Alexander Tritchkov

454 total citations
44 papers, 311 citations indexed

About

Alexander Tritchkov is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films. According to data from OpenAlex, Alexander Tritchkov has authored 44 papers receiving a total of 311 indexed citations (citations by other indexed papers that have themselves been cited), including 43 papers in Electrical and Electronic Engineering, 23 papers in Biomedical Engineering and 9 papers in Surfaces, Coatings and Films. Recurrent topics in Alexander Tritchkov's work include Advancements in Photolithography Techniques (42 papers), Integrated Circuits and Semiconductor Failure Analysis (15 papers) and Nanofabrication and Lithography Techniques (10 papers). Alexander Tritchkov is often cited by papers focused on Advancements in Photolithography Techniques (42 papers), Integrated Circuits and Semiconductor Failure Analysis (15 papers) and Nanofabrication and Lithography Techniques (10 papers). Alexander Tritchkov collaborates with scholars based in United States, Belgium and Hungary. Alexander Tritchkov's co-authors include Eric Hendrickx, Yuri Granik, Vincent Wiaux, Peng Xie, James Word, Janko Versluijs, John N. Randall, R. Jonckheere, Luc Van den hove and Geert Vandenberghe and has published in prestigious journals such as Japanese Journal of Applied Physics, Microelectronic Engineering and Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena.

In The Last Decade

Alexander Tritchkov

40 papers receiving 283 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Alexander Tritchkov United States 10 286 126 65 49 45 44 311
James Word United States 10 288 1.0× 115 0.9× 66 1.0× 27 0.6× 19 0.4× 61 313
Luigi Capodieci United States 12 473 1.7× 124 1.0× 116 1.8× 29 0.6× 132 2.9× 58 513
Jaione Tirapu-Azpiroz United States 11 249 0.9× 111 0.9× 41 0.6× 50 1.0× 9 0.2× 40 298
Tomoyuki Matsuyama Japan 9 237 0.8× 155 1.2× 22 0.3× 51 1.0× 11 0.2× 55 288
Germain Fenger United States 11 309 1.1× 83 0.7× 46 0.7× 35 0.7× 7 0.2× 73 352
Gregory McIntyre United States 10 247 0.9× 79 0.6× 28 0.4× 13 0.3× 16 0.4× 39 275
Carlos Fonseca United States 10 247 0.9× 93 0.7× 24 0.4× 12 0.2× 23 0.5× 38 276
Monique Ercken Belgium 11 311 1.1× 89 0.7× 16 0.2× 11 0.2× 14 0.3× 49 331
Ryoung-Han Kim United States 9 264 0.9× 71 0.6× 20 0.3× 8 0.2× 10 0.2× 54 284
Yongchan Ban United States 11 347 1.2× 90 0.7× 25 0.4× 3 0.1× 133 3.0× 37 364

Countries citing papers authored by Alexander Tritchkov

Since Specialization
Citations

This map shows the geographic impact of Alexander Tritchkov's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Alexander Tritchkov with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Alexander Tritchkov more than expected).

Fields of papers citing papers by Alexander Tritchkov

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Alexander Tritchkov. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Alexander Tritchkov. The network helps show where Alexander Tritchkov may publish in the future.

Co-authorship network of co-authors of Alexander Tritchkov

This figure shows the co-authorship network connecting the top 25 collaborators of Alexander Tritchkov. A scholar is included among the top collaborators of Alexander Tritchkov based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Alexander Tritchkov. Alexander Tritchkov is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Wu, Rui, et al.. (2022). Fast full-chip curvilinear ILT mask generation with machine learning technology. 23–23. 1 indexed citations
2.
3.
Tritchkov, Alexander, et al.. (2021). Advanced ILT solutions to manufacture photonics designs. 21–21. 1 indexed citations
4.
Sun, Yuyang, et al.. (2018). SRAF requirements, relevance, and impact on EUV lithography for next-generation beyond 7nm node. 2017. 19–19. 2 indexed citations
5.
Jiang, Fan, et al.. (2018). Inverse lithography recipe optimization using genetic algorithm. XIX. 53–53. 2 indexed citations
6.
Tritchkov, Alexander, et al.. (2018). Constraint approaches for some inverse lithography problems with pixel-based mask. 9778. 19–19. 4 indexed citations
7.
Wei, Alexander, Fan Jiang, Alexander Tritchkov, et al.. (2018). Lithographic benefits and mask manufacturability study of curvilinear masks. 26–26. 13 indexed citations
8.
Ma, Yuansheng, J. Andres Torres, James Word, et al.. (2015). Directed self-assembly graphoepitaxy template generation with immersion lithography. Journal of Micro/Nanolithography MEMS and MOEMS. 14(3). 31216–31216. 5 indexed citations
9.
Tritchkov, Alexander, et al.. (2014). Use of ILT-based mask optimization for local printability enhancement. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9256. 92560X–92560X. 4 indexed citations
10.
Villaret, A., et al.. (2013). Inverse lithography technique for advanced CMOS nodes. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8683. 86830E–86830E. 10 indexed citations
11.
Tritchkov, Alexander, Jaione Tirapu-Azpiroz, Alan E. Rosenbluth, et al.. (2011). Applicability of global source mask optimization to 22/20nm node and beyond. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7973. 79730C–79730C. 7 indexed citations
12.
Kim, Byung‐Sung, et al.. (2008). Pixel-based SRAF implementation for 32nm lithography process. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7122. 71220T–71220T. 10 indexed citations
13.
Tritchkov, Alexander, et al.. (1999). Alternating PSM optimization using model-based OPC. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3679. 556–556. 2 indexed citations
14.
Tritchkov, Alexander, et al.. (1998). Proximity Effects Correction for Advanced Optical Lithography Processes. Japanese Journal of Applied Physics. 37(6R). 3585–3585. 1 indexed citations
15.
Randall, John N. & Alexander Tritchkov. (1998). Optically induced mask critical dimension error magnification in 248 nm lithography. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 16(6). 3606–3611. 6 indexed citations
16.
Tritchkov, Alexander, et al.. (1998). 0.18 μm KrF lithography using optical proximity correction based on empirical behavior modeling. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 16(6). 3398–3404. 1 indexed citations
17.
Randall, John N., Alexander Tritchkov, R. Jonckheere, Patrick Jaenen, & Kurt Ronse. (1998). Reduction of mask-induced CD errors by optical proximity correction. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3334. 124–124. 6 indexed citations
18.
Tritchkov, Alexander, et al.. (1997). Optical proximity effects correction at 0.25 um incorporating process variations in lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3051. 726–726. 3 indexed citations
19.
Beeck, Maaike Op de, Anthony Yen, Alexander Tritchkov, et al.. (1996). <title>Optical proximity effects and correction strategies for chemical-amplified DUV resists</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2726. 622–633. 1 indexed citations
20.
Yen, Anthony, Alexander Tritchkov, Geert Vandenberghe, et al.. (1996). Characterization and correction of optical proximity effects in deep-ultraviolet lithography using behavior modeling. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 14(6). 4175–4178. 6 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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