M.R. Wordeman

2.9k citations
69 papers · 2.0k indexed · h-index 20

M.R. Wordeman

65 papers receiving 1.9k citations

Peers

M.R. Wordeman
Comparison fields: 5 of 59
  • Electrical and Electronic Engineering 1.9k
  • Hardware and Architecture 121
  • Atomic and Molecular Physics, and Optics 279
  • Applied Mathematics 61
  • Computer Networks and Communications 103
Replace Marek Turowski with:
Marek Turowski United States
W.L. Engl Germany
B. Meinerzhagen Germany
A. Gnudi Italy
N. Stojadinović Serbia
S. V. Hattangady United States
J. Félix United States
Anthony L. Lentine United States
W. Greene United States
C.A.T. Salama Canada
M.R. Wordeman relative to Marek Turowski United States Marek Turowski's profile →
Citations per field
00.5×4.3×
Marek Turowski · 1×
Citations per year

Countries citing papers authored by M.R. Wordeman

Since Specialization
Citations

This map shows the geographic impact of M.R. Wordeman's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by M.R. Wordeman with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites M.R. Wordeman more than expected).

Fields of papers citing papers by M.R. Wordeman

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by M.R. Wordeman. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by M.R. Wordeman. The network helps show where M.R. Wordeman may publish in the future.

Co-authorship network

The 25 scholars most cited alongside M.R. Wordeman, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with M.R. Wordeman Line = papers co-authored together M.R. Wordeman links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown
#Work
1
Process-design considerations for three dimensional memory integration
20063
2 20030
3 20035
4 20003
5 19983
6 19972
7 199622
8 199031
9 198921
10 19891
11 198811
12 19882
13
Submicron Tungsten Gate MOSFET with 10 nm Gate Oxide
19876
14
0.5 μm CMOS Device Design and Characterization
19871
15 19854
16
A Fully Scaled Half-Micrometer NMOS Technology Using Direct-Write E-Beam Lithography
19841
17 198210
18 198261
19
Modeling and Control of Alpha-Particle Effects in Scaled-Down VLSI Circuits
19812
20 19814

About M.R. Wordeman

M.R. Wordeman is a scholar working on Hardware and Architecture, Electrical and Electronic Engineering, Computer Networks and Communications, Atomic and Molecular Physics, and Optics and Automotive Engineering, having authored 69 papers that have together received 2.0k indexed citations. Recurring topics across this work include Semiconductor materials and devices (46 papers), Advancements in Semiconductor Devices and Circuit Design (37 papers), Integrated Circuits and Semiconductor Failure Analysis (13 papers), Low-power high-performance VLSI design (10 papers), Interconnection Networks and Systems (8 papers), Silicon Carbide Semiconductor Technologies (8 papers), VLSI and Analog Circuit Testing (7 papers) and Parallel Computing and Optimization Techniques (7 papers). The work is most often cited by research in Electrical and Electronic Engineering (1.9k citations), Hardware and Architecture (121 citations), Atomic and Molecular Physics, and Optics (279 citations), Applied Mathematics (61 citations) and Computer Networks and Communications (103 citations). M.R. Wordeman has collaborated with scholars based in United States, Italy and Japan. Frequent co-authors include G. Baccarani, R.H. Dennard, G.A. Sai-Halasz, J.Y.-C. Sun, Yuan Taur, E. Ganin, D. P. Kern, S. A. Rishton, B. Davari and D.S. Zicherman. Their work appears in journals such as IEEE Transactions on Electron Devices, IEEE Journal of Solid-State Circuits, IEEE Electron Device Letters, IBM Journal of Research and Development and Journal of The Electrochemical Society.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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