Tsutomu Shoki

500 total citations
54 papers, 414 citations indexed

About

Tsutomu Shoki is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Mechanical Engineering. According to data from OpenAlex, Tsutomu Shoki has authored 54 papers receiving a total of 414 indexed citations (citations by other indexed papers that have themselves been cited), including 47 papers in Electrical and Electronic Engineering, 28 papers in Surfaces, Coatings and Films and 11 papers in Mechanical Engineering. Recurrent topics in Tsutomu Shoki's work include Advancements in Photolithography Techniques (39 papers), Electron and X-Ray Spectroscopy Techniques (27 papers) and Integrated Circuits and Semiconductor Failure Analysis (19 papers). Tsutomu Shoki is often cited by papers focused on Advancements in Photolithography Techniques (39 papers), Electron and X-Ray Spectroscopy Techniques (27 papers) and Integrated Circuits and Semiconductor Failure Analysis (19 papers). Tsutomu Shoki collaborates with scholars based in Japan, United States and South Korea. Tsutomu Shoki's co-authors include Takeo Watanabe, Hiroo Kinoshita, Noriyuki Sakaya, Kazuhiro Hamamoto, Seung Yoon Lee, Hiroyuki Nagasawa, Shintaro Takada, Takeru Kinoshita, Harushige Tsubakino and Hideaki Mitsui and has published in prestigious journals such as Japanese Journal of Applied Physics, Sensors and Actuators A Physical and Microelectronic Engineering.

In The Last Decade

Tsutomu Shoki

52 papers receiving 382 citations

Peers

Tsutomu Shoki

EEE

SCF

RADIA

CVPR

Pei-yang Yan United States

Pawitter J. S. Mangat United States

Peter Kuerz Germany

Paul Gräupner Germany

Osamu Suga Japan

П. А. Тодуа Russia

Jan Mulkens Netherlands

Paul Graeupner Germany

Euclid E. Moon United States

Johannes Ruoff Germany

Pei-yang Yan United States

Tsutomu Shoki

462 ×1.3

EEE

282 ×1.2

SCF

80 ×0.9

RADIA

82 ×1.2

14 ×0.4

CVPR

Citations per year, relative to Tsutomu Shoki Tsutomu Shoki (= 1×) peers Pei-yang Yan

Countries citing papers authored by Tsutomu Shoki

Since Specialization

Citations

This map shows the geographic impact of Tsutomu Shoki's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Tsutomu Shoki with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Tsutomu Shoki more than expected).

Fields of papers citing papers by Tsutomu Shoki

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Tsutomu Shoki. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Tsutomu Shoki. The network helps show where Tsutomu Shoki may publish in the future.

Co-authorship network of co-authors of Tsutomu Shoki

This figure shows the co-authorship network connecting the top 25 collaborators of Tsutomu Shoki. A scholar is included among the top collaborators of Tsutomu Shoki based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Tsutomu Shoki. Tsutomu Shoki is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Onoue, T., et al.. (2024). Development of next generation EUV mask blanks. 2020. 34–34. 1 indexed citations

Ikebe, Yohei, et al.. (2021). EUV attenuated phase shift mask: development and characterization of mask properties. 50–50. 2 indexed citations

Onoue, T., et al.. (2012). Development of fiducial marks on EUV blanks for defect mitigation process. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8322. 832226–832226. 6 indexed citations

Choi, Jin, et al.. (2009). Evaluation of an e-beam correction strategy for compensation of EUVL mask non-flatness. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7379. 73790Q–73790Q. 5 indexed citations

Tanaka, Yuusuke, et al.. (2007). EUV exposure experiment using programmed multilayer defects for refining printability simulation. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6517. 65172M–65172M. 9 indexed citations

Shoki, Tsutomu, et al.. (2007). Recent performance of EUV mask blanks with low-thermal expansion glass substrates. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6730. 673015–673015. 7 indexed citations

Hamamoto, Kazuhiro, Takeo Watanabe, Noriyuki Sakaya, et al.. (2005). Cleaning of extreme ultraviolet lithography optics and masks using 13.5nm and 172nm radiation. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 23(1). 247–251. 25 indexed citations

Yamaguchi, Yuta, et al.. (2005). Properties Of Heteroepitaxial 3c-SiC Films Grown by LPCVD. Proceedings of the International Solid-State Sensors and Actuators Conference - TRANSDUCERS '95. 2. 190–193. 3 indexed citations

Kinoshita, Hiroo, Tsuneyuki Haga, Kazuhiro Hamamoto, et al.. (2004). Actinic mask metrology for extreme ultraviolet lithography. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 22(1). 264–267. 30 indexed citations

10.

Hamamoto, Kazuhiro, Takeo Watanabe, Noriyuki Sakaya, et al.. (2004). Outgassing Characteristics of Structural Materials and the Removal of Contaminants from EUVL Masks using 172-nm Radiation. Journal of Photopolymer Science and Technology. 17(3). 367–372. 2 indexed citations

11.

Hamamoto, Kazuhiro, Shintaro Takada, Takeo Watanabe, et al.. (2003). Investigation of Contamination Removal from Finished EUVL Mask. Journal of Photopolymer Science and Technology. 16(3). 395–399. 12 indexed citations

12.

Shoki, Tsutomu, et al.. (2002). Process development of 6-in EUV mask with TaBN absorber. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4754. 857–857. 15 indexed citations

13.

Watanabe, Takeo, Hiroo Kinoshita, Kazuhiro Hamamoto, et al.. (2002). Fine Pattern Replication Using ETS-1 Three-Aspherical Mirror Imaging System. Japanese Journal of Applied Physics. 41(Part 1, No. 6B). 4105–4110. 14 indexed citations

14.

Hamamoto, Kazuhiro, et al.. (2001). Fine Pattern Replication by EUV Lithography.. Journal of Photopolymer Science and Technology. 14(4). 567–572. 13 indexed citations

15.

Shoki, Tsutomu, et al.. (1999). Progress in SiC membrane for x-ray mask. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3748. 456–456. 1 indexed citations

16.

Shoki, Tsutomu, et al.. (1997). Scattered-light alignment system using SiC mask for x-ray lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3048. 225–225. 1 indexed citations

17.

Tsuboi, Shinji, et al.. (1996). Study on x-ray irradiation stability of absorber materials for x-ray masks by stress measurement. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2793. 204–204. 1 indexed citations

18.

Tsuboi, Shinji, et al.. (1995). Study of SiC x-ray mask distortion induced by backetching receding subtractive fabrication process. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2512. 160–160. 1 indexed citations

19.

Shoki, Tsutomu, et al.. (1994). Optical properties of polycrystalline β-SiC membrane for x-ray mask. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2254. 313–313.

20.

Shoki, Tsutomu, et al.. (1992). Effect of Anodic Bonding Temperature on Mechanical Distortion of SiC X-Ray Mask Substrate. Japanese Journal of Applied Physics. 31(12S). 4215–4215. 6 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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