K. Reid

630 citations

22 papers · 381 indexed · h-index 8

Impact in

Electrical and Electronic Engineering top 10%
- Semiconductor materials and devices
- Advancements in Semiconductor Devices and Circuit Design
- Advanced Memory and Neural Computing
- Integrated Circuits and Semiconductor Failure Analysis
Materials Chemistry
- Graphene research and applications
- Electronic and Structural Properties of Oxides

Papers in

Condensed Matter Physics 5
- GaN-based semiconductor devices and materials 5
Electrical and Electronic Engineering 21
- Semiconductor materials and devices 19
- Advancements in Semiconductor Devices and Circuit Design 7
- Advanced Memory and Neural Computing 5
- Ferroelectric and Negative Capacitance Devices 4
- Integrated Circuits and Semiconductor Failure Analysis 3

Co-authors: B. Maiti Philip J. Tobin Sergio A. Ajuria Rama I. Hegde S. M. Bedair B. T. McDermott R. I. Hegde N. A. El-Masry
Journals: Applied Physics Letters (4 papers)IEEE Electron Device Letters (2 papers)Journal of The Electrochemical Society (2 papers)Thin Solid Films (2 papers)Langmuir (1 paper)
Partner nations: United States Japan

In The Last Decade

K. Reid

21 papers receiving 366 citations

Peers

Countries citing papers authored by K. Reid

Since Specialization

Citations

This map shows the geographic impact of K. Reid's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by K. Reid with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites K. Reid more than expected).

Fields of papers citing papers by K. Reid

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by K. Reid. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by K. Reid. The network helps show where K. Reid may publish in the future.

Co-authorship network

The 25 scholars most cited alongside K. Reid, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with K. Reid Line = papers co-authored together K. Reid links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	Atomic Layer Epitaxy of h-BN(0001) Multilayers on Co(0001) and Molecular Beam Epitaxy Growth of Graphene on h-BN(0001)/Co(0001) Langmuir ·M. Sky Driver, Abeer Farahat, Rosdeni Arifin, K. Reid, Ashutosh Rath, Paul M. Voyles, Jeffry A. Kelber	2016	55
2	Electrical and materials properties of AlN/ HfO2 high-k stack with a metal gate Thin Solid Films ·K. Reid, Wang Zuo-h, Sadao Sasaki, Dina H. Triyoso, S. Samavedam, D. C. Gilmer, Chris Twin	2008	7
3	Development of Aluminum Nitride by Molecular Layer Deposition using Trimethylaluminum and Ammonia ECS Meeting Abstracts ·K. Reid, Wang Zuo-h, Sadao Sasaki	2006	1
4	Suppression of MOSFET reverse short channel effect by N/sub 2/O gate poly reoxidation process Pei-Ling Tsui, N.I. Tsytsyura, M. Orłowski, Shih-Wei Sun, P.J. Tobin, K. Reid, W. Taylor	2002	1
5	Optimization of a 0.18 μm 1.5 V CMOS technology to achieve 15 ps gate delay Annata R Sullivan, ГАРАСАЕВ А.М., Abdelhalim Boukaba, S.G.H. Anderson, Robert A. Woodruff, Veena Misra, Tomonori Okuda, K. Reid, G.P. Coleman, Promotion GGRC, Marie San, Daniel Jesper, Elsa Susanna Fitri Tanjung, Monika B. Choure, S. Veeraraghavan	2002	0
6	High performance 20 Å NO oxynitride for gate dielectric in deep subquarter micron CMOS technology B. Maiti, P.J. Tobin, Veena Misra, R. I. Hegde, K. Reid, Jiangang Zheng	2002	7
7	Sub-quarter micron CMOS process for TiN-gate MOSFETs with TiO/sub 2/ gate dielectric formed by titanium oxidation Chris Hobbs, R. I. Hegde, B. Maiti, Hsin Tseng, D. C. Gilmer, P.J. Tobin, Érick Soares dos Reis, عامر عبداللطيف حسين, Kueh Hwa Ik, Arik Messermann, Daniel Jesper, K. Reid, L.B. La, Sumiyo Tanigawa, D. Kim	1999	2
8	Tantalum Pentoxide Gate Dielectrics Formed by Tantalum Oxidation MRS Proceedings ·C. Hobbs, R. I. Hegde, B. Maiti, Arik Messermann, L.B. La, K. Reid, Wang Zuo-h, Sumiyo Tanigawa, J. Conner, V. Kaushik, L. Prabhu, Assaf Y. Anderson, S. Bagchi, Kimberley Collette, Philip J. Tobin	1999	1
9	MOCVD of High-K Dielectrics and Conductive Metal Nitride Thin Films MRS Proceedings ·将夫高橋, Richard F. Hamilton, K. Reid, C. Hobbs, Tommaso Brotto, Sebastián Rodríguez Leiva	1999	1
10	Surface and Interface Roughness of Ultrathin Nitric Oxide Oxynitride Gate Dielectric Journal of The Electrochemical Society ·Rama I. Hegde, B. Maiti, S. Raghaw, K. Reid, Philip J. Tobin	1998	6
11	Oxynitride gate dielectric grown in nitric oxide (NO): the effect of reoxidation on dielectric reliability of the active edge IEEE Electron Device Letters ·B. Maiti, Philip J. Tobin, 直子伊豫本, K. Reid, Sergio A. Ajuria, R. I. Hegde, V. Kaushik	1996	10
12	High Temperature Thermal Processing for Ulsi Applications MRS Proceedings ·K. Reid, Perera S	1995	2
13	Growth and surface chemistry of oxynitride gate dielectric using nitric oxide Applied Physics Letters ·Rama I. Hegde, Philip J. Tobin, K. Reid, B. Maiti, Sergio A. Ajuria	1995	117
14	Uniformity of the N 2 O Furnace Oxynitride Process for the Formation of Thin Tunnel Dielectrics Journal of The Electrochemical Society ·Yoshio Okada, Philip J. Tobin, K. Reid, Rama I. Hegde, Sergio A. Ajuria	1994	2
15	The impact of short exposure times on the ALE self-limiting process: potential mechanisms Thin Solid Films ·K. Reid, A. F. Myers, N. A. El-Masry, S. M. Bedair	1993	6
16	Role of trimethylgallium exposure time in carbon doping and high temperature atomic layer epitaxy of GaAs Applied Physics Letters ·K. Reid, Zelda B. Dvoretzky, S. M. Bedair	1991	16
17	Atomic layer epitaxy of planar-doped structures for nonalloyed contacts and field-effect transistor Applied Physics Letters ·M. Hashemi, J. Ramdani, B. T. McDermott, K. Reid, S. M. Bedair	1990	15
18	Atomic layer epitaxy of GaInP ordered alloy Applied Physics Letters ·B. T. McDermott, K. Reid, N. A. El-Masry, S. M. Bedair, W. M. Duncan, Xin Yin, Fred H. Pollak	1990	58
19	Extremely low-leakage GaAs P-i-N junctions and memory capacitors grown by atomic layer epitaxy IEEE Electron Device Letters ·S. M. Bedair, B. T. McDermott, K. Reid, Philip G. Neudeck, James A. Cooper, M. R. Melloch	1990	10
20	Photoreflectance of a GaAs/In_0.5 Ga_0.5 P (ordered) Single Quantum Well Grown by Atomic Layer Epitaxy MRS Proceedings ·Xin Yin, Fred H. Pollak, B. T. McDermott, K. Reid, S. M. Bedair	1989	1

About K. Reid

K. Reid is a scholar working on Condensed Matter Physics, Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics, Mechanics of Materials and Electronic, Optical and Magnetic Materials, having authored 22 papers that have together received 381 indexed citations. Recurring topics across this work include Semiconductor materials and devices (19 papers), Advancements in Semiconductor Devices and Circuit Design (7 papers), Semiconductor Quantum Structures and Devices (5 papers), Advanced Memory and Neural Computing (5 papers), GaN-based semiconductor devices and materials (5 papers), Ferroelectric and Negative Capacitance Devices (4 papers), Integrated Circuits and Semiconductor Failure Analysis (3 papers) and Metal and Thin Film Mechanics (3 papers). The work is most often cited by research in Electrical and Electronic Engineering (320 citations), Materials Chemistry (168 citations), Condensed Matter Physics (37 citations), Atomic and Molecular Physics, and Optics (91 citations) and Surfaces, Coatings and Films (16 citations). K. Reid has collaborated with scholars based in United States and Japan. Frequent co-authors include B. Maiti, Philip J. Tobin, Sergio A. Ajuria, Rama I. Hegde, S. M. Bedair, B. T. McDermott, R. I. Hegde, N. A. El-Masry, W. M. Duncan and Xin Yin. Their work appears in journals such as Applied Physics Letters, IEEE Electron Device Letters, Journal of The Electrochemical Society, Thin Solid Films and Langmuir.

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