E. Kratschmer

1.8k total citations · 1 hit paper
36 papers, 1.2k citations indexed

About

E. Kratschmer is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Biomedical Engineering. According to data from OpenAlex, E. Kratschmer has authored 36 papers receiving a total of 1.2k indexed citations (citations by other indexed papers that have themselves been cited), including 33 papers in Electrical and Electronic Engineering, 11 papers in Atomic and Molecular Physics, and Optics and 11 papers in Biomedical Engineering. Recurrent topics in E. Kratschmer's work include Advancements in Photolithography Techniques (20 papers), Semiconductor materials and devices (11 papers) and Electron and X-Ray Spectroscopy Techniques (10 papers). E. Kratschmer is often cited by papers focused on Advancements in Photolithography Techniques (20 papers), Semiconductor materials and devices (11 papers) and Electron and X-Ray Spectroscopy Techniques (10 papers). E. Kratschmer collaborates with scholars based in United States, Germany and Russia. E. Kratschmer's co-authors include M. Isaacson, A. Harootunian, Eric Betzig, A. Lewis, T. H. P. Chang, Mingzhu Yu, S. A. Rishton, M. G. R. Thomson, K. Y. Lee and B. W. Hussey and has published in prestigious journals such as ACS Nano, Applied Physics Letters and Journal of Applied Physics.

In The Last Decade

E. Kratschmer

36 papers receiving 1.1k citations

Hit Papers

align trajectories

What are hit papers?

Hit papers significantly outperform the citation benchmark for their cohort. A paper qualifies if it has ≥500 total citations, achieves ≥1.5× the top-1% citation threshold for papers in the same subfield and year (this is the minimum needed to enter the top 1%, not the average within it), or reaches the top citation threshold in at least one of its specific research topics.

Near Field Scanning Optical Microscopy (NSOM)

1986 294 citations M. Isaacson, E. Kratschmer et al. profile →

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
E. Kratschmer United States	19	845	648	399	258	181	36	1.2k
M. Spajer France	15	723 0.9×	901 1.4×	754 1.9×	110 0.4×	104 0.6×	47	1.2k
Kenji Kurihara Japan	18	1.1k 1.2×	667 1.0×	412 1.0×	200 0.8×	235 1.3×	52	1.4k
Mark Neisser United States	16	923 1.1×	422 0.7×	110 0.3×	421 1.6×	148 0.8×	89	1.2k
Erik M. Secula United States	11	349 0.4×	179 0.3×	142 0.4×	124 0.5×	182 1.0×	156	591
Ndubuisi G. Orji United States	17	594 0.7×	376 0.6×	440 1.1×	223 0.9×	87 0.5×	63	996
D. W. Carr United States	20	1.3k 1.5×	583 0.9×	1.2k 3.0×	136 0.5×	272 1.5×	38	1.7k
Noreen Harned Netherlands	14	643 0.8×	314 0.5×	206 0.5×	286 1.1×	121 0.7×	28	930
Gian F. Lorusso Belgium	17	875 1.0×	173 0.3×	162 0.4×	461 1.8×	191 1.1×	162	1.2k
Chusuke Munakata Japan	18	813 1.0×	152 0.2×	538 1.3×	128 0.5×	239 1.3×	98	1.0k
Emiliano R. Martins United Kingdom	18	911 1.1×	545 0.8×	452 1.1×	266 1.0×	184 1.0×	50	1.6k

Countries citing papers authored by E. Kratschmer

Since Specialization

Citations

This map shows the geographic impact of E. Kratschmer's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by E. Kratschmer with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites E. Kratschmer more than expected).

Fields of papers citing papers by E. Kratschmer

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by E. Kratschmer. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by E. Kratschmer. The network helps show where E. Kratschmer may publish in the future.

Co-authorship network of co-authors of E. Kratschmer

This figure shows the co-authorship network connecting the top 25 collaborators of E. Kratschmer. A scholar is included among the top collaborators of E. Kratschmer based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with E. Kratschmer. E. Kratschmer is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Hu, Shuren, Marwan Khater, Rafael Salas‐Montiel, et al.. (2018). Experimental realization of deep-subwavelength confinement in dielectric optical resonators. Science Advances. 4(8). eaat2355–eaat2355. 125 indexed citations

Brink, Markus, Isaac Lauer, Sebastian Engelmann, et al.. (2014). Contamination mitigation of hydrogen silsesquioxane resist processed with Na+-containing developer for nanoscale CMOS device patterning. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 32(2). 2 indexed citations

Rooks, M. J., et al.. (2005). Experimental optimization of the electron-beam proximity effect forward scattering parameter. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 23(6). 2769–2774. 12 indexed citations

Fontana, R.E., J. A. Katine, R. Viswanathan, et al.. (2002). E-beam writing: a next-generation lithography approach for thin-film head critical features. IEEE Transactions on Magnetics. 38(1). 95–100. 33 indexed citations

Rooks, M. J., E. Kratschmer, R. Viswanathan, et al.. (2002). Low stress development of poly(methylmethacrylate) for high aspect ratio structures. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 20(6). 2937–2941. 70 indexed citations

Krasnoperova, Azalia A., et al.. (1999). Imaging capabilities of proximity x-ray lithography at 70-nm ground rules. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3676. 24–24. 8 indexed citations

Chang, T. H. P., M. G. R. Thomson, Mingzhu Yu, et al.. (1996). Electron beam technology—SEM to microcolumn. Microelectronic Engineering. 32(1-4). 113–130. 35 indexed citations

Yu, Ming L., B. W. Hussey, E. Kratschmer, T. H. P. Chang, & W.A. Mackie. (1995). Improved emission stability of carburized HfC〈100〉 and ultrasharp tungsten field emitters. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 13(6). 2436–2440. 21 indexed citations

Yu, Mingzhu, et al.. (1995). Miniature Schottky electron source. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 13(6). 2468–2472. 18 indexed citations

10.

Kratschmer, E., et al.. (1995). An electron-beam microcolumn with improved resolution, beam current, and stability. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 13(6). 2498–2503. 46 indexed citations

11.

Kratschmer, E., et al.. (1994). Evaluation of Zr/O/W Schottky emitters for microcolumn applications. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 12(6). 3413–3417. 13 indexed citations

12.

Rishton, S. A., D. P. Kern, E. Kratschmer, & T. H. P. Chang. (1989). Electron beam lithography of sub-0.1μm circuits. Microelectronic Engineering. 9(1-4). 183–186. 3 indexed citations

13.

Kratschmer, E., S. A. Rishton, D. P. Kern, & T. H. P. Chang. (1988). Quantitative analysis of resolution and stability in nanometer electron beam lithography. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 6(6). 2074–2079. 27 indexed citations

14.

Chang, T. H. P., D. P. Kern, E. Kratschmer, et al.. (1988). Nanostructure technology. IBM Journal of Research and Development. 32(4). 462–493. 39 indexed citations

15.

Kratschmer, E. & M. Isaacson. (1987). Progress in self-developing metal fluoride resists. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 5(1). 369–373. 43 indexed citations

16.

Adesida, I., E. Kratschmer, E. D. Wolf, A. Muray, & M. Isaacson. (1985). Ion beam lithography at nanometer dimensions. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 3(1). 45–49. 13 indexed citations

17.

Kratschmer, E., Brian Whitehead, M. Isaacson, & E. D. Wolf. (1985). Nanometer scale metal wire fabrication. Microelectronic Engineering. 3(1-4). 25–32. 2 indexed citations

18.

Kratschmer, E., A. Erko, V. T. Petrashov, & H. Beneking. (1984). Device fabrication by nanolithography and electroplating for magnetic flux quantization measurements. Applied Physics Letters. 44(10). 1011–1013. 8 indexed citations

19.

Stephani, D., E. Kratschmer, & H. Beneking. (1983). A field emission e-beam system for nanometer lithography. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 1(4). 1011–1013. 5 indexed citations

20.

Kratschmer, E.. (1981). Verification of a proximity effect correction program in electron-beam lithography. Journal of Vacuum Science and Technology. 19(4). 1264–1268. 19 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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