L. Grella

770 total citations
57 papers, 522 citations indexed

About

L. Grella is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, L. Grella has authored 57 papers receiving a total of 522 indexed citations (citations by other indexed papers that have themselves been cited), including 53 papers in Electrical and Electronic Engineering, 38 papers in Surfaces, Coatings and Films and 14 papers in Biomedical Engineering. Recurrent topics in L. Grella's work include Advancements in Photolithography Techniques (45 papers), Electron and X-Ray Spectroscopy Techniques (29 papers) and Integrated Circuits and Semiconductor Failure Analysis (11 papers). L. Grella is often cited by papers focused on Advancements in Photolithography Techniques (45 papers), Electron and X-Ray Spectroscopy Techniques (29 papers) and Integrated Circuits and Semiconductor Failure Analysis (11 papers). L. Grella collaborates with scholars based in United States, Italy and Greece. L. Grella's co-authors include M. Gentili, M. Baciocchi, Enzo Di Fabrizio, Gian F. Lorusso, Barry Lai, W. Yun, David Adler, F. Cerrina, D. Legnini and Yanan Xiao and has published in prestigious journals such as Applied Physics Letters, Japanese Journal of Applied Physics and Review of Scientific Instruments.

In The Last Decade

L. Grella

52 papers receiving 487 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
L. Grella United States 14 339 183 178 145 79 57 522
Senajith Rekawa United States 12 301 0.9× 100 0.5× 148 0.8× 339 2.3× 121 1.5× 36 564
Eric Munro United Kingdom 13 338 1.0× 114 0.6× 310 1.7× 55 0.4× 124 1.6× 78 526
Yanqing Wu China 13 265 0.8× 179 1.0× 61 0.3× 118 0.8× 131 1.7× 51 427
Y. Kim United States 8 176 0.5× 59 0.3× 131 0.7× 28 0.2× 192 2.4× 18 468
Bohumila Lencová Czechia 11 186 0.5× 42 0.2× 210 1.2× 37 0.3× 80 1.0× 36 341
Alexander D. Dymnikov United States 10 164 0.5× 54 0.3× 113 0.6× 120 0.8× 29 0.4× 49 332
Stefan Wurm United States 14 505 1.5× 207 1.1× 243 1.4× 43 0.3× 97 1.2× 59 647
Shingo Takeda Japan 12 153 0.5× 81 0.4× 19 0.1× 88 0.6× 44 0.6× 39 374
S. Babin United States 13 530 1.6× 181 1.0× 304 1.7× 14 0.1× 190 2.4× 91 662

Countries citing papers authored by L. Grella

Since Specialization
Citations

This map shows the geographic impact of L. Grella's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by L. Grella with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites L. Grella more than expected).

Fields of papers citing papers by L. Grella

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by L. Grella. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by L. Grella. The network helps show where L. Grella may publish in the future.

Co-authorship network of co-authors of L. Grella

This figure shows the co-authorship network connecting the top 25 collaborators of L. Grella. A scholar is included among the top collaborators of L. Grella based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with L. Grella. L. Grella is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Grella, L., et al.. (2021). TAPERED LINK BOX SWITCH FOR MESHING LOW VOLTAGE DISTRIBUTION NETWORKS. IET conference proceedings.. 2021(6). 41–45. 1 indexed citations
2.
Brodie, Alan D., et al.. (2013). Preliminary investigation of shot noise, dose, and focus latitude for e-beam direct write. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8680. 868029–868029. 2 indexed citations
3.
McCord, M. A., et al.. (2012). REBL: design progress toward 16 nm half-pitch maskless projection electron beam lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8323. 832311–832311. 34 indexed citations
4.
McCord, M. A., et al.. (2011). New advances with REBL for maskless high-throughput EBDW lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7970. 797018–797018. 5 indexed citations
5.
McCord, M. A., et al.. (2010). Reflective electron beam lithography: A maskless ebeam direct write lithography approach using the reflective electron beam lithography concept. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 28(6). C6C6–C6C13. 16 indexed citations
6.
Marchman, Herschel M., Gian F. Lorusso, L. Grella, et al.. (2006). Electron beam based modification of lithographic materials and the impact on critical dimensional metrology. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6152. 615227–615227. 6 indexed citations
7.
Grella, L., et al.. (2004). Three-dimensional simulation of top down scanning electron microscopy images. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 22(6). 3399–3404. 12 indexed citations
8.
Grella, L., et al.. (2001). Three-dimensional simulations of SEM imaging and charging. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4344. 267–267. 5 indexed citations
9.
Raptis, I., et al.. (1996). Determination of acid diffusion and energy deposition parameters by point e-beam exposure in chemically amplified resists. Microelectronic Engineering. 30(1-4). 295–299. 13 indexed citations
10.
Fabrizio, Enzo Di, et al.. (1996). One step electron-beam lithography for multipurpose diffractive optical elements with 200 nm resolution. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 14(6). 3855–3859. 6 indexed citations
11.
Fabrizio, Enzo Di, et al.. (1995). Nanometer metrology by means of backscattered electrons. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 13(2). 321–326.
12.
Raptis, I., et al.. (1995). Development of a fast and high resolution e-beam process for the fabrication of X-ray masks with CD of 0.15 μm. Microelectronic Engineering. 27(1-4). 417–420. 4 indexed citations
13.
Baciocchi, M., et al.. (1995). High accuracy thickness measurements by means of backscattering electron metrology. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 13(6). 2676–2681. 1 indexed citations
14.
Gentili, M., Enzo Di Fabrizio, L. Grella, et al.. (1994). Fabrication of controlled slope attenuated phase-shift x-ray masks for 250 nm synchrotron lithography. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 12(6). 3954–3958. 6 indexed citations
15.
Fabrizio, Enzo Di, M. Gentili, L. Grella, et al.. (1994). High-performance multilevel blazed x-ray microscopy Fresnel zone plates: Fabricated using x-ray lithography. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 12(6). 3979–3985. 33 indexed citations
16.
Gentili, M., et al.. (1994). STM characterization of InP gratings for DFB laser fabrication. Surface and Interface Analysis. 22(1-12). 296–299. 1 indexed citations
17.
White, Victor, Sateesh S. Bajikar, Denice D. Denton, et al.. (1993). Microfabrication of phase shifting zone plates for hard x-rays. Microelectronic Engineering. 21(1-4). 99–102. 4 indexed citations
18.
Gentili, M., et al.. (1991). 0.1 μm x-ray mask replication. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 9(6). 3319–3323. 3 indexed citations
19.
Gentili, M., et al.. (1990). Resolution limitation in EBL optical grating fabrication on InGaAsP/InP substrate. Microelectronic Engineering. 11(1-4). 379–382. 2 indexed citations
20.
Gentili, M., et al.. (1990). Energy density function determination in very-high-resolution electron-beam lithography. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 8(6). 1867–1871. 25 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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