Vadim Banine

1.8k total citations
60 papers, 1.4k citations indexed

About

Vadim Banine is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, Vadim Banine has authored 60 papers receiving a total of 1.4k indexed citations (citations by other indexed papers that have themselves been cited), including 53 papers in Electrical and Electronic Engineering, 22 papers in Surfaces, Coatings and Films and 20 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in Vadim Banine's work include Advancements in Photolithography Techniques (30 papers), Plasma Diagnostics and Applications (27 papers) and Electron and X-Ray Spectroscopy Techniques (19 papers). Vadim Banine is often cited by papers focused on Advancements in Photolithography Techniques (30 papers), Plasma Diagnostics and Applications (27 papers) and Electron and X-Ray Spectroscopy Techniques (19 papers). Vadim Banine collaborates with scholars based in Netherlands, Russia and Germany. Vadim Banine's co-authors include K. N. Koshelev, G. H. P. M. Swinkels, Roel Moors, J.J.A.M. van der Mullen, J. Beckers, Jos Benschop, E. R. Kieft, R M van der Horst, Maarten M. J. W. van Herpen and Mark van de Kerkhof and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Chemical Physics Letters.

In The Last Decade

Vadim Banine

60 papers receiving 1.3k citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Vadim Banine Netherlands 23 902 527 467 255 254 60 1.4k
Takahisa Jitsuno Japan 22 648 0.7× 730 1.4× 491 1.1× 395 1.5× 223 0.9× 136 1.6k
Н. И. Чхало Russia 19 463 0.5× 326 0.6× 190 0.4× 337 1.3× 217 0.9× 117 1.3k
F. Flora Italy 21 483 0.5× 505 1.0× 463 1.0× 168 0.7× 172 0.7× 164 1.4k
M. Szczurek Poland 17 277 0.3× 534 1.0× 468 1.0× 193 0.8× 124 0.5× 97 1.1k
T. Tomimasu Japan 14 504 0.6× 309 0.6× 270 0.6× 61 0.2× 201 0.8× 139 1.0k
Torsten Feigl Germany 17 389 0.4× 451 0.9× 144 0.3× 260 1.0× 138 0.5× 81 1.1k
R. Pantel France 23 1.6k 1.8× 722 1.4× 225 0.5× 82 0.3× 379 1.5× 98 2.1k
H. Nakano Japan 22 777 0.9× 429 0.8× 272 0.6× 92 0.4× 469 1.8× 154 1.8k
Yasunori Yamamura Japan 12 652 0.7× 157 0.3× 591 1.3× 948 3.7× 766 3.0× 30 1.6k
S. Biri Hungary 19 461 0.5× 216 0.4× 78 0.2× 166 0.7× 188 0.7× 119 1.1k

Countries citing papers authored by Vadim Banine

Since Specialization
Citations

This map shows the geographic impact of Vadim Banine's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Vadim Banine with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Vadim Banine more than expected).

Fields of papers citing papers by Vadim Banine

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Vadim Banine. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Vadim Banine. The network helps show where Vadim Banine may publish in the future.

Co-authorship network of co-authors of Vadim Banine

This figure shows the co-authorship network connecting the top 25 collaborators of Vadim Banine. A scholar is included among the top collaborators of Vadim Banine based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Vadim Banine. Vadim Banine is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Kerkhof, Mark van de, et al.. (2023). The impact of hydrogen plasma on the structure and morphology of tin and lead micrometer sized particles. Journal of Physics D Applied Physics. 56(8). 85204–85204. 9 indexed citations
2.
Kerkhof, Mark van de, et al.. (2020). Understanding EUV-induced plasma and application to particle contamination control in EUV scanners. 29–29. 17 indexed citations
3.
Beckers, J., et al.. (2019). EUV-Induced Plasma: A Peculiar Phenomenon of a Modern Lithographic Technology. Applied Sciences. 9(14). 2827–2827. 43 indexed citations
4.
Beckers, J., et al.. (2019). Energy distribution functions for ions from pulsed EUV-induced plasmas in low pressure N2-diluted H2 gas. Applied Physics Letters. 114(13). 11 indexed citations
5.
Kerkhof, Mark van de, Jos Benschop, & Vadim Banine. (2019). Lithography for now and the future. Solid-State Electronics. 155. 20–26. 39 indexed citations
6.
Horst, R M van der, et al.. (2018). Ion energy distributions in highly transient EUV induced plasma in hydrogen. Journal of Applied Physics. 123(6). 38 indexed citations
7.
Horst, R M van der, et al.. (2018). Analysis of retarding field energy analyzer transmission by simulation of ion trajectories. Review of Scientific Instruments. 89(4). 43501–43501. 21 indexed citations
8.
Beckers, J., et al.. (2018). Mapping electron dynamics in highly transient EUV photon-induced plasmas: a novel diagnostic approach using multi-mode microwave cavity resonance spectroscopy. Journal of Physics D Applied Physics. 52(3). 34004–34004. 25 indexed citations
9.
Horst, R M van der, E A Osorio, Vadim Banine, & J. Beckers. (2015). The influence of the EUV spectrum on plasma induced by EUV radiation in argon and hydrogen gas. Plasma Sources Science and Technology. 25(1). 15012–15012. 16 indexed citations
10.
Herpen, Maarten M. J. W. van, Martin Jak, Peter Gawlitza, et al.. (2012). Atomic-hydrogen cleaning of Sn from Mo/Si and DLC/Si extreme ultraviolet multilayer mirrors. Journal of Micro/Nanolithography MEMS and MOEMS. 11(2). 21118–1. 13 indexed citations
11.
Gawlitza, Peter, et al.. (2009). Extreme ultraviolet multilayer mirror with near-zero IR reflectance. Optics Letters. 34(23). 3680–3680. 18 indexed citations
12.
Brok, W.J.M., et al.. (2006). Particle-in-cell Monte Carlo simulations of an extreme ultraviolet radiation driven plasma. Physical Review E. 73(3). 36406–36406. 26 indexed citations
13.
Klunder, D.J.W., et al.. (2006). Debris mitigation for EUV sources using directional gas flows. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6151. 61514B–61514B. 3 indexed citations
14.
Klunder, D.J.W., et al.. (2005). Debris mitigation and cleaning strategies for Sn-based sources for EUV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5751. 943–943. 16 indexed citations
15.
Kieft, E. R., et al.. (2005). Comparison of experimental and simulated extreme ultraviolet spectra of xenon and tin discharges. Physical Review E. 71(3). 36402–36402. 26 indexed citations
16.
Kieft, E. R., J.J.A.M. van der Mullen, & Vadim Banine. (2005). Subnanosecond Thomson scattering on a vacuum arc discharge in tin vapor. Physical Review E. 72(2). 26415–26415. 19 indexed citations
17.
Meiling, H., Vadim Banine, Peter Kuerz, & Noreen Harned. (2004). Progress in the ASML EUV program. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5374. 31–31. 18 indexed citations
18.
Kieft, E. R., et al.. (2004). Stark broadening experiments on a vacuum arc discharge in tin vapor. Physical Review E. 70(6). 66402–66402. 27 indexed citations
19.
Kieft, E. R., et al.. (2004). Collective Thomson scattering experiments on a tin vapor discharge in the prepinch phase. Physical Review E. 70(5). 56413–56413. 25 indexed citations
20.
Kieft, E. R., J.J.A.M. van der Mullen, G. M. W. Kroesen, & Vadim Banine. (2003). Time-resolved pinhole camera imaging and extreme ultraviolet spectrometry on a hollow cathode discharge in xenon. Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics. 68(5). 56403–56403. 23 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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