M. Hatzakis

1.9k total citations
85 papers, 1.3k citations indexed

About

M. Hatzakis is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, M. Hatzakis has authored 85 papers receiving a total of 1.3k indexed citations (citations by other indexed papers that have themselves been cited), including 64 papers in Electrical and Electronic Engineering, 27 papers in Surfaces, Coatings and Films and 25 papers in Biomedical Engineering. Recurrent topics in M. Hatzakis's work include Advancements in Photolithography Techniques (56 papers), Electron and X-Ray Spectroscopy Techniques (24 papers) and Semiconductor materials and devices (22 papers). M. Hatzakis is often cited by papers focused on Advancements in Photolithography Techniques (56 papers), Electron and X-Ray Spectroscopy Techniques (24 papers) and Semiconductor materials and devices (22 papers). M. Hatzakis collaborates with scholars based in United States, Greece and Slovakia. M. Hatzakis's co-authors include Jane M. Shaw, Istvan Haller, R. Srinivasan, J. Paraszczak, Ian M. Croll, L. T. Romankiw, A. N. Broers, I. Raptis, Ν. Γλέζος and F. Babich and has published in prestigious journals such as Applied Physics Letters, Proceedings of the IEEE and Journal of The Electrochemical Society.

In The Last Decade

M. Hatzakis

84 papers receiving 1.2k citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
M. Hatzakis United States 17 950 471 312 238 172 85 1.3k
David F. Kyser United States 17 1.3k 1.3× 304 0.6× 541 1.7× 435 1.8× 229 1.3× 36 1.7k
Kenji Gamo Japan 19 891 0.9× 296 0.6× 210 0.7× 383 1.6× 234 1.4× 115 1.2k
Kenji Kurihara Japan 18 1.1k 1.1× 667 1.4× 200 0.6× 412 1.7× 235 1.4× 52 1.4k
R. Balboni Italy 16 458 0.5× 257 0.5× 117 0.4× 400 1.7× 171 1.0× 70 870
H. W. Lehmann Switzerland 21 694 0.7× 355 0.8× 132 0.4× 336 1.4× 428 2.5× 43 1.1k
Tsutom Yotsuya Japan 20 497 0.5× 320 0.7× 206 0.7× 308 1.3× 319 1.9× 66 995
R. Torge Germany 6 600 0.6× 166 0.4× 116 0.4× 372 1.6× 212 1.2× 10 877
N. Shibata Japan 19 722 0.8× 208 0.4× 218 0.7× 252 1.1× 676 3.9× 61 1.5k
Douglas J. Resnick United States 22 1.1k 1.2× 1.1k 2.3× 196 0.6× 529 2.2× 195 1.1× 132 1.7k
Hideo Namatsu Japan 25 1.5k 1.5× 915 1.9× 272 0.9× 635 2.7× 313 1.8× 83 1.9k

Countries citing papers authored by M. Hatzakis

Since Specialization
Citations

This map shows the geographic impact of M. Hatzakis's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by M. Hatzakis with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites M. Hatzakis more than expected).

Fields of papers citing papers by M. Hatzakis

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by M. Hatzakis. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by M. Hatzakis. The network helps show where M. Hatzakis may publish in the future.

Co-authorship network of co-authors of M. Hatzakis

This figure shows the co-authorship network connecting the top 25 collaborators of M. Hatzakis. A scholar is included among the top collaborators of M. Hatzakis based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with M. Hatzakis. M. Hatzakis is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Tegou, E., Εvangelos Gogolides, Panagiotis Argitis, et al.. (2000). Epoxidized novolac resist (EPR) for high-resolution negative- and positive-tone electron beam lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3999. 1181–1181. 5 indexed citations
2.
Gogolides, Εvangelos, E. Tegou, K. Beltsios, Kyriaki G. Papadokostaki, & M. Hatzakis. (1996). Thermal and mechanical analysis of photoresist and silylated photoresist films: Application to AZ 5214™. Microelectronic Engineering. 30(1-4). 267–270. 9 indexed citations
3.
Gogolides, Εvangelos, et al.. (1995). A new method which increases the Si content in wet silylation, and its relation to the thermal effects during O2 plasma development. Microelectronic Engineering. 27(1-4). 381–384. 2 indexed citations
4.
Gogolides, Εvangelos, et al.. (1994). Quarter-micron lithography with a wet-silylated and dry-developed commercial photoresist. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 12(6). 3914–3918. 1 indexed citations
5.
Gogolides, Εvangelos, et al.. (1993). Characterization of a positive-tone wet silylation process with the AZ 5214TM photoresist. Microelectronic Engineering. 21(1-4). 263–266. 3 indexed citations
6.
Bobroff, Norman, Alan E. Rosenbluth, & M. Hatzakis. (1992). Scanning differential interferometer to measure index heterogeneity. Applied Optics. 31(31). 6622–6622. 2 indexed citations
7.
Γλέζος, Ν., I. Raptis, D. Tsoukalas, & M. Hatzakis. (1992). Application of a new analytical technique of electron distribution calculations to the profile simulation of a high sensitivity negative electron-beam resist. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 10(6). 2606–2609. 11 indexed citations
8.
Hatzakis, M., et al.. (1990). New high resolution and high sensitivity deep UV, x-ray, and electron beam resists. Microelectronic Engineering. 11(1-4). 487–489. 5 indexed citations
9.
Paraszczak, J., et al.. (1987). The use of organosilicon polymers in multilayer plasma resist processing. Microelectronic Engineering. 6(1-4). 453–460. 12 indexed citations
10.
Babich, F., et al.. (1985). A comparison of the electron beam sensitivities and relative oxygen plasma etch rates of various organosilicon polymers. Microelectronic Engineering. 3(1-4). 279–291. 13 indexed citations
11.
Paraszczak, J., F. Babich, M. Hatzakis, & Jane M. Shaw. (1985). Summary Abstract: Characteristics of organosilicon polymers immersed in gaseous plasmas. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 3(1). 358–359. 2 indexed citations
12.
Chang, T. H. P. & M. Hatzakis. (1980). Proceedings of the 15th symposium on electron, ion, and photon beam technology, 19 May-1 June 1979, Sheraton-Boston Hotel, Boston, Massachusetts. American Institute of Physics eBooks. 1 indexed citations
13.
Hatzakis, M.. (1979). PMMA copolymers as high sensitivity electron resists. Journal of Vacuum Science and Technology. 16(6). 1984–1988. 46 indexed citations
14.
Haller, Ivan, et al.. (1979). Copolymers of Methyl Methacrylate and Methacrylic Acid and Their Metal Salts as Radiation Sensitive Resists. Journal of The Electrochemical Society. 126(1). 154–161. 51 indexed citations
15.
Shaw, Jane M. & M. Hatzakis. (1978). Performance characteristics of diazo-type photoresists under e-beam and optical exposure. IEEE Transactions on Electron Devices. 25(4). 425–430. 16 indexed citations
16.
Ahn, K. Y., et al.. (1975). Electron-beam fabrication of high-density amorphous bubble film devices. IEEE Transactions on Magnetics. 11(5). 1142–1144. 4 indexed citations
17.
Laibowitz, R. B., C. C. Tsuei, J. J. Cuomo, Jed I. Ziegler, & M. Hatzakis. (1975). Fabrication and Josephson properties of Nb<inf>3</inf>Ge. IEEE Transactions on Magnetics. 11(2). 883–884. 10 indexed citations
18.
Sadagopan, V., M. Hatzakis, K. Y. Ahn, et al.. (1972). HIGH-DENSITY BUBBLE DOMAIN SHIFT REGISTER. AIP conference proceedings. 215–219. 6 indexed citations
19.
Hatzakis, M., et al.. (1971). Electron Beam Fabrication of Micron Transistors. IBM Journal of Research and Development. 15(6). 446–451. 15 indexed citations
20.
Thornley, R., et al.. (1970). Electron-optical masking of semiconductor structures. IEEE Transactions on Electron Devices. 17(11). 961–964. 3 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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