James Word

465 total citations
61 papers, 313 citations indexed

About

James Word is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films. According to data from OpenAlex, James Word has authored 61 papers receiving a total of 313 indexed citations (citations by other indexed papers that have themselves been cited), including 57 papers in Electrical and Electronic Engineering, 21 papers in Biomedical Engineering and 19 papers in Surfaces, Coatings and Films. Recurrent topics in James Word's work include Advancements in Photolithography Techniques (49 papers), Integrated Circuits and Semiconductor Failure Analysis (21 papers) and Electron and X-Ray Spectroscopy Techniques (18 papers). James Word is often cited by papers focused on Advancements in Photolithography Techniques (49 papers), Integrated Circuits and Semiconductor Failure Analysis (21 papers) and Electron and X-Ray Spectroscopy Techniques (18 papers). James Word collaborates with scholars based in United States, Belgium and Hungary. James Word's co-authors include Yuri Granik, J. Andres Torres, Yuansheng Ma, Germain Fenger, John L. Sturtevant, Alexander Tritchkov, Joost Bekaert, Julien Ryckaert, M.A. Habib and R. J. Shul and has published in prestigious journals such as Journal of Micro/Nanolithography MEMS and MOEMS, IEEE Transactions on Components Packaging and Manufacturing Technology Part B and Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena.

In The Last Decade

James Word

55 papers receiving 304 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
James Word United States 10 288 115 66 55 44 61 313
Alexander Tritchkov United States 10 286 1.0× 126 1.1× 65 1.0× 42 0.8× 25 0.6× 44 311
Stewart A. Robertson United States 11 427 1.5× 135 1.2× 30 0.5× 239 4.3× 18 0.4× 66 479
Jaione Tirapu-Azpiroz United States 11 249 0.9× 111 1.0× 41 0.6× 71 1.3× 25 0.6× 40 298
Carlos Fonseca United States 10 247 0.9× 93 0.8× 24 0.4× 59 1.1× 13 0.3× 38 276
Ryoung-Han Kim United States 9 264 0.9× 71 0.6× 20 0.3× 101 1.8× 16 0.4× 54 284
Tomoyuki Matsuyama Japan 9 237 0.8× 155 1.3× 22 0.3× 47 0.9× 57 1.3× 55 288
Jan Hermans Belgium 11 273 0.9× 96 0.8× 22 0.3× 140 2.5× 18 0.4× 43 306
Monique Ercken Belgium 11 311 1.1× 89 0.8× 16 0.2× 38 0.7× 10 0.2× 49 331
G. Owen United States 9 228 0.8× 127 1.1× 11 0.2× 106 1.9× 71 1.6× 32 329
Osamu Suga Japan 12 443 1.5× 88 0.8× 48 0.7× 266 4.8× 44 1.0× 70 463

Countries citing papers authored by James Word

Since Specialization
Citations

This map shows the geographic impact of James Word's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by James Word with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites James Word more than expected).

Fields of papers citing papers by James Word

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by James Word. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by James Word. The network helps show where James Word may publish in the future.

Co-authorship network of co-authors of James Word

This figure shows the co-authorship network connecting the top 25 collaborators of James Word. A scholar is included among the top collaborators of James Word based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with James Word. James Word is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Ma, Yuansheng, et al.. (2020). Reduction of systematic defects through machine learning from design to fab. 9–9. 3 indexed citations
2.
Jiang, Fan, et al.. (2018). Inverse lithography recipe optimization using genetic algorithm. XIX. 53–53. 2 indexed citations
3.
Ma, Yuansheng, Jongwook Kye, Gurdaman Khaira, et al.. (2017). Design technology co-optimization (DTCO) study on self-aligned-via (SAV) with Lamella DSA for sub-7 nm technology. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10148. 101480B–101480B. 3 indexed citations
4.
Word, James, et al.. (2016). An integrated design-to-manufacturing flow for SADP. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9781. 97810Y–97810Y. 1 indexed citations
5.
Ma, Yuansheng, Yan Wang, James Word, et al.. (2016). Directed self-assembly compliant flow with immersion lithography: from material to design and patterning. Journal of Micro/Nanolithography MEMS and MOEMS. 15(3). 31610–31610. 4 indexed citations
6.
Ma, Yuansheng, J. Andres Torres, James Word, et al.. (2015). Directed self-assembly graphoepitaxy template generation with immersion lithography. Journal of Micro/Nanolithography MEMS and MOEMS. 14(3). 31216–31216. 5 indexed citations
7.
Jiang, Fan, et al.. (2015). Implementation of assist features in EUV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9422. 94220U–94220U. 8 indexed citations
8.
Philipsen, Vicky, et al.. (2012). 3D mask modeling for EUV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8322. 832224–832224. 5 indexed citations
9.
Word, James, et al.. (2011). Aerial image retargeting (AIR): achieving litho-friendly designs. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7974. 797411–797411. 4 indexed citations
10.
Choi, Soo‐Han, Ji-Young Lee, James Word, et al.. (2010). Model-based double dipole lithography for sub-30nm node device. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7823. 78230Z–78230Z. 1 indexed citations
11.
Word, James, et al.. (2008). Mask shot count reduction strategies in the OPC flow. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7028. 70283F–70283F. 3 indexed citations
12.
Word, James, et al.. (2007). Automatic OPC repair flow: optimized implementation of the repair recipe. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6730. 67303S–67303S.
13.
Word, James, et al.. (2006). OPC to improve lithographic process window. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6156. 61561I–61561I. 6 indexed citations
14.
Sturtevant, John L., et al.. (2005). Considerations for the use of defocus models for OPC. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5756. 427–427. 13 indexed citations
15.
Sturtevant, John L., et al.. (2005). Assessing the impact of real world manufacturing lithography variations on post-OPC CD control. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5756. 240–240. 4 indexed citations
16.
Word, James, et al.. (2004). Full-chip-model-based correction of flare-induced linewidth variation. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5567. 700–700. 11 indexed citations
17.
Word, James, et al.. (2004). Model-based prediction of full-chip SRAF printability. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5377. 1105–1105. 2 indexed citations
18.
Zubrzycki, W. J., Ben‐Hur V. Borges, P.R. Herczfeld, et al.. (2002). Integrated optic distributed Bragg reflector Fabry-Perot modulator for microwave applications. 33. 259–263.
19.
Lucas, Kevin, et al.. (2001). Model-based OPC for first-generation 193-nm lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4346. 119–119. 2 indexed citations
20.
Word, James, et al.. (1968). Improved process for epitaxial deposition of silicon on prediffused substrates. NASA Technical Reports Server (NASA). 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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