S. List

702 citations

30 papers · 526 indexed · h-index 13

Surfaces, Coatings and Films top 5%
- Electron and X-Ray Spectroscopy Techniques 4
Structural Biology top 10%
Electrical and Electronic Engineering top 10%
- Semiconductor materials and devices 9
- Integrated Circuits and Semiconductor Failure Analysis 8
- Silicon and Solar Cell Technologies 7
- Advancements in Photolithography Techniques 5
- Electromagnetic Compatibility and Noise Suppression 3
Electronic, Optical and Magnetic Materials
- Copper Interconnects and Reliability 7
Radiation top 10%
Atomic and Molecular Physics, and Optics
- Semiconductor materials and interfaces 5

Co-authors: J. S. Chawla R. Joseph Kline Daniel F. Sunday John S. Villarrubia Bin Ming András Vládar M. Kobrinsky S. Chakravarty
Cited by: Surfaces, Coatings and Films Structural Biology Electrical and Electronic Engineering
Journals: Journal of Applied Physics (4 papers)Microelectronic Engineering (3 papers)Applied Physics Letters (2 papers)
Partner nations: United States Belgium Germany

In The Last Decade

S. List

29 papers receiving 499 citations

Peers

Countries citing papers authored by S. List

Since Specialization

Citations

This map shows the geographic impact of S. List's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by S. List with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites S. List more than expected).

Fields of papers citing papers by S. List

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by S. List. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by S. List. The network helps show where S. List may publish in the future.

Co-authorship network

The 25 scholars most cited alongside S. List, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with S. List Line = papers co-authored together S. List links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	Scanning electron microscope measurement of width and shape of 10 nm patterned lines using a JMONSEL-modeled library Ultramicroscopy ·John S. Villarrubia,András Vládar,Bin Ming,R. Joseph Kline,Daniel F. Sunday,J. S. Chawla,S. List	2015	83
2	Determining the shape and periodicity of nanostructures using small-angle X-ray scattering Journal of Applied Crystallography ·Daniel F. Sunday,S. List,J. S. Chawla,R. Joseph Kline	2015	67
3	High energy resolution electron beam spectrometer in the MeV range Journal of Instrumentation ·C. Marquet,C. Cerna,E. Chauveau,Iwona Drag Korga,Gérard Claverie,L. Daudin,G. H. Lee,A. Huber,C. Hugon,Serge Leblanc,S. List,G. Lutter,Christopher Coles,F. Perrot,F. Piquemal,Abdel Rebii,J. S. Ricol,Meiyi Wang	2015	4
4	10 nm Three-Dimensional CD-SEM Metrology \| NIST Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·András Vládar,John S. Villarrubia,Bin Ming,R. Joseph Kline,J. S. Chawla,S. List,Michael T. Postek	2014	1
5	Phase identification of self-forming Cu–Mn based diffusion barriers on p-SiOC:H and SiO2 dielectrics using x-ray absorption fine structure Applied Physics Letters ·J. M. Ablett,J. C. Woicik,Zs. Tôkei,S. List,Elaine DiMasi	2009	40
6	Depth-profiling of vertical sidewall nanolayers on structured wafers by grazing incidence X-ray flourescence Spectrochimica Acta Part B Atomic Spectroscopy ·Philipp Hönicke,Burkhard Beckhoff,Michael Kolbe,S. List,Thierry Conard,Мухамеджанова Алина Альбертовна	2008	7
7	Cu Resistivity Scaling Limits for 20nm Copper Damascene Lines Leila GHALMI,S. List,Zs. Tôkei,L. Carbonell,Sywert Brongersma,Han Liu,E. Kunnen,N. Heylen,Ivan Ciofi,O Tamminen,Enhua Ma,Csongrádi Gyöngyi,唐俊平	2007	7
8	Performance Comparison of Interconnect Technology and Architecture Options for Deep Submicron Technology Nodes R. Malazadeh A. Halajian R. Kazemi M. Bahmani A. Hoshmand,S. List,Michele Stucchi,Anne S. Verhulst,M. Van Hove,R. Cartuyvels,Gerald Beyer,Karen Maex	2006	33
9	A novel technique for full-wave modeling of large-scale three-dimensional high-speed on/off-chip interconnect structures Dan Jiao,Lara Suárez Escandón,S. Chakravarty,Changhong Dai,M. Kobrinsky,Saburo Motozawa,S. List	2003	29
10	An efficient method for modeling the effect of implant damage on NMOS devices using effective profiles and device simulation K. Vasanth,N. Simms,V.M. McNeil,S. List,J. Davis,Rano Yunusova	2002	1
11	Role of silicon surface in the removal of point defects in ultra-shallow junctions Thiago Costa de Oliveira,S. Banerjee,S. List,Леонид Михайлович Конев	2002	0
12	Evaluation of Si pre-amorphization for obtaining ultra-shallow junctions Thiago Costa de Oliveira,Sanjay K. Banerjee,S. List,G. Pollack,דר יוסי מלר ושמואל פינצי	2002	1
13	Effect of F on B penetration through gate oxide for BF/sub 2/ implants used to obtain ultra-shallow junctions by RTA Thiago Costa de Oliveira,Michael Craig,Wei Lin,S. List,Danielle McCormack,V.M. McNeil	2002	1
14	Porous Silica Xerogel Processing And Integration For Ulsi Applications MRS Proceedings ·C. Jin,S. List,E. M. Zielinski	1998	20
15	Air-gap formation during IMD deposition to lower interconnect capacitance IEEE Electron Device Letters ·Thomas D. Yi,Krishna C. Saraswat,J.P. McVittie,S. List,Somnath Nag,Józefa Malinowska-Małek,Robert Havemann	1998	44
16	An approach using a subamorphizing threshold dose silicon implant of optimal energy to achieve shallower junctions Journal of Applied Physics ·Thiago Costa de Oliveira,Sanjay K. Banerjee,S. List,V.M. McNeil	1998	18
17	Atomistic analysis of the vacancy mechanism of impurity diffusion in silicon Journal of Applied Physics ·S. List,H. Ryssel	1998	4
18	Role of silicon surface in the removal of point defects in ultrashallow junctions Applied Physics Letters ·Thiago Costa de Oliveira,S. Banerjee,S. List,M. Rödder	1996	11
19	Calculation of the transport matrix for the coupled diffusion of dopants and vacancies Journal of Applied Physics ·S. List,P. Pichler,H. Ryssel	1994	18
20	Dopant Migration Caused by Point Defect Gradients Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena ·P. Pichler,S. List	1993	1

About S. List

S. List is a scholar working on Surfaces, Coatings and Films, Structural Biology, Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Radiation, having authored 30 papers that have together received 526 indexed citations. Recurring topics across this work include Semiconductor materials and devices (9 papers), Integrated Circuits and Semiconductor Failure Analysis (8 papers), Silicon and Solar Cell Technologies (7 papers), Copper Interconnects and Reliability (7 papers), Advancements in Photolithography Techniques (5 papers), Semiconductor materials and interfaces (5 papers), Electron and X-Ray Spectroscopy Techniques (4 papers) and Electromagnetic Compatibility and Noise Suppression (3 papers). The work is most often cited by research in Surfaces, Coatings and Films (123 citations), Structural Biology (14 citations), Electrical and Electronic Engineering (393 citations), Electronic, Optical and Magnetic Materials (113 citations) and Radiation (44 citations). S. List has collaborated with scholars based in United States, Belgium and Germany. Frequent co-authors include J. S. Chawla, R. Joseph Kline, Daniel F. Sunday, John S. Villarrubia, Bin Ming, András Vládar, M. Kobrinsky, S. Chakravarty, Dan Jiao and H. Ryssel. Their work appears in journals such as Journal of Applied Physics, Microelectronic Engineering, Applied Physics Letters, IEEE Electron Device Letters and Ultramicroscopy.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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