H.F. Luan

935 total citations
48 papers, 676 citations indexed

About

H.F. Luan is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, H.F. Luan has authored 48 papers receiving a total of 676 indexed citations (citations by other indexed papers that have themselves been cited), including 46 papers in Electrical and Electronic Engineering, 9 papers in Mechanics of Materials and 8 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in H.F. Luan's work include Semiconductor materials and devices (42 papers), Advancements in Semiconductor Devices and Circuit Design (26 papers) and Integrated Circuits and Semiconductor Failure Analysis (12 papers). H.F. Luan is often cited by papers focused on Semiconductor materials and devices (42 papers), Advancements in Semiconductor Devices and Circuit Design (26 papers) and Integrated Circuits and Semiconductor Failure Analysis (12 papers). H.F. Luan collaborates with scholars based in United States, Canada and China. H.F. Luan's co-authors include P. Majhi, Husam N. Alshareef, H.C. Wen, Dim‐Lee Kwong, Y. Senzaki, H. R. Harris, Sook‐Keun Song, David A. Roberts, Patrick Lysaght and Weiping Bai and has published in prestigious journals such as SHILAP Revista de lepidopterología, Applied Physics Letters and Journal of Applied Physics.

In The Last Decade

H.F. Luan

44 papers receiving 632 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
H.F. Luan United States 16 639 135 79 52 40 48 676
Won-Cheol Jeong South Korea 9 208 0.3× 166 1.2× 97 1.2× 82 1.6× 26 0.7× 30 290
Lars‐Åke Ragnarsson Belgium 20 1.3k 2.1× 217 1.6× 134 1.7× 66 1.3× 22 0.6× 97 1.4k
C. D’Emic United States 11 605 0.9× 197 1.5× 115 1.5× 39 0.8× 7 0.2× 15 630
Younghyun Kim South Korea 12 330 0.5× 118 0.9× 96 1.2× 29 0.6× 19 0.5× 58 383
K. Hieda Japan 15 620 1.0× 60 0.4× 84 1.1× 28 0.5× 11 0.3× 60 681
Shoumian Chen China 8 285 0.4× 62 0.5× 22 0.3× 101 1.9× 55 1.4× 61 325
Peng Zhao Singapore 11 317 0.5× 77 0.6× 84 1.1× 43 0.8× 10 0.3× 68 400
K. Schuegraf United States 8 280 0.4× 88 0.7× 33 0.4× 34 0.7× 23 0.6× 20 335
Vadim Sidorkin Netherlands 9 225 0.4× 78 0.6× 36 0.5× 27 0.5× 8 0.2× 22 314
Tomoyuki Suwa Japan 12 434 0.7× 97 0.7× 44 0.6× 44 0.8× 10 0.3× 86 488

Countries citing papers authored by H.F. Luan

Since Specialization
Citations

This map shows the geographic impact of H.F. Luan's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by H.F. Luan with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites H.F. Luan more than expected).

Fields of papers citing papers by H.F. Luan

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by H.F. Luan. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by H.F. Luan. The network helps show where H.F. Luan may publish in the future.

Co-authorship network of co-authors of H.F. Luan

This figure shows the co-authorship network connecting the top 25 collaborators of H.F. Luan. A scholar is included among the top collaborators of H.F. Luan based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with H.F. Luan. H.F. Luan is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Yu, Haoyi, Zihao Huang, Simone Lamon, et al.. (2025). All-optical image transportation through a multimode fibre using a miniaturized diffractive neural network on the distal facet. Nature Photonics. 19(5). 486–493. 17 indexed citations
2.
Dong, Yibo, et al.. (2025). High-throughput optical neuromorphic graphic processing at millions of images per second. SHILAP Revista de lepidopterología. 5(1).
3.
4.
Luan, H.F., et al.. (2025). Permanganate pretreatment improves the production of short chain fatty acids from waste activated sludge at pH10: Performance and mechanism. Separation and Purification Technology. 362. 131692–131692. 4 indexed citations
5.
Dong, Yibo, Dajun Lin, Baoli Li, et al.. (2024). Compact eternal diffractive neural network chip for extreme environments. SHILAP Revista de lepidopterología. 3(1). 7 indexed citations
6.
Su, Hang, et al.. (2023). Event-based diffractive neural network chip for dynamic action recognition. Optics & Laser Technology. 169. 110136–110136. 10 indexed citations
7.
Alshareef, Husam N., Kiho Choi, H.C. Wen, et al.. (2006). Composition dependence of the work function of Ta1−xAlxNy metal gates. Applied Physics Letters. 88(7). 34 indexed citations
8.
Harris, H. R., Husam N. Alshareef, Huiqing Wen, et al.. (2006). Simplified manufacturable band edge metal gate solution for NMOS without a capping layer. 1–4. 4 indexed citations
9.
Wen, H.C., Patrick Lysaght, Husam N. Alshareef, et al.. (2005). Thermal response of Ru electrodes in contact with SiO2 and Hf-based high-k gate dielectrics. Journal of Applied Physics. 98(4). 25 indexed citations
10.
Wen, Huiqing, P. Majhi, Husam N. Alshareef, et al.. (2005). Work function engineering of RuHf alloys as gate electrodes for future generation dual metal CMOS. 24. 107–108. 1 indexed citations
11.
12.
Luan, H.F., T.S. Jeon, Weiping Bai, et al.. (2002). Performance and reliability of ultra thin CVD HfO/sub 2/ gate dielectrics with dual poly-Si gate electrodes. 133–134. 31 indexed citations
13.
Song, Sook‐Keun, H.F. Luan, Mark Gardner, et al.. (2002). Ultra thin (>20 Å) CVD Si/sub 3/N/sub 4/ gate dielectric for deep-sub-micron CMOS devices. 373–376. 3 indexed citations
14.
Luan, H.F., Weiping Bai, T.S. Jeon, et al.. (2002). High quality ultra thin CVD HfO/sub 2/ gate stack with poly-Si gate electrode. 31–34. 37 indexed citations
15.
Lu, Qiang, P. Ranade, Hideki Takeuchi, et al.. (2001). Dual-metal gate CMOS technology with ultrathin silicon nitride gate dielectric. IEEE Electron Device Letters. 22(5). 227–229. 77 indexed citations
16.
Lu, Qiang, Yee‐Chia Yeo, R. Lin, et al.. (2001). Two silicon nitride technologies for post-SiO2 MOSFET gate dielectric. IEEE Electron Device Letters. 22(7). 324–326. 9 indexed citations
17.
18.
Song, Sook‐Keun, et al.. (1999). Ultra thin high quality stack nitride/oxide gate dielectrics prepared by in-situ rapid thermal N2O oxidation of NH3-nitrided Si. Microelectronic Engineering. 48(1-4). 55–58. 13 indexed citations
19.
Song, Sook‐Keun, H.F. Luan, Dim‐Lee Kwong, et al.. (1999). Formation of High Quality Oxynitride Gate Dielectrics by High Pressure Thermal Oxidation of Si in NO. MRS Proceedings. 567. 3 indexed citations
20.
Song, Sook‐Keun, H.F. Luan, Mark Gardner, et al.. (1999). High Quality Ultra Thin CVD Si3N4Gate Dielectrics Fabricated By Rapid Thermal Process. MRS Proceedings. 567. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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