with scholars based in Japan, United States and Egypt. Y. Akasaka's co-authors include Kenji Shiraishi, Toyohiro Chikyow, T. Arikado, Kazuyoshi Torii, Yasuo Nara, Keisaku Yamada, Hiroshi Kitajima, Kiyomi Nakajima, Mitsuru KONNO and K. Suguro and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Physical Review B.

In The Last Decade

Y. Akasaka

63 papers receiving 598 citations

Peers

Countries citing papers authored by Y. Akasaka

Since Specialization

Citations

This map shows the geographic impact of Y. Akasaka's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Y. Akasaka with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Y. Akasaka more than expected).

Fields of papers citing papers by Y. Akasaka

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Y. Akasaka. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Y. Akasaka. The network helps show where Y. Akasaka may publish in the future.

Co-authorship network of co-authors of Y. Akasaka

This figure shows the co-authorship network connecting the top 25 collaborators of Y. Akasaka. A scholar is included among the top collaborators of Y. Akasaka based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Y. Akasaka. Y. Akasaka is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	High Mobility SiGe p-Channel Metal–Oxide–Semiconductor Field-Effect Transistors Epitaxially Grown on Si(100) Substrates with HfSiO₂ High-k Dielectric and Metal Gate 2009 ·Japanese Journal of Applied Physics ·Jungwoo Oh, Prashant Majhi, Chang Yong Kang, Raj Jammy, (unknown), (unknown), Y. Akasaka, (unknown), T. Arikado, (unknown)	3
2	Additive mobility enhancement and off-state current reduction in SiGe channel pMOSFETs with optimized Si Cap and high-k metal gate stacks 2009 ·Jungwoo Oh, Prashant Majhi, Raj Jammy, (unknown), (unknown), (unknown), Y. Akasaka, (unknown), T. Arikado, (unknown)	9
3	Influences of annealing in reducing and oxidizing ambients on flatband voltage properties of HfO2 gate stack structures 2007 ·Journal of Applied Physics ·Kenji Ohmori, Parhat Ahmet, Michiko Yoshitake, Toyohiro Chikyow, Kenji Shiraishi, Kikuo Yamabe, Heiji Watanabe, Y. Akasaka, Yasuo Nara, Kao‐Shuo Chang, (unknown), K. Yamada	15
4	Characterization of Metal/High-k Structures Using Monoenergetic Positron Beams 2007 ·Japanese Journal of Applied Physics ·Akira Uedono, (unknown), (unknown), (unknown), Kenji Shiraishi, Kikuo Yamabe, Seiichi Miyazaki, Heiji Watanabe, Naoto Umezawa, Toyohiro Chikyow, Toshiyuki Ohdaira, Ryoichi Suzuki, Y. Akasaka, Satoshi Kamiyama, Yasuo Nara, Keisaku Yamada	7
5	A Novel Remote Reactive Sink Layer Technique for the Control of N and O Concentrations in Metal/High-k Gate Stacks 2006 ·Y. Akasaka, Kenji Shiraishi, Naoto Umezawa, (unknown), (unknown), Toyohiro Chikyow, (unknown), Yasuo Nara, Nobuo Nakamura	5
6	Wide Controllability of Flatband Voltage in La2O3 Gate Stack Structures - Remarkable Advantages of La2O3 over HfO2 - 2006 ·ECS Transactions ·Kenji Ohmori, Parhat Ahmet, Kenji Shiraishi, Kikuo Yamabe, Heiji Watanabe, Y. Akasaka, Naoto Umezawa, Kiyomi Nakajima, Michiko Yoshitake, Takashi Nakayama, (unknown), Kuniyuki Kakushima, Yasuo Nara, Martin L. Green, Hiroshi Iwai, Keisaku Yamada, Toyohiro Chikyow	1
7	Theoretical Studies on the Physical Properties of Poly-Si and Metal Gates/HfO2 Related High-k Dielectrics Interfaces 2006 ·ECS Transactions ·Kenji Shiraishi, Kazuyoshi Torii, Y. Akasaka, Takashi Nakayama, (unknown), Seiichi Miyazaki, Toyohiro Chikyow, Keisaku Yamada, Yasuo Nara	1
8	Impact of electrode-side chemical structures on electron mobility in metal/ HfO/sub 2/ MISFETs with sub-1nm EOT 2005 ·Y. Akasaka, (unknown), Takayoshi Sasaki, Kenji Shiraishi, Satoshi Kamiyama, (unknown), (unknown), Yasuo Nara	6
9	Oxygen-vacancy-induced threshold voltage shifts in Hf-related high-k gate stacks 2005 ·Thin Solid Films ·Kenji Shiraishi, Keisaku Yamada, Kazuyoshi Torii, Y. Akasaka, Kiyomi Nakajima, Mitsuru KONNO, Toyohiro Chikyow, Hiroshi Kitajima, T. Arikado, Yasuo Nara	41
10	Gate-last MISFET structures and process for high-k and metal gate MISFETs characterization 2004 ·Takeo Matsuki, Kazuyoshi Torii, (unknown), (unknown), (unknown), Y. Akasaka, Kiyoshi Hayashi, N. Kasai, T. Arikado	1
11	Oxygen Vacancy Induced Substantial Threshold Voltage Shifts in the Hf-based High-KMISFET with p+poly-Si Gates -A Theoretical Approach 2004 ·Japanese Journal of Applied Physics ·Kenji Shiraishi, Keisaku Yamada, Kazuyoshi Torii, Y. Akasaka, Kiyomi Nakajima, Mitsuru KONNO, Toyohiro Chikyow, Hiroshi Kitajima, T. Arikado	114
12	W/WNx/poly-Si gate technology for future high speed deep submicron CMOS LSIs 2002 ·(unknown), Y. Akasaka, K. Nakajima, (unknown), K. Suguro, H. Oyamatsu, M. Kinugawa, M. Kakumu	1
13	Damascene metal gate technology 2001 ·K. Nakajima, Y. Akasaka, (unknown), (unknown), (unknown), K. Suguro	1
14	High performance damascene metal gate MOSFETs for 0.1 μm regime 2000 ·IEEE Transactions on Electron Devices ·A. Yagishita, Tomohiro Saito, K. Nakajima, Seiji Inumiya, Y. Akasaka, Yoshio Ozawa, K. Hieda, Y. Tsunashima, K. Suguro, T. Arikado, Katsuya Okumura	27
15	Work function controlled metal gate electrode on ultrathin gate insulators 1999 ·K. Nakajima, Y. Akasaka, M. Kaneko, (unknown), (unknown), Takashi Shimizu, Yoshio Ozawa, K. Suguro	21
16	Highly Uniform Low-Pressure Chemical Vapor Deposition (LP-CVD) of Si₃N₄ Film on Tungsten for Advanced Low-Resistivity “Polymetal” Gate Interconnects 1999 ·Japanese Journal of Applied Physics ·Y. Akasaka, (unknown), (unknown), Satoko Tanaka, K. Suguro	0
17	Plasma-Damage-Free Gate Process Using Chemical Mechanical Polishing for 0.1 µm MOSFETs 1999 ·Japanese Journal of Applied Physics ·(unknown), Atsushi Yagishita, Seiji Inumiya, (unknown), Y. Akasaka, Yoshio Ozawa, Hiroyuki Yano, (unknown), T. Arikado, Katsuya Okumura	3
18	Plasma Damage Free Gate Process Using CMP for 0.1um MOSFETs 1998 ·Tomohiro Saito, Atsushi Yagishita, Seiji Inumiya, (unknown), Y. Akasaka, Yoshio Ozawa, Hiroyuki Yano, K. Hieda, K. Suguro, T. Arikado, Katsuya Okumura	1
19	Formation of PZT Films by MOCVD 1991 ·(unknown), H. Itoh, K. Tsukamoto, Y. Akasaka	1
20	MeV-Boron Implanted Buried Barrier for Soft Error Reduction in Megabit DRAM 1987 ·Yoshiki Matsuda, K. Tsukamoto, M. Inuishi, (unknown), (unknown), K. Fujishima, (unknown), Y. Akasaka	4

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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