K. Fujihara

642 total citations
26 papers, 541 citations indexed

About

K. Fujihara is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, K. Fujihara has authored 26 papers receiving a total of 541 indexed citations (citations by other indexed papers that have themselves been cited), including 22 papers in Electrical and Electronic Engineering, 7 papers in Atomic and Molecular Physics, and Optics and 5 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in K. Fujihara's work include Semiconductor materials and devices (20 papers), Advancements in Semiconductor Devices and Circuit Design (13 papers) and Integrated Circuits and Semiconductor Failure Analysis (11 papers). K. Fujihara is often cited by papers focused on Semiconductor materials and devices (20 papers), Advancements in Semiconductor Devices and Circuit Design (13 papers) and Integrated Circuits and Semiconductor Failure Analysis (11 papers). K. Fujihara collaborates with scholars based in South Korea, United States and Japan. K. Fujihara's co-authors include C. N. Whang, Youngchae Roh, Dae‐Hong Ko, M.-H. Cho, N. I. Lee, K. Jeong, Sahn Nahm, J. H. Lee, K. Jeong and Seok-Woo Nam and has published in prestigious journals such as Applied Physics Letters, ACS Catalysis and IEEE Electron Device Letters.

In The Last Decade

K. Fujihara

25 papers receiving 525 citations

Peers

K. Fujihara
T.S. Jeon United States
Y. Senzaki United States
R. Lupták Germany
Woon-Il Choi South Korea
Chia Ching Yeo Singapore
Katarina Forsgren Sweden
N. Lakshminarayan South Korea
S.B. Lee South Korea
A. V. Gelatos United States
Peter C. Van Buskirk United States
T.S. Jeon United States
K. Fujihara
Citations per year, relative to K. Fujihara K. Fujihara (= 1×) peers T.S. Jeon

Countries citing papers authored by K. Fujihara

Since Specialization
Citations

This map shows the geographic impact of K. Fujihara's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by K. Fujihara with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites K. Fujihara more than expected).

Fields of papers citing papers by K. Fujihara

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by K. Fujihara. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by K. Fujihara. The network helps show where K. Fujihara may publish in the future.

Co-authorship network of co-authors of K. Fujihara

This figure shows the co-authorship network connecting the top 25 collaborators of K. Fujihara. A scholar is included among the top collaborators of K. Fujihara based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with K. Fujihara. K. Fujihara is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Li, Yanbing, Yingluo He, K. Fujihara, et al.. (2023). A Core-Shell Structured Na/Fe@Co Bimetallic Catalyst for Light-Hydrocarbon Synthesis from CO2 Hydrogenation. Catalysts. 13(7). 1090–1090. 6 indexed citations
2.
Heo, Jung Min, et al.. (2004). The P-SOG filling Shallow Trench Isolation technology for sub-70 nm device. 155–156. 3 indexed citations
3.
Fujihara, K., et al.. (2003). ポリイミド配列層上のポリ(9,9‐ジオクチルフルオレン)薄膜の偏光蛍光. Synthetic Metals. 295–296. 1 indexed citations
4.
Fujihara, K., et al.. (2003). Polarized fluorescence of poly(9,9-dioctylfluorene) thin films on polyimide alignment layers. Synthetic Metals. 135-136. 295–296. 7 indexed citations
5.
Heo, Jung Min, et al.. (2003). Void free and low stress shallow trench isolation technology using P-SOG for sub 0.1 μm device. 132–133. 2 indexed citations
6.
Kim, H.S., Chang-Hoon Choi, Sang‐Hun Jeong, et al.. (2003). High performance transistors with state-of-the-art CMOS technologies. 427–430. 2 indexed citations
7.
Shin, Jawon, Youngchae Roh, I.-W. Lyo, et al.. (2003). Characteristics of ultrathin SiO2 films using dry rapid thermal oxidation and Pt catalyzed wet oxidation. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 21(4). 1004–1008. 5 indexed citations
8.
9.
Yi, Junsin, et al.. (2002). On the gate oxide scaling of high performance CMOS transistors. 3.2.1–3.2.4. 7 indexed citations
10.
Cho, M.-H., et al.. (2002). Chemical structure of ultrathin SiO2 film with nitrogen incorporated by remote nitrogen plasma. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 20(5). 1676–1681. 5 indexed citations
11.
Cho, M.-H., Youngchae Roh, C. N. Whang, et al.. (2002). Thermal stability and structural characteristics of HfO2 films on Si (100) grown by atomic-layer deposition. Applied Physics Letters. 81(3). 472–474. 305 indexed citations
12.
13.
Yi, Jiali, et al.. (2002). CMOS device scaling beyond 100 nm. 235–238. 17 indexed citations
14.
Roh, Youngchae, C. N. Whang, K. Jeong, et al.. (2002). Dielectric characteristics of Al2O3–HfO2 nanolaminates on Si(100). Applied Physics Letters. 81(6). 1071–1073. 114 indexed citations
15.
16.
Fujihara, K., et al.. (2002). A smart batch type RTA technology for beyond 256 Mbit DRAM. 95–96. 1 indexed citations
17.
Choi, Chel‐Jong, Sannian Song, Si‐Young Choi, et al.. (2002). High performance pMOSFETs with Ni(Si/sub x/Ge/sub 1-x/)/poly-Si/sub 0.8/Ge/sub 0.2/ gate. 114–115. 1 indexed citations
18.
Choi, Jung Hyun, et al.. (2002). Design of sub-100 nm CMOSFETs: gate dielectrics and channel engineering. 190–191. 5 indexed citations
19.
Choi, Chang-Hoon, et al.. (2000). High performance pMOSFETs with Ni(SixGe1-x)/poly-Si0.8Ge0.2 gate. Symposium on VLSI Technology. 114–115. 1 indexed citations
20.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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