Prasad Bhosale
- Materials Chemistry
- Electrical and Electronic Engineering
- Surfaces, Coatings and Films top 5%
- Condensed Matter Physics top 10%
- Electronic, Optical and Magnetic Materials
- Co-authors
- Mahesh V. PanchagnulaHolly A. StretzJohn C. BergNicholas A. LanzilloJaehun ChunDaniel GallT. StandaertC. Lavoie
- Topics
- Copper Interconnects and Reliability (8 papers)Semiconductor materials and devices (8 papers)Electrostatics and Colloid Interactions (3 papers)
- Partner nations
- United StatesIndiaSouth Africa
In The Last Decade
Prasad Bhosale
22 papers receiving 346 citations
Peers
Comparison fields: 5 of 49
- Materials Chemistry 209
- Electrical and Electronic Engineering 152
- Surfaces, Coatings and Films 94
- Condensed Matter Physics 71
- Electronic, Optical and Magnetic Materials 57
Countries citing papers authored by Prasad Bhosale
This map shows the geographic impact of Prasad Bhosale's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Prasad Bhosale with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Prasad Bhosale more than expected).
Fields of papers citing papers by Prasad Bhosale
This network shows the impact of papers produced by Prasad Bhosale. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Prasad Bhosale. The network helps show where Prasad Bhosale may publish in the future.
Co-authorship network of co-authors of Prasad Bhosale
This figure shows the co-authorship network connecting the top 25 collaborators of Prasad Bhosale. A scholar is included among the top collaborators of Prasad Bhosale based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Prasad Bhosale. Prasad Bhosale is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | 0 | |
| 2 | 6 | |
| 3 | 2 | |
| 4 | 9 | |
| 5 | 0 | |
| 6 | 6 | |
| 7 | 8 | |
| 8 | 1 | |
| 9 | 13 | |
| 10 | 15 | |
| 11 | 17 | |
| 12 | 18 | |
| 13 | 4 | |
| 14 | 8 | |
| 15 | 13 | |
| 16 | 10 | |
| 17 | 14 | |
| 18 | 13 | |
| 19 | 41 | |
| 20 | 130 |
About Prasad Bhosale
Prasad Bhosale is a scholar working on Electronic, Optical and Magnetic Materials, Surfaces, Coatings and Films and Physical and Theoretical Chemistry, having authored 24 papers that have together received 357 indexed citations. Recurring topics across this work include Copper Interconnects and Reliability (8 papers), Semiconductor materials and devices (8 papers) and Electrostatics and Colloid Interactions (3 papers). The work is most often cited by research in Surfaces, Coatings and Films (94 citations), Condensed Matter Physics (71 citations) and Materials Chemistry (209 citations). Prasad Bhosale has collaborated with scholars based in United States, India and South Africa. Frequent co-authors include Mahesh V. Panchagnula, Holly A. Stretz, John C. Berg, Nicholas A. Lanzillo, Jaehun Chun, Daniel Gall, T. Standaert, C. Lavoie, T. Spooner and Oscar D. Restrepo. Their work appears in journals such as Applied Physics Letters, Chemistry of Materials and Langmuir.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.