B. Woolery
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- Advancements in Semiconductor Devices and Circuit Design 4
- Semiconductor materials and devices 4
- Integrated Circuits and Semiconductor Failure Analysis 3
- Ferroelectric and Negative Capacitance Devices 1
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- Copper Interconnects and Reliability 1
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- Metal and Thin Film Mechanics 2
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- Advanced Surface Polishing Techniques 2
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- Surface Roughness and Optical Measurements 1
- Co-authors
- Sangwoo PaeC. PrasadJ. MaizRyan LuA. St. AmourSeok‐Hee LeeJun HeMark Liu
- Cited by
- Electrical and Electronic EngineeringHardware and ArchitectureElectronic, Optical and Magnetic Materials
- Journals
- IEEE Transactions on Device and Materials Reliability (1 paper)MRS Proceedings (1 paper)Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (1 paper)
- Partner nations
- United StatesUnited Kingdom
In The Last Decade
B. Woolery
5 papers receiving 133 citations
Peers
Comparison fields: 5 of 18
- Electrical and Electronic Engineering 142
- Hardware and Architecture 10
- Electronic, Optical and Magnetic Materials 12
- Software 1
- Mechanics of Materials 3
Countries citing papers authored by B. Woolery
This map shows the geographic impact of B. Woolery's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by B. Woolery with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites B. Woolery more than expected).
Fields of papers citing papers by B. Woolery
This network shows the impact of papers produced by B. Woolery. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by B. Woolery. The network helps show where B. Woolery may publish in the future.
Co-authorship network
The 25 scholars most cited alongside B. Woolery, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 2013 | 14 | |
| 2 | 2012 | 15 | |
| 3 | 2010 | 46 | |
| 4 | 2008 | 62 | |
| 5 | 1995 | 5 | |
| 6 | 1990 | 0 |
About B. Woolery
B. Woolery is a scholar working on Mechanics of Materials, Electrical and Electronic Engineering and Electronic, Optical and Magnetic Materials, having authored 6 papers that have together received 142 indexed citations. Recurring topics across this work include Advancements in Semiconductor Devices and Circuit Design (4 papers), Semiconductor materials and devices (4 papers), Integrated Circuits and Semiconductor Failure Analysis (3 papers), Advanced Surface Polishing Techniques (2 papers), Metal and Thin Film Mechanics (2 papers), Copper Interconnects and Reliability (1 paper), Surface Roughness and Optical Measurements (1 paper) and Ferroelectric and Negative Capacitance Devices (1 paper). The work is most often cited by research in Electrical and Electronic Engineering (142 citations), Hardware and Architecture (10 citations) and Electronic, Optical and Magnetic Materials (12 citations). B. Woolery has collaborated with scholars based in United States and United Kingdom. Frequent co-authors include Sangwoo Pae, C. Prasad, J. Maiz, Ryan Lu, A. St. Amour, Seok‐Hee Lee, Jun He, Mark Liu, P. Packan and T. Ghani. Their work appears in journals such as IEEE Transactions on Device and Materials Reliability, MRS Proceedings and Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.