Heidi B. Cao

1.1k total citations
42 papers, 892 citations indexed

About

Heidi B. Cao is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, Heidi B. Cao has authored 42 papers receiving a total of 892 indexed citations (citations by other indexed papers that have themselves been cited), including 41 papers in Electrical and Electronic Engineering, 18 papers in Surfaces, Coatings and Films and 14 papers in Biomedical Engineering. Recurrent topics in Heidi B. Cao's work include Advancements in Photolithography Techniques (41 papers), Integrated Circuits and Semiconductor Failure Analysis (19 papers) and Electron and X-Ray Spectroscopy Techniques (16 papers). Heidi B. Cao is often cited by papers focused on Advancements in Photolithography Techniques (41 papers), Integrated Circuits and Semiconductor Failure Analysis (19 papers) and Electron and X-Ray Spectroscopy Techniques (16 papers). Heidi B. Cao collaborates with scholars based in United States, Japan and Australia. Heidi B. Cao's co-authors include Hai Deng, Takahiro Kozawa, Seiichi Tagawa, Christopher K. Ober, Michael J. Leeson, Paul F. Nealey, Ramakrishnan Ayothi, Wang Yueh, Nelson Felix and Manish Chandhok and has published in prestigious journals such as Journal of Applied Physics, Chemistry of Materials and Journal of Materials Chemistry.

In The Last Decade

Heidi B. Cao

42 papers receiving 838 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Heidi B. Cao United States 17 783 420 333 91 65 42 892
Danilo De Simone Belgium 16 750 1.0× 238 0.6× 413 1.2× 68 0.7× 49 0.8× 126 839
Jason K. Stowers United States 13 439 0.6× 120 0.3× 246 0.7× 94 1.0× 15 0.2× 25 517
Hoa D. Truong United States 12 392 0.5× 275 0.7× 89 0.3× 273 3.0× 138 2.1× 33 590
Toshiyuki Yoshimura Japan 11 386 0.5× 235 0.6× 90 0.3× 77 0.8× 18 0.3× 29 497
Mark Somervell United States 17 381 0.5× 272 0.6× 97 0.3× 300 3.3× 83 1.3× 42 568
T. H. Fedynyshyn United States 11 239 0.3× 142 0.3× 72 0.2× 110 1.2× 7 0.1× 22 343
Kanaiyalal C. Patel United States 10 131 0.2× 114 0.3× 74 0.2× 295 3.2× 127 2.0× 13 367
J. L. Alay Belgium 13 549 0.7× 126 0.3× 72 0.2× 252 2.8× 4 0.1× 32 607
J. D. Grange United Kingdom 9 296 0.4× 99 0.2× 76 0.2× 88 1.0× 9 0.1× 15 399
Isabelle Etchart France 8 321 0.4× 166 0.4× 17 0.1× 418 4.6× 19 0.3× 10 559

Countries citing papers authored by Heidi B. Cao

Since Specialization
Citations

This map shows the geographic impact of Heidi B. Cao's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Heidi B. Cao with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Heidi B. Cao more than expected).

Fields of papers citing papers by Heidi B. Cao

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Heidi B. Cao. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Heidi B. Cao. The network helps show where Heidi B. Cao may publish in the future.

Co-authorship network of co-authors of Heidi B. Cao

This figure shows the co-authorship network connecting the top 25 collaborators of Heidi B. Cao. A scholar is included among the top collaborators of Heidi B. Cao based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Heidi B. Cao. Heidi B. Cao is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Nealey, Paul F., et al.. (2008). Impact of trench width roughness on the graphoepitaxial assembly of block copolymers. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 26(6). 2484–2488. 14 indexed citations
2.
Bratton, Daniel, Ramakrishnan Ayothi, Hai Deng, Heidi B. Cao, & Christopher K. Ober. (2007). Diazonaphthoquinone Molecular Glass Photoresists:  Patterning without Chemical Amplification. Chemistry of Materials. 19(15). 3780–3786. 34 indexed citations
3.
Dean, Kim, Iwao Nishiyama, Hiroaki Oizumi, et al.. (2007). An analysis of EUV-resist outgassing measurements. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6519. 65191P–65191P. 23 indexed citations
4.
Saeki, Akinori, Takahiro Kozawa, Seiichi Tagawa, et al.. (2007). Line edge roughness after development in a positive-tone chemically amplified resist of post-optical lithography investigated by Monte Carlo simulation and a dissolution model. Nanotechnology. 19(1). 15705–15705. 16 indexed citations
5.
Yamamoto, Hiroki, Takahiro Kozawa, Seiichi Tagawa, et al.. (2007). Polymer-Structure Dependence of Acid Generation in Chemically Amplified Extreme Ultraviolet Resists. Japanese Journal of Applied Physics. 46(2L). L142–L142. 67 indexed citations
6.
Jack, Kevin S., Heping Liu, Idriss Blakey, et al.. (2007). The rational design of polymeric EUV resist materials by QSPR modelling. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6519. 65193Z–65193Z. 9 indexed citations
7.
Bratton, Daniel, Ramakrishnan Ayothi, Nelson Felix, et al.. (2006). Molecular glass resists for next generation lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6153. 61531D–61531D. 17 indexed citations
8.
Lavery, Kristopher A., Bryan D. Vogt, Vivek M. Prabhu, et al.. (2006). Fundamentals of the reaction-diffusion process in model EUV photoresists. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6153. 615313–615313. 7 indexed citations
9.
Saeki, Akinori, Takahiro Kozawa, Seiichi Tagawa, & Heidi B. Cao. (2006). Line edge roughness of a latent image in post-optical lithography. Nanotechnology. 17(6). 1543–1546. 35 indexed citations
10.
Ayothi, Ramakrishnan, et al.. (2006). All-organic non-PFOS nonionic photoacid generating compounds with functionalized fluoroorganic sulfonate motif for chemically amplified resists. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6153. 61530J–61530J. 1 indexed citations
11.
Roberts, J. M., Robert Bristol, Heidi B. Cao, et al.. (2006). Exposing extreme ultraviolet lithography at Intel. Microelectronic Engineering. 83(4-9). 672–675. 14 indexed citations
12.
Kwark, Young‐Je, et al.. (2005). Silicon Containing Organic-Inorganic Hybrid Materials as EUV Photoresists. Journal of Photopolymer Science and Technology. 18(4). 481–487. 9 indexed citations
13.
Kwark, Young‐Je, et al.. (2005). Inorganic polymer resists for EUVL. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5753. 732–732. 4 indexed citations
14.
Cao, Heidi B., Wang Yueh, J. M. Roberts, et al.. (2005). EUV resist patterning performance from the Intel microexposure tool (MET). Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5753. 459–459. 7 indexed citations
15.
Yueh, Wang, et al.. (2004). Patterning capabilities of EUV resists. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5376. 434–434. 11 indexed citations
16.
Kwark, Young‐Je, et al.. (2004). Silicon backbone polymers as EUV resists. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5376. 739–739. 5 indexed citations
17.
Cao, Heidi B., et al.. (2004). Sources of line-width roughness for EUV resists. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5376. 757–757. 20 indexed citations
18.
Goldberg, Kenneth A., Patrick Naulleau, Heidi B. Cao, et al.. (2004). EUV resist imaging below 50 nm using coherent spatial filtering techniques. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5374. 454–454. 4 indexed citations
19.
Cao, Heidi B., et al.. (2003). Intel's EUV resist development. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5039. 484–484. 9 indexed citations
20.
Cao, Heidi B., et al.. (2000). Pattern collapse in high-aspect-ratio DUV and 193-nm resists. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3999. 313–313. 13 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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