J. J. Bucchignano

1.2k total citations
35 papers, 730 citations indexed

About

J. J. Bucchignano is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Biomedical Engineering. According to data from OpenAlex, J. J. Bucchignano has authored 35 papers receiving a total of 730 indexed citations (citations by other indexed papers that have themselves been cited), including 30 papers in Electrical and Electronic Engineering, 11 papers in Atomic and Molecular Physics, and Optics and 10 papers in Biomedical Engineering. Recurrent topics in J. J. Bucchignano's work include Semiconductor materials and devices (21 papers), Advancements in Semiconductor Devices and Circuit Design (14 papers) and Advancements in Photolithography Techniques (10 papers). J. J. Bucchignano is often cited by papers focused on Semiconductor materials and devices (21 papers), Advancements in Semiconductor Devices and Circuit Design (14 papers) and Advancements in Photolithography Techniques (10 papers). J. J. Bucchignano collaborates with scholars based in United States, Switzerland and South Korea. J. J. Bucchignano's co-authors include Shalom J. Wind, Phaedon Avouris, Shouheng Sun, K. Liu, Josef Michl, Richard Martel, P. Santhanam, Michael Brady, G. Shahidi and Keith Fogel and has published in prestigious journals such as Proceedings of the National Academy of Sciences, Physical Review Letters and Physical review. B, Condensed matter.

In The Last Decade

J. J. Bucchignano

34 papers receiving 705 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
J. J. Bucchignano United States 14 465 312 207 186 124 35 730
T.T. Vu United States 8 371 0.8× 226 0.7× 250 1.2× 268 1.4× 42 0.3× 13 652
Robert Celotta United States 9 250 0.5× 423 1.4× 273 1.3× 108 0.6× 60 0.5× 21 672
Katja Tonisch Germany 17 429 0.9× 283 0.9× 460 2.2× 258 1.4× 406 3.3× 58 872
A. Weddemann Germany 13 226 0.5× 173 0.6× 331 1.6× 236 1.3× 94 0.8× 31 704
Renjie Chen United States 15 419 0.9× 315 1.0× 248 1.2× 296 1.6× 130 1.0× 34 768
Feifei Qin China 15 471 1.0× 267 0.9× 226 1.1× 368 2.0× 132 1.1× 73 795
Akemi Hirotsune Japan 8 257 0.6× 300 1.0× 344 1.7× 203 1.1× 38 0.3× 28 607
Wayne Y. Fung United States 10 691 1.5× 526 1.7× 486 2.3× 375 2.0× 42 0.3× 16 1.1k
B. Bayraktaroglu United States 20 1.1k 2.5× 350 1.1× 132 0.6× 459 2.5× 121 1.0× 107 1.3k
L. El Melhaoui France 11 565 1.2× 364 1.2× 158 0.8× 188 1.0× 27 0.2× 19 732

Countries citing papers authored by J. J. Bucchignano

Since Specialization
Citations

This map shows the geographic impact of J. J. Bucchignano's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by J. J. Bucchignano with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites J. J. Bucchignano more than expected).

Fields of papers citing papers by J. J. Bucchignano

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by J. J. Bucchignano. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by J. J. Bucchignano. The network helps show where J. J. Bucchignano may publish in the future.

Co-authorship network of co-authors of J. J. Bucchignano

This figure shows the co-authorship network connecting the top 25 collaborators of J. J. Bucchignano. A scholar is included among the top collaborators of J. J. Bucchignano based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with J. J. Bucchignano. J. J. Bucchignano is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Ho, Po‐Hsun, Damon B. Farmer, George S. Tulevski, et al.. (2018). Intrinsically ultrastrong plasmon–exciton interactions in crystallized films of carbon nanotubes. Proceedings of the National Academy of Sciences. 115(50). 12662–12667. 32 indexed citations
2.
Tsai, Hsinyu, Hiroyuki Miyazoe, Sebastian Engelmann, et al.. (2013). Pattern transfer of directed self-assembly (DSA) patterns for CMOS device applications. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8685. 86850L–86850L. 7 indexed citations
3.
Tsai, Hsinyu, Hiroyuki Miyazoe, B. To, et al.. (2012). Sub-30 nm pitch line-space patterning of semiconductor and dielectric materials using directed self-assembly. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 30(6). 28 indexed citations
4.
Sun, Yanning, E. Kiewra, J. P. de Souza, et al.. (2009). High mobility III–V channel MOSFETs for post-Si CMOS applications. 161–164. 2 indexed citations
5.
Sun, Yanning, E. Kiewra, J. P. de Souza, et al.. (2008). Scaling of In<inf>0.7</inf>Ga<inf>0.3</inf>As buried-channel MOSFETs. 1–4. 19 indexed citations
6.
Sun, Yanning, E. Kiewra, J. P. de Souza, et al.. (2008). High Performance Long-and Short-Channel In<inf>0.7</inf>Ga<inf>0.3</inf>As-channel MOSFETs. 637. 41–42. 2 indexed citations
7.
Sun, Yanning, Steven J. Koester, E. Kiewra, et al.. (2007). Post-Si CMOS: III-V n-MOSFETs with high-k gate dielectrics. 231–234. 2 indexed citations
8.
Steen, S.E., Sharee J. McNab, L. Šekarić, et al.. (2006). Hybrid lithography: The marriage between optical and e-beam lithography. A method to study process integration and device performance for advanced device nodes. Microelectronic Engineering. 83(4-9). 754–761. 14 indexed citations
9.
Wind, Shalom J., Lei Shi, Rahul Roy, et al.. (2003). Very high performance 50 nm CMOS at low temperature. 928–930. 3 indexed citations
10.
Davari, B., Wei‐Hsu Chang, M.R. Wordeman, et al.. (2003). A high performance 0.25 mu m CMOS technology. 34. 56–59. 5 indexed citations
11.
Taur, Y., Shalom J. Wind, Y. J. Mii, et al.. (2002). High performance 0.1 μm CMOS devices with 1.5 V power supply. 127–130. 24 indexed citations
12.
Petrillo, Karen, David R. Medeiros, J. J. Bucchignano, et al.. (2002). Enhancement of KRS-XE for 50 keV Advanced Mask Making Applications. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4889. 607–607. 1 indexed citations
13.
Liu, K., Phaedon Avouris, J. J. Bucchignano, et al.. (2002). Simple fabrication scheme for sub-10 nm electrode gaps using electron-beam lithography. Applied Physics Letters. 80(5). 865–867. 137 indexed citations
14.
Boyd, D., J. J. Bucchignano, Jian Cai, et al.. (2001). New polysilicon disposable sidewall process for sub-50 nm CMOS. 159–162. 1 indexed citations
15.
Bucchignano, J. J., et al.. (1997). Ultrasonic and dip resist development processes for 50 nm device fabrication. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 15(6). 2621–2626. 17 indexed citations
16.
Roy, R., L. A. Clevenger, C. Cabral, et al.. (1995). In situ x-ray diffraction analysis of the C49–C54 titanium silicide phase transformation in narrow lines. Applied Physics Letters. 66(14). 1732–1734. 64 indexed citations
17.
Chi, C.C., P. Santhanam, Shalom J. Wind, Michael Brady, & J. J. Bucchignano. (1994). Minimum critical length for superconductivity in one-dimensional wires. Physical review. B, Condensed matter. 50(5). 3487–3490. 4 indexed citations
18.
Santhanam, P., et al.. (1991). Resistance anomaly near the superconducting transition temperature in short aluminum wires. Physical Review Letters. 66(17). 2254–2257. 107 indexed citations
19.
Rothwell, Mary Beth, et al.. (1989). Resist contrast enhancement in high resolution electron beam lithography. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 7(6). 1771–1777. 3 indexed citations
20.
Wetzel, J. T., Marko Jošt, S. A. Rishton, et al.. (1989). On the preparation of cross-sectional TEM samples using lithographic processing and reactive ion-etching. Ultramicroscopy. 29(1-4). 110–114. 3 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact

Breakdown of academic impact, for papers by T.T. Vu Breakdown of academic impact, for papers by Robert Celotta Breakdown of academic impact, for papers by Katja Tonisch Breakdown of academic impact, for papers by A. Weddemann Breakdown of academic impact, for papers by Renjie Chen Breakdown of academic impact, for papers by Feifei Qin Breakdown of academic impact, for papers by Akemi Hirotsune Breakdown of academic impact, for papers by Wayne Y. Fung Breakdown of academic impact, for papers by B. Bayraktaroglu Breakdown of academic impact, for papers by L. El Melhaoui
Rankless by CCL
2026