G. Curello

717 total citations
11 papers, 114 citations indexed

About

G. Curello is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Materials Chemistry. According to data from OpenAlex, G. Curello has authored 11 papers receiving a total of 114 indexed citations (citations by other indexed papers that have themselves been cited), including 11 papers in Electrical and Electronic Engineering, 4 papers in Atomic and Molecular Physics, and Optics and 3 papers in Materials Chemistry. Recurrent topics in G. Curello's work include Integrated Circuits and Semiconductor Failure Analysis (7 papers), Semiconductor materials and devices (5 papers) and Silicon and Solar Cell Technologies (4 papers). G. Curello is often cited by papers focused on Integrated Circuits and Semiconductor Failure Analysis (7 papers), Semiconductor materials and devices (5 papers) and Silicon and Solar Cell Technologies (4 papers). G. Curello collaborates with scholars based in United Kingdom, United States and Germany. G. Curello's co-authors include B.J. Sealy, M. Harry, M.S. Finney, K.J. Reeson, C. Tsai, Jang Hyeok Park, Peng Bai, K. Komeyli, R. Gwilliam and W. Hafez and has published in prestigious journals such as Applied Physics Letters, Journal of Physics D Applied Physics and Journal of Crystal Growth.

In The Last Decade

G. Curello

9 papers receiving 109 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
G. Curello United Kingdom 6 106 48 18 8 5 11 114
F. Lau Germany 6 183 1.7× 49 1.0× 27 1.5× 12 1.5× 1 0.2× 13 199
H.-H. Vuong United States 9 176 1.7× 49 1.0× 19 1.1× 20 2.5× 22 186
Matthew Rever United States 5 55 0.5× 71 1.5× 21 1.2× 5 0.6× 15 111
Z. W. Zhao China 4 88 0.8× 71 1.5× 39 2.2× 8 1.0× 9 103
M. Inoue Japan 5 69 0.7× 13 0.3× 20 1.1× 3 0.4× 3 0.6× 12 85
Sridhar Govindaraju United States 8 96 0.9× 83 1.7× 29 1.6× 10 1.3× 14 118
M. Mikelsen Norway 6 128 1.2× 48 1.0× 28 1.6× 21 2.6× 7 135
J. Geypen Belgium 6 99 0.9× 40 0.8× 13 0.7× 4 0.5× 12 102
T. Pavelka Germany 7 209 2.0× 100 2.1× 25 1.4× 25 3.1× 31 219
Ibrahim Ban United States 7 145 1.4× 28 0.6× 18 1.0× 4 0.5× 15 152

Countries citing papers authored by G. Curello

Since Specialization
Citations

This map shows the geographic impact of G. Curello's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by G. Curello with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites G. Curello more than expected).

Fields of papers citing papers by G. Curello

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by G. Curello. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by G. Curello. The network helps show where G. Curello may publish in the future.

Co-authorship network of co-authors of G. Curello

This figure shows the co-authorship network connecting the top 25 collaborators of G. Curello. A scholar is included among the top collaborators of G. Curello based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with G. Curello. G. Curello is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

11 of 11 papers shown
2.
Rahman, Anisur, M. Agostinelli, Peng Bai, et al.. (2011). Reliability studies of a 32nm System-on-Chip (SoC) platform technology with 2<inf>nd</inf> generation high-k/metal gate transistors. 12. 5D.3.1–5D.3.6. 11 indexed citations
3.
Post, I., M.S. Akbar, G. Curello, et al.. (2006). A 65nm CMOS SOC Technology Featuring Strained Silicon Transistors for RF Applications. 1–3. 37 indexed citations
4.
6.
Curello, G., R. Gwilliam, M. Harry, Stuart D. Jackson, & B.J. Sealy. (1997). Beam-power heating effect on the synthesis of graded composition epitaxial Si1−Ge alloy layers. Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms. 129(3). 377–386. 1 indexed citations
7.
Harry, M., G. Curello, M.S. Finney, K.J. Reeson, & B.J. Sealy. (1996). Structural properties of ion beam synthesized iron - cobalt silicide. Journal of Physics D Applied Physics. 29(7). 1822–1830. 10 indexed citations
8.
Reeson, K.J., M.S. Finney, M. Harry, et al.. (1995). Electrical, optical and materials properties of ion beam synthesised (IBS) FeSi2. Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms. 106(1-4). 364–371. 28 indexed citations
9.
Wilson, R. J., et al.. (1995). Effect of fluorine co-implantation on MeV erbium implanted silicon. Applied Physics Letters. 66(23). 3158–3160. 6 indexed citations
10.
Curello, G., R. Gwilliam, M. Harry, et al.. (1995). Interface reaction between Ir films and relaxed SiGe MBE layers by rapid thermal annealing. Journal of Crystal Growth. 157(1-4). 236–241.
11.
Harry, M., G. Curello, K.J. Reeson, et al.. (1995). Ternary iron-cobalt silicide fabricated by ion beam synthesis. Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms. 96(1-2). 356–360. 5 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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