D. Klaus

1.4k total citations
29 papers, 757 citations indexed

About

D. Klaus is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, D. Klaus has authored 29 papers receiving a total of 757 indexed citations (citations by other indexed papers that have themselves been cited), including 22 papers in Electrical and Electronic Engineering, 8 papers in Biomedical Engineering and 6 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in D. Klaus's work include Semiconductor materials and devices (15 papers), Advancements in Semiconductor Devices and Circuit Design (11 papers) and Advancements in Photolithography Techniques (6 papers). D. Klaus is often cited by papers focused on Semiconductor materials and devices (15 papers), Advancements in Semiconductor Devices and Circuit Design (11 papers) and Advancements in Photolithography Techniques (6 papers). D. Klaus collaborates with scholars based in United States. D. Klaus's co-authors include Michael Guillorn, Santino D. Carnevale, George Keefe, Oliver Dial, Sebastian Engelmann, Sarunya Bangsaruntip, Eric Joseph, Hsinyu Tsai, Hiroyuki Miyazoe and David McKay and has published in prestigious journals such as Physical Review Letters, ACS Nano and IEEE Electron Device Letters.

In The Last Decade

D. Klaus

27 papers receiving 738 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
D. Klaus United States 14 411 256 225 179 130 29 757
Pablo Bianucci Canada 19 678 1.6× 858 3.4× 238 1.1× 210 1.2× 183 1.4× 55 1.2k
Ruisheng Liang China 18 571 1.4× 427 1.7× 84 0.4× 63 0.4× 701 5.4× 68 980
Francesco De Nicola Italy 11 168 0.4× 272 1.1× 262 1.2× 171 1.0× 157 1.2× 28 640
R. Dinu Germany 11 788 1.9× 409 1.6× 49 0.2× 160 0.9× 349 2.7× 29 943
Yingjie Liu China 18 1.1k 2.6× 490 1.9× 121 0.5× 91 0.5× 103 0.8× 47 1.2k
Marcelo Wu United States 12 439 1.1× 332 1.3× 33 0.1× 84 0.5× 259 2.0× 28 551
Butsurin Jinnai Japan 12 389 0.9× 379 1.5× 61 0.3× 159 0.9× 55 0.4× 32 658
Federica Bianco Italy 12 379 0.9× 375 1.5× 29 0.1× 245 1.4× 188 1.4× 33 655
Rachel Won United Kingdom 10 415 1.0× 316 1.2× 25 0.1× 168 0.9× 156 1.2× 88 603
Pavel M. Voroshilov Russia 13 258 0.6× 316 1.2× 50 0.2× 102 0.6× 303 2.3× 25 684

Countries citing papers authored by D. Klaus

Since Specialization
Citations

This map shows the geographic impact of D. Klaus's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by D. Klaus with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites D. Klaus more than expected).

Fields of papers citing papers by D. Klaus

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by D. Klaus. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by D. Klaus. The network helps show where D. Klaus may publish in the future.

Co-authorship network of co-authors of D. Klaus

This figure shows the co-authorship network connecting the top 25 collaborators of D. Klaus. A scholar is included among the top collaborators of D. Klaus based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with D. Klaus. D. Klaus is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Wei, Ken Xuan, Easwar Magesan, Isaac Lauer, et al.. (2022). Hamiltonian Engineering with Multicolor Drives for Fast Entangling Gates and Quantum Crosstalk Cancellation. Physical Review Letters. 129(6). 60501–60501. 50 indexed citations
2.
Stehlik, J., D. M. Zajac, Devin Underwood, et al.. (2021). Tunable Coupling Architecture for Fixed-Frequency Transmon Superconducting Qubits. Physical Review Letters. 127(8). 80505–80505. 93 indexed citations
3.
Kandala, Abhinav, Ken Xuan Wei, Srikanth Srinivasan, et al.. (2021). Demonstration of a High-Fidelity cnot Gate for Fixed-Frequency Transmons with Engineered ZZ Suppression. Physical Review Letters. 127(13). 130501–130501. 104 indexed citations
4.
Pyzyna, A., Hsinyu Tsai, Maria José Lo Faro, et al.. (2017). Resistivity of copper interconnects at 28 nm pitch and copper cross-sectional area below 100 nm2. 1–3. 13 indexed citations
5.
Tsai, Hsinyu, Hiroyuki Miyazoe, Joy Cheng, et al.. (2015). Self-aligned line-space pattern customization with directed self-assembly graphoepitaxy at 24nm pitch. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9423. 942314–942314. 3 indexed citations
6.
Tsai, Hsinyu, Hiroyuki Miyazoe, Josephine Chang, et al.. (2014). Electrical characterization of FinFETs with fins formed by directed self assembly at 29 nm fin pitch using a self-aligned fin customization scheme. 32.1.1–32.1.4. 1 indexed citations
7.
Bangsaruntip, Sarunya, Karthik Balakrishnan, Josephine Chang, et al.. (2013). Density scaling with gate-all-around silicon nanowire MOSFETs for the 10 nm node and beyond. 20.2.1–20.2.4. 79 indexed citations
8.
Engelmann, Sebastian, Ryan M. Martin, Robert L. Bruce, et al.. (2012). Patterning of CMOS device structures for 40-80nm pitches and beyond. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9 indexed citations
9.
Bangsaruntip, Sarunya, A. Majumdar, G. M. Cohen, et al.. (2010). Gate-all-around silicon nanowire 25-stage CMOS ring oscillators with diameter down to 3 nm. 21–22. 43 indexed citations
10.
Khater, Marwan, Zhen Zhang, Jin Cai, et al.. (2010). High-$\kappa$/Metal-Gate Fully Depleted SOI CMOS With Single-Silicide Schottky Source/Drain With Sub-30-nm Gate Length. IEEE Electron Device Letters. 31(4). 275–277. 13 indexed citations
11.
Shahidi, G., J. Warnock, B. Davari, et al.. (2003). A high performance BiCMOS technology using 0.25 mu m CMOS and double poly 47 GHz bipolar. 28–29.
12.
Taur, Y., Shalom J. Wind, Y. J. Mii, et al.. (2002). High performance 0.1 μm CMOS devices with 1.5 V power supply. 127–130. 24 indexed citations
13.
Mii, Y. J., Shalom J. Wind, Yuan Taur, et al.. (2002). An ultra-low power 0.1 μm CMOS. 9–10. 6 indexed citations
14.
Edelstein, D., Cyprian Uzoh, C. Cabral, et al.. (2001). A high performance liner for copper damascene interconnects. 9–11. 62 indexed citations
15.
Cook, Robert F., E. Liniger, D. Klaus, E. Simonyi, & S. A. Cohen. (1998). Properties Development During Curing of Low Dielectric-Constant Spin-On Glasses. MRS Proceedings. 511. 14 indexed citations
16.
Wind, Shalom J., et al.. (1993). Fabrication and characterization of compact 100nm scale metal oxide semiconductor field effect transistors. Microelectronic Engineering. 21(1-4). 409–417.
17.
Wind, Shalom J., et al.. (1991). Nanofabrication techniques for 100 nm-scale silicon metal oxide semiconductor field effect transistor. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 9(6). 2851–2855. 3 indexed citations
18.
Wetzel, J. T., Marko Jošt, S. A. Rishton, et al.. (1989). On the preparation of cross-sectional TEM samples using lithographic processing and reactive ion-etching. Ultramicroscopy. 29(1-4). 110–114. 3 indexed citations
19.
Ng, Hong, D. Klaus, M.R. Polcari, & W. W. Molzen. (1986). Reactive Ion Etching of Multi-Layer Resist. MRS Proceedings. 76. 1 indexed citations
20.
Klaus, D., et al.. (1974). [Reflex time determination and tremor registration using the Infraton pulse registration set].. PubMed. 25(16). 698–701. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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