Ulrich Hofmann
- Instrumentation top 5%
- Surfaces, Coatings and Films top 10%
- Electron and X-Ray Spectroscopy Techniques 12
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- Advancements in Photolithography Techniques 28
- Advanced MEMS and NEMS Technologies 14
- Integrated Circuits and Semiconductor Failure Analysis 10
- Photonic and Optical Devices 9
- Semiconductor Lasers and Optical Devices 6
- Nuclear and High Energy Physics top 10%
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- Advanced Measurement and Metrology Techniques 10
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- Advanced Surface Polishing Techniques 9
- Co-authors
- Joachim JanesHans-Joachim QuenzerP. RingH.P. BoehmW. BeneckeJörg AlbersB. WagnerJörn Thielecke
- Journals
- Microelectronic Engineering (8 papers)Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena (4 papers)Microsystem Technologies (1 paper)
- Partner nations
- GermanyUnited StatesAustria
In The Last Decade
Ulrich Hofmann
52 papers receiving 686 citations
Peers
Comparison fields: 5 of 77
- Instrumentation 93
- Surfaces, Coatings and Films 54
- Electrical and Electronic Engineering 431
- Nuclear and High Energy Physics 88
- Atomic and Molecular Physics, and Optics 169
Countries citing papers authored by Ulrich Hofmann
This map shows the geographic impact of Ulrich Hofmann's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Ulrich Hofmann with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Ulrich Hofmann more than expected).
Fields of papers citing papers by Ulrich Hofmann
This network shows the impact of papers produced by Ulrich Hofmann. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Ulrich Hofmann. The network helps show where Ulrich Hofmann may publish in the future.
Co-authorship network
The 25 scholars most cited alongside Ulrich Hofmann, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 2024 | 0 | |
| 2 | 2023 | 1 | |
| 3 | 2020 | 22 | |
| 4 | 2020 | 16 | |
| 5 | 2020 | 6 | |
| 6 | 2017 | 1 | |
| 7 | New Designs for MEMS-Micromirrors and Micromirror Packaging with Electrostatic and Piezoelectric Drive | 2016 | 6 |
| 8 | 2015 | 13 | |
| 9 | 2014 | 19 | |
| 10 | 2013 | 14 | |
| 11 | 2013 | 43 | |
| 12 | 2013 | 1 | |
| 13 | 2012 | 7 | |
| 14 | 2012 | 39 | |
| 15 | 2011 | 5 | |
| 16 | 2000 | 6 | |
| 17 | 1999 | 5 | |
| 18 | 1997 | 9 | |
| 19 | 1991 | 4 | |
| 20 | 1953 | 4 |
About Ulrich Hofmann
Ulrich Hofmann is a scholar working on Surfaces, Coatings and Films, Instrumentation, Electrical and Electronic Engineering, Media Technology and Radiation, having authored 59 papers that have together received 738 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (28 papers), Advanced MEMS and NEMS Technologies (14 papers), Electron and X-Ray Spectroscopy Techniques (12 papers), Advanced Measurement and Metrology Techniques (10 papers), Integrated Circuits and Semiconductor Failure Analysis (10 papers), Advanced Surface Polishing Techniques (9 papers), Photonic and Optical Devices (9 papers) and Semiconductor Lasers and Optical Devices (6 papers). The work is most often cited by research in Instrumentation (93 citations), Surfaces, Coatings and Films (54 citations), Electrical and Electronic Engineering (431 citations), Nuclear and High Energy Physics (88 citations) and Atomic and Molecular Physics, and Optics (169 citations). Ulrich Hofmann has collaborated with scholars based in Germany, United States and Austria. Frequent co-authors include Joachim Janes, Hans-Joachim Quenzer, P. Ring, H.P. Boehm, W. Benecke, Jörg Albers, B. Wagner, Jörn Thielecke, Bernhard Wagner and Andreas Bahr. Their work appears in journals such as Microelectronic Engineering, Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena, Microsystem Technologies, Journal of Micro/Nanolithography MEMS and MOEMS and Physics Letters B.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.