D. Coolbaugh

460 total citations
12 papers, 117 citations indexed

About

D. Coolbaugh is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Condensed Matter Physics. According to data from OpenAlex, D. Coolbaugh has authored 12 papers receiving a total of 117 indexed citations (citations by other indexed papers that have themselves been cited), including 11 papers in Electrical and Electronic Engineering, 2 papers in Electronic, Optical and Magnetic Materials and 1 paper in Condensed Matter Physics. Recurrent topics in D. Coolbaugh's work include Semiconductor materials and devices (9 papers), Advancements in Semiconductor Devices and Circuit Design (6 papers) and Radio Frequency Integrated Circuit Design (3 papers). D. Coolbaugh is often cited by papers focused on Semiconductor materials and devices (9 papers), Advancements in Semiconductor Devices and Circuit Design (6 papers) and Radio Frequency Integrated Circuit Design (3 papers). D. Coolbaugh collaborates with scholars based in United States, Germany and Israel. D. Coolbaugh's co-authors include V. Ramachandran, K. Watson, R. Groves, S. Subbanna, D.L. Harame, R. Volant, R. Bolam, Zhenyu He, J. Dunn and Dan Wang and has published in prestigious journals such as IEEE Journal of Solid-State Circuits, IEEE Transactions on Electron Devices and Electrical Overstress/Electrostatic Discharge Symposium.

In The Last Decade

D. Coolbaugh

12 papers receiving 110 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
D. Coolbaugh United States 6 117 13 11 8 6 12 117
C. Weintraub United States 6 101 0.9× 4 0.3× 11 1.0× 6 0.8× 6 1.0× 13 107
S. Mehta United States 5 79 0.7× 16 1.2× 4 0.4× 10 1.3× 3 0.5× 26 83
J. Mazurier France 8 175 1.5× 3 0.2× 13 1.2× 17 2.1× 4 0.7× 22 177
Uma Sharma India 11 317 2.7× 6 0.5× 13 1.2× 7 0.9× 8 1.3× 26 325
B. Woolery United States 5 142 1.2× 12 0.9× 3 0.3× 3 0.4× 10 1.7× 6 142
Ibrahim Ban United States 7 145 1.2× 11 0.8× 28 2.5× 11 1.4× 2 0.3× 15 152
M. Marin France 8 231 2.0× 6 0.5× 10 0.9× 32 4.0× 3 0.5× 23 234
D. Schepis United States 9 166 1.4× 4 0.3× 12 1.1× 18 2.3× 22 3.7× 16 171
Ted Letavic United States 9 349 3.0× 7 0.5× 6 0.5× 10 1.3× 2 0.3× 31 351
T.C. Ong United States 9 266 2.3× 5 0.4× 14 1.3× 15 1.9× 7 1.2× 26 267

Countries citing papers authored by D. Coolbaugh

Since Specialization
Citations

This map shows the geographic impact of D. Coolbaugh's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by D. Coolbaugh with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites D. Coolbaugh more than expected).

Fields of papers citing papers by D. Coolbaugh

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by D. Coolbaugh. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by D. Coolbaugh. The network helps show where D. Coolbaugh may publish in the future.

Co-authorship network of co-authors of D. Coolbaugh

This figure shows the co-authorship network connecting the top 25 collaborators of D. Coolbaugh. A scholar is included among the top collaborators of D. Coolbaugh based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with D. Coolbaugh. D. Coolbaugh is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

12 of 12 papers shown
1.
Bowers, John E., R. C. Alferness, Robert L. Clark, et al.. (2015). American Institute for Manufacturing Integrated Photonics (AIM Photonics). 24–24. 8 indexed citations
2.
He, Zhenyu, R. Bolam, F. Chen, et al.. (2008). High and low density complimentary MIM capacitors fabricated simultaneously in advanced RFCMOS and BiCMOS technologies. 212–215. 2 indexed citations
3.
4.
Steegen, An, D. Coolbaugh, V. Ramachandran, et al.. (2007). Technology Elements of a Common Platform Bulk Foundry Offering (Invited). 41. 259–262. 2 indexed citations
5.
6.
Jagannathan, B., R. Groves, D. Goren, et al.. (2006). RF CMOS for microwave and MM-wave applications. 259–264. 9 indexed citations
7.
Voldman, Steven H., et al.. (2005). The influence of high resistivity substrates on CMOS latchup robustness. Electrical Overstress/Electrostatic Discharge Symposium. 1–10. 1 indexed citations
8.
9.
Joseph, Alvin, J. Dunn, G. Freeman, et al.. (2003). Product applications and technology directions with SiGe BiCMOS. IEEE Journal of Solid-State Circuits. 38(9). 1471–1478. 31 indexed citations
10.
Bolam, R., V. Ramachandran, D. Coolbaugh, & K. Watson. (2003). Electrical Characteristics and Reliability of UV Transparent Si N Metal-Insulator-Metal (MIM) Capacitors. 1 indexed citations
11.
Coolbaugh, D., R. Groves, D.L. Harame, et al.. (2003). Advanced passive devices for enhanced integrated RF circuit performance. 341–344. 34 indexed citations
12.
Bolam, R., V. Ramachandran, D. Coolbaugh, & K. Watson. (2003). Electrical characteristics and reliability of UV transparent Si/sub 3/n/sub 3/ metal-insulator-metal (MIM) capacitors. IEEE Transactions on Electron Devices. 50(4). 941–944. 10 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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2026