Vadim Banine
- Electrical and Electronic Engineering top 5%
- Atomic and Molecular Physics, and Optics top 5%
- Mechanics of Materials top 2%
- Computational Mechanics top 5%
- Materials Chemistry
- Co-authors
- K. N. KoshelevG. H. P. M. SwinkelsRoel MoorsJ.J.A.M. van der MullenJ. BeckersJos BenschopE. R. KieftR M van der Horst
- Topics
- Advancements in Photolithography Techniques (30 papers)Plasma Diagnostics and Applications (27 papers)Electron and X-Ray Spectroscopy Techniques (19 papers)
- Partner nations
- NetherlandsRussiaGermany
In The Last Decade
Vadim Banine
60 papers receiving 1.3k citations
Peers
Comparison fields: 5 of 64
- Electrical and Electronic Engineering 902
- Atomic and Molecular Physics, and Optics 527
- Mechanics of Materials 467
- Computational Mechanics 255
- Materials Chemistry 254
Countries citing papers authored by Vadim Banine
This map shows the geographic impact of Vadim Banine's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Vadim Banine with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Vadim Banine more than expected).
Fields of papers citing papers by Vadim Banine
This network shows the impact of papers produced by Vadim Banine. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Vadim Banine. The network helps show where Vadim Banine may publish in the future.
Co-authorship network of co-authors of Vadim Banine
This figure shows the co-authorship network connecting the top 25 collaborators of Vadim Banine. A scholar is included among the top collaborators of Vadim Banine based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Vadim Banine. Vadim Banine is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | 9 | |
| 2 | 17 | |
| 3 | 11 | |
| 4 | 43 | |
| 5 | 39 | |
| 6 | 25 | |
| 7 | 38 | |
| 8 | 21 | |
| 9 | 16 | |
| 10 | 13 | |
| 11 | 18 | |
| 12 | 26 | |
| 13 | 19 | |
| 14 | 27 | |
| 15 | 16 | |
| 16 | 26 | |
| 17 | 25 | |
| 18 | 27 | |
| 19 | 18 | |
| 20 | 23 |
About Vadim Banine
Vadim Banine is a scholar working on Surfaces, Coatings and Films, Electrical and Electronic Engineering and Atomic and Molecular Physics, and Optics, having authored 60 papers that have together received 1.4k indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (30 papers), Plasma Diagnostics and Applications (27 papers) and Electron and X-Ray Spectroscopy Techniques (19 papers). The work is most often cited by research in Surfaces, Coatings and Films (243 citations), Mechanics of Materials (467 citations) and Atomic and Molecular Physics, and Optics (527 citations). Vadim Banine has collaborated with scholars based in Netherlands, Russia and Germany. Frequent co-authors include K. N. Koshelev, G. H. P. M. Swinkels, Roel Moors, J.J.A.M. van der Mullen, J. Beckers, Jos Benschop, E. R. Kieft, R M van der Horst, Maarten M. J. W. van Herpen and Mark van de Kerkhof. Their work appears in journals such as Applied Physics Letters, Journal of Applied Physics and Chemical Physics Letters.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.