Y. Senzaki

550 total citations
24 papers, 445 citations indexed

About

Y. Senzaki is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, Y. Senzaki has authored 24 papers receiving a total of 445 indexed citations (citations by other indexed papers that have themselves been cited), including 22 papers in Electrical and Electronic Engineering, 8 papers in Materials Chemistry and 5 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in Y. Senzaki's work include Semiconductor materials and devices (21 papers), Advancements in Semiconductor Devices and Circuit Design (9 papers) and Ferroelectric and Negative Capacitance Devices (7 papers). Y. Senzaki is often cited by papers focused on Semiconductor materials and devices (21 papers), Advancements in Semiconductor Devices and Circuit Design (9 papers) and Ferroelectric and Negative Capacitance Devices (7 papers). Y. Senzaki collaborates with scholars based in United States, Germany and Japan. Y. Senzaki's co-authors include H.F. Luan, P. Majhi, Husam N. Alshareef, H.C. Wen, H. R. Harris, Weiping Bai, David A. Roberts, T.S. Jeon, Dim‐Lee Kwong and Robert M. Wallace and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Applied Surface Science.

In The Last Decade

Y. Senzaki

22 papers receiving 419 citations

Peers

Countries citing papers authored by Y. Senzaki

Since Specialization

Citations

This map shows the geographic impact of Y. Senzaki's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Y. Senzaki with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Y. Senzaki more than expected).

Fields of papers citing papers by Y. Senzaki

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Y. Senzaki. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Y. Senzaki. The network helps show where Y. Senzaki may publish in the future.

Co-authorship network of co-authors of Y. Senzaki

This figure shows the co-authorship network connecting the top 25 collaborators of Y. Senzaki. A scholar is included among the top collaborators of Y. Senzaki based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Y. Senzaki. Y. Senzaki is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

Sort: Min cites: Since: Top N: Style:

20 of 20 papers shown

#	Work	Indexed citations
1	(Invited) Innovative Deposition Technology for Advanced Materials 2010 ·ECS Transactions ·P. K. Baumann, M. Heuken, Ulrich Weber, P. Lehnen, Y. Senzaki, (unknown), Brian Lu, (unknown), B. Schineller	2
2	Advances in ALD Equipment for sub-40nm Memory Capacitor Dielectrics: Precursor delivery, Materials and Processes 2008 ·ECS Transactions ·Zia Karim, Y. Senzaki, Sasangan Ramanathan, (unknown), Hugo Silva, (unknown)	1
3	A novel thermally-stable zirconium amidinate ALD precursor for ZrO2 thin films 2008 ·Microelectronic Engineering ·(unknown), (unknown), (unknown), M. J. Kim, Robert M. Wallace, Jin-Soo Kim, Y. Senzaki, Deo Shenai, (unknown), (unknown), (unknown)	72
4	Comparison of ALD of HfO2, SiO2, and HfSiOx Thin Films Using Various Metal/Silicon Alkylamide Precursors and O3 2007 ·ECS Transactions ·(unknown), (unknown), (unknown), (unknown), Deo Shenai, (unknown), Y. Senzaki	5
5	Composition dependence of the work function of Ta1−xAlxNy metal gates 2006 ·Applied Physics Letters ·Husam N. Alshareef, Kiho Choi, H.C. Wen, H.F. Luan, H. R. Harris, Y. Senzaki, P. Majhi, (unknown), R. Jammy, (unknown), Bruce E. Gnade, Robert M. Wallace	34
6	Nucleation and growth study of atomic layer deposited HfO2 gate dielectrics resulting in improved scaling and electron mobility 2006 ·Journal of Applied Physics ·P. D. Kirsch, Manuel Quevedo-López, (unknown), Y. Senzaki, Jeff J. Peterson, (unknown), Sitaraman Krishnan, N. Moumen, Joel Barnett, G. Bersuker, P. Y. Hung, (unknown), T. A. Lafford, (unknown), (unknown), John G. Ekerdt	98
7	Atomic Layer Deposited HfO₂ and HfSiO to Enable CMOS Gate Dielectric Scaling, Mobility, and VTH Stability 2006 ·ECS Transactions ·Paul Kirsch, Manuel Quevedo-López, Siddarth Krishnan, (unknown), Rino Choi, Prashant Majhi, Y. Senzaki, G. Bersuker, Byoung Hun Lee	5
8	Effective work function modification of atomic-layer-deposited-TaN film by capping layer 2006 ·Applied Physics Letters ·(unknown), Husam N. Alshareef, H.C. Wen, H. R. Harris, H.F. Luan, Y. Senzaki, Patrick Lysaght, P. Majhi, (unknown)	41
9	Temperature dependence of the work function of ruthenium-based gate electrodes 2006 ·Thin Solid Films ·Husam N. Alshareef, H.C. Wen, H.F. Luan, Kwang‐Il Choi, H. R. Harris, Y. Senzaki, P. Majhi, (unknown), Brendan Foran, G. Lian	12
10	Thermal response of Ru electrodes in contact with SiO2 and Hf-based high-k gate dielectrics 2005 ·Journal of Applied Physics ·H.C. Wen, Patrick Lysaght, Husam N. Alshareef, C. Huffman, H. R. Harris, Kwang‐Il Choi, Y. Senzaki, H.F. Luan, P. Majhi, (unknown), (unknown), Brendan Foran, G. D. Lian, Dim‐Lee Kwong	25
11	Evaluation and integration of metal gate electrodes for future generation dual metal CMOS 2005 ·P. Majhi, Huiqing Wen, Husam N. Alshareef, Kyoung Hwan Choi, Rusty Harris, Patrick Lysaght, H.F. Luan, Y. Senzaki, S. C. Song, (unknown), Chuck Ramiller	9
12	Atomic layer deposition of high-k thin films for gate and capacitor dielectrics 2004 ·Y. Senzaki, Hood Chatham, (unknown), (unknown), Tien-Yu Lo, (unknown), (unknown), (unknown), (unknown), Brian Ford	2
13	An Advanced High-k Transistor Utilizing Metal-Organic Precursors in an ALD Deposition of Hafnium Oxide and Hafnium Silicate with Ozone as Oxidizer 2004 ·MRS Proceedings ·(unknown), George Brown, Y. Senzaki, Seung Park	4
14	Thermo-coloration of SmS thin flims by XPS in situ observation 2003 ·Applied Surface Science ·Yukimasa Mori, Sakae Tanemura, (unknown), Y. Senzaki, Ping Jin, Kenji Kaneko, (unknown), (unknown)	19
15	Fabrication and characterization of metal and semiconductor SmS thin films by rf/dc dual magnetron sputtering 2003 ·Applied Surface Science ·Sakae Tanemura, (unknown), Y. Senzaki, Lei Miao, (unknown), Yukimasa Mori, Ping Jin, Kenji Kaneko, (unknown), Nataliya Nabatova-Gabain	10
16	High quality Ta/sub 2/O/sub 5/ gate dielectrics with T/sub ox.eq/>10 Å 2003 ·H.F. Luan, (unknown), (unknown), (unknown), (unknown), Y. Senzaki, David A. Roberts, D. L. Kwong	0
17	Performance and reliability of ultra thin CVD HfO/sub 2/ gate dielectrics with dual poly-Si gate electrodes 2002 ·(unknown), H.F. Luan, (unknown), T.S. Jeon, Weiping Bai, Y. Senzaki, David A. Roberts, Dim‐Lee Kwong	31
18	Characterization of hot wall RTP for thin gate oxide films 2002 ·(unknown), (unknown), Y. Senzaki, (unknown), (unknown), (unknown)	1
19	High quality ultra thin CVD HfO/sub 2/ gate stack with poly-Si gate electrode 2002 ·(unknown), H.F. Luan, Weiping Bai, (unknown), T.S. Jeon, Y. Senzaki, David A. Roberts, Dim‐Lee Kwong	37
20	MOS characteristics of ultra thin rapid thermal CVD ZrO/sub 2/ and Zr silicate gate dielectrics 2002 ·(unknown), H.F. Luan, Weiping Bai, (unknown), T.S. Jeon, Y. Senzaki, David A. Roberts, D. L. Kwong	19

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact