Andy Goodyear

564 total citations
25 papers, 481 citations indexed

About

Andy Goodyear is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Surfaces, Coatings and Films. According to data from OpenAlex, Andy Goodyear has authored 25 papers receiving a total of 481 indexed citations (citations by other indexed papers that have themselves been cited), including 22 papers in Electrical and Electronic Engineering, 7 papers in Materials Chemistry and 6 papers in Surfaces, Coatings and Films. Recurrent topics in Andy Goodyear's work include Semiconductor materials and devices (12 papers), Plasma Diagnostics and Applications (8 papers) and Metal and Thin Film Mechanics (5 papers). Andy Goodyear is often cited by papers focused on Semiconductor materials and devices (12 papers), Plasma Diagnostics and Applications (8 papers) and Metal and Thin Film Mechanics (5 papers). Andy Goodyear collaborates with scholars based in United Kingdom, Germany and Belgium. Andy Goodyear's co-authors include Mike Cooke, George Kokkoris, Εvangelos Gogolides, Apostolos Panagiotopoulos, Colin Welch, Stefano Cabrini, Max C. Lemme, T. Wahlbrink, T. Mollenhauer and N. Vourdas and has published in prestigious journals such as Journal of Applied Physics, Journal of Physics D Applied Physics and Nanotechnology.

In The Last Decade

Andy Goodyear

25 papers receiving 464 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Andy Goodyear United Kingdom 11 379 165 155 99 68 25 481
Shoji Den Japan 14 295 0.8× 263 1.6× 95 0.6× 65 0.7× 63 0.9× 30 488
Shashank C. Deshmukh United States 7 277 0.7× 166 1.0× 81 0.5× 35 0.4× 89 1.3× 16 374
Toshiaki Kusunoki Japan 13 210 0.6× 190 1.2× 98 0.6× 57 0.6× 93 1.4× 37 430
J. Holleman Netherlands 14 537 1.4× 295 1.8× 94 0.6× 142 1.4× 79 1.2× 79 636
N. R. Rueger United States 9 864 2.3× 303 1.8× 385 2.5× 94 0.9× 223 3.3× 11 945
Kou Kurosawa Japan 11 222 0.6× 155 0.9× 73 0.5× 112 1.1× 25 0.4× 75 435
Hideo Sunami Japan 12 452 1.2× 190 1.2× 49 0.3× 86 0.9× 63 0.9× 40 566
J. Y. Robic France 9 222 0.6× 126 0.8× 80 0.5× 88 0.9× 38 0.6× 16 361
Andrew S. Alimonda United States 8 404 1.1× 189 1.1× 104 0.7× 54 0.5× 30 0.4× 12 459
G. C. Schwartz United States 12 402 1.1× 192 1.2× 109 0.7× 82 0.8× 142 2.1× 26 535

Countries citing papers authored by Andy Goodyear

Since Specialization
Citations

This map shows the geographic impact of Andy Goodyear's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Andy Goodyear with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Andy Goodyear more than expected).

Fields of papers citing papers by Andy Goodyear

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Andy Goodyear. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Andy Goodyear. The network helps show where Andy Goodyear may publish in the future.

Co-authorship network of co-authors of Andy Goodyear

This figure shows the co-authorship network connecting the top 25 collaborators of Andy Goodyear. A scholar is included among the top collaborators of Andy Goodyear based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Andy Goodyear. Andy Goodyear is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Opsomer, Karl, Victor Soltwisch, Christophe Detavernier, et al.. (2023). Evaluation of Ta-Co alloys as novel high-k extreme ultraviolet mask absorber. Journal of Micro/Nanopatterning Materials and Metrology. 22(2). 8 indexed citations
2.
Marneffe, Jean‐François de, Daniil Marinov, Andy Goodyear, et al.. (2022). Plasma enhanced atomic layer etching of high-k layers on WS2. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 40(4). 8 indexed citations
3.
Marneffe, Jean‐François de, Karl Opsomer, Christophe Detavernier, et al.. (2021). Characterization of Ru4-xTax (x = 1,2,3) alloy as material candidate for EUV low-n mask. Micro and Nano Engineering. 12. 100089–100089. 10 indexed citations
4.
5.
Goodyear, Andy, Mike Cooke, Christoph Kastl, et al.. (2019). Atomic layer etching of SiO2 with Ar and CHF3 plasmas: A self‐limiting process for aspect ratio independent etching. Plasma Processes and Polymers. 16(9). 35 indexed citations
6.
Lorenzon, Monica, Adam Schwartzberg, Andy Goodyear, et al.. (2019). Balancing ion parameters and fluorocarbon chemical reactants for SiO2 pattern transfer control using fluorocarbon-based atomic layer etching. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 37(5). 7 indexed citations
7.
Marneffe, Jean‐François de, Markus Heyne, Mikołaj Łukaszewicz, et al.. (2015). Vacuum ultra-violet damage and damage mitigation for plasma processing of highly porous organosilicate glass dielectrics. Journal of Applied Physics. 118(13). 22 indexed citations
8.
Goodyear, Andy, et al.. (2015). Pattern transfer into silicon using sub-10 nm masks made by electron beam-induced deposition. Journal of Micro/Nanolithography MEMS and MOEMS. 14(3). 31206–31206. 4 indexed citations
9.
Goodyear, Andy, et al.. (2015). Direct comparison of the performance of commonly used e-beam resists during nano-scale plasma etching of Si, SiO2, and Cr. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9428. 94280V–94280V. 6 indexed citations
10.
Goodyear, Andy, et al.. (2015). Pattern transfer into silicon using sub-10 nm masks made by electron beam induced deposition. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9423. 94230I–94230I. 5 indexed citations
11.
Vourdas, N., Dimitrios Kontziampasis, George Kokkoris, et al.. (2010). Plasma directed assembly and organization: bottom-up nanopatterning using top-down technology. Nanotechnology. 21(8). 85302–85302. 49 indexed citations
12.
Wu, Y., Andy Goodyear, Christophe Péroz, et al.. (2010). Cryogenic etching of nano-scale silicon trenches with resist masks. Microelectronic Engineering. 88(8). 2785–2789. 29 indexed citations
13.
Kokkoris, George, Apostolos Panagiotopoulos, Andy Goodyear, Mike Cooke, & Εvangelos Gogolides. (2009). A global model for SF6plasmas coupling reaction kinetics in the gas phase and on the surface of the reactor walls. Journal of Physics D Applied Physics. 42(5). 55209–55209. 67 indexed citations
14.
Volland, B., Dirk Dressler, Ivo W. Rangelow, et al.. (2009). Integrated plasma processing simulation framework, linking tool scale plasma models with 2D feature scale etch simulator. Microelectronic Engineering. 86(4-6). 976–978. 8 indexed citations
15.
Kokkoris, George, Andy Goodyear, Mike Cooke, & Εvangelos Gogolides. (2008). A global model for C4F8plasmas coupling gas phase and wall surface reaction kinetics. Journal of Physics D Applied Physics. 41(19). 195211–195211. 92 indexed citations
16.
17.
Welch, Colin, Andy Goodyear, T. Wahlbrink, Max C. Lemme, & T. Mollenhauer. (2006). Silicon etch process options for micro- and nanotechnology using inductively coupled plasmas. Microelectronic Engineering. 83(4-9). 1170–1173. 42 indexed citations
18.
Goodyear, Andy, et al.. (2002). <title>Ge-doped film process in waveguide application</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4929. 398–407. 2 indexed citations
19.
French, I. D., et al.. (1994). Silicon Nitride Optimisation for a-Si:H TFTs Used in Projection LC-TVs. MRS Proceedings. 345. 1 indexed citations
20.
French, I. D., et al.. (1994). Silicon Nitride Optimisation for A-Si:H Tfts Used in Projection LC-TVS. MRS Proceedings. 336. 4 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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