Greg Denbeaux

912 total citations
36 papers, 717 citations indexed

About

Greg Denbeaux is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, Greg Denbeaux has authored 36 papers receiving a total of 717 indexed citations (citations by other indexed papers that have themselves been cited), including 29 papers in Electrical and Electronic Engineering, 23 papers in Surfaces, Coatings and Films and 8 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in Greg Denbeaux's work include Advancements in Photolithography Techniques (28 papers), Electron and X-Ray Spectroscopy Techniques (23 papers) and Integrated Circuits and Semiconductor Failure Analysis (18 papers). Greg Denbeaux is often cited by papers focused on Advancements in Photolithography Techniques (28 papers), Electron and X-Ray Spectroscopy Techniques (23 papers) and Integrated Circuits and Semiconductor Failure Analysis (18 papers). Greg Denbeaux collaborates with scholars based in United States, South Korea and Germany. Greg Denbeaux's co-authors include Robert L. Brainard, Joseph E. Davies, Eric E. Fullerton, Kai Liu, Jeffrey B. Kortright, Olav Hellwig, Craig Higgins, Leonidas E. Ocola, Michael Murphy and Thomas I. Wallow and has published in prestigious journals such as Applied Physics Letters, Physical Review B and Japanese Journal of Applied Physics.

In The Last Decade

Greg Denbeaux

35 papers receiving 689 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Greg Denbeaux United States 14 441 276 254 178 152 36 717
O. Andreyev Germany 11 352 0.8× 80 0.3× 414 1.6× 172 1.0× 112 0.7× 13 761
Enzo Rotunno Italy 18 353 0.8× 83 0.3× 210 0.8× 118 0.7× 244 1.6× 64 868
James L. Speidell United States 11 321 0.7× 70 0.3× 200 0.8× 326 1.8× 144 0.9× 21 669
D. L. Abraham Netherlands 15 269 0.6× 116 0.4× 592 2.3× 66 0.4× 165 1.1× 23 693
Anthony E. Novembre United States 12 352 0.8× 164 0.6× 46 0.2× 88 0.5× 166 1.1× 86 525
Fujio Wakaya Japan 15 536 1.2× 143 0.5× 232 0.9× 58 0.3× 286 1.9× 127 963
O. T. A. Janssen Netherlands 9 235 0.5× 119 0.4× 246 1.0× 177 1.0× 456 3.0× 13 568
D. C. Parks United States 10 161 0.4× 52 0.2× 203 0.8× 80 0.4× 107 0.7× 13 375
Hiroyuki Shinada Japan 11 164 0.4× 138 0.5× 167 0.7× 44 0.2× 72 0.5× 46 397
Luis Serrano-Ramón Spain 9 122 0.3× 143 0.5× 320 1.3× 81 0.5× 149 1.0× 10 536

Countries citing papers authored by Greg Denbeaux

Since Specialization
Citations

This map shows the geographic impact of Greg Denbeaux's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Greg Denbeaux with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Greg Denbeaux more than expected).

Fields of papers citing papers by Greg Denbeaux

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Greg Denbeaux. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Greg Denbeaux. The network helps show where Greg Denbeaux may publish in the future.

Co-authorship network of co-authors of Greg Denbeaux

This figure shows the co-authorship network connecting the top 25 collaborators of Greg Denbeaux. A scholar is included among the top collaborators of Greg Denbeaux based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Greg Denbeaux. Greg Denbeaux is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Denbeaux, Greg, et al.. (2024). Mechanistic Studies of Positive-Tone Organoantimony Resists. Journal of Photopolymer Science and Technology. 37(3). 279–285. 1 indexed citations
2.
Denbeaux, Greg, et al.. (2023). Understanding the onset of EUV resist chemical stochastics. Japanese Journal of Applied Physics. 62(SG). SG0813–SG0813. 4 indexed citations
3.
Murphy, Michael, et al.. (2021). EUV Photochemistry of α-Substituted Antimony Carboxylate Complexes. Journal of Photopolymer Science and Technology. 34(1). 81–86. 5 indexed citations
4.
Murphy, Michael, et al.. (2019). Oligomers of MORE: Molecular Organometallic Resists for EUV. 61–61. 3 indexed citations
5.
Ackerman, Christian, et al.. (2017). Mechanisms of EUV exposure: electrons and holes. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10143. 101430W–101430W. 14 indexed citations
6.
Murphy, Michael, et al.. (2017). Antimony photoresists for EUV lithography: mechanistic studies. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10143. 1014307–1014307. 13 indexed citations
7.
Neisser, Mark, et al.. (2016). Cross sections of EUV PAGs: influence of concentration, electron energy, and structure. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9779. 97790C–97790C. 6 indexed citations
8.
Brainard, Robert L., et al.. (2016). Acid Generation Efficiency of EUV PAGs via Low Energy Electron Exposure. Journal of Photopolymer Science and Technology. 29(3). 453–458. 18 indexed citations
9.
Herbol, Henry, et al.. (2015). Studying thickness loss in extreme ultraviolet resists due to electron beam exposure using experiment and modeling. Journal of Micro/Nanolithography MEMS and MOEMS. 14(4). 43502–43502. 8 indexed citations
10.
Re, Ryan Del, Henry Herbol, I. Bocharova, et al.. (2013). Secondary Electrons in EUV Lithography. Journal of Photopolymer Science and Technology. 26(5). 625–634. 70 indexed citations
11.
Choi, Jaehyuck, et al.. (2012). Investigation of EUV haze defect: molecular behaviors of mask cleaning chemicals on EUV mask surfaces. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8322. 83220S–83220S. 1 indexed citations
12.
Higgins, Craig, et al.. (2011). Resolution, Line-Edge Roughness, Sensitivity Tradeoff, and Quantum Yield of High Photo Acid Generator Resists for Extreme Ultraviolet Lithography. Japanese Journal of Applied Physics. 50(3R). 36504–36504. 35 indexed citations
13.
Higgins, Craig, et al.. (2009). RLS tradeoff vs. quantum yield of high PAG EUV resists. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7271. 727147–727147. 20 indexed citations
14.
Jack, Kevin S., Heping Liu, Idriss Blakey, et al.. (2007). The rational design of polymeric EUV resist materials by QSPR modelling. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6519. 65193Z–65193Z. 9 indexed citations
15.
Denbeaux, Greg, et al.. (2007). Quantitative measurement of EUV resist outgassing. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6533. 653318–653318. 12 indexed citations
16.
Hartley, John G., Greg Denbeaux, Harry Levinson, et al.. (2006). A year in the life of an immersion lithography alpha tool at Albany NanoTech. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6151. 615101–615101. 2 indexed citations
17.
Denbeaux, Greg, et al.. (2005). Reflection Mode Imaging with High Resolution X-ray Microscopy. University of North Texas Digital Library (University of North Texas). 2 indexed citations
18.
Johansson, Göran A., et al.. (2004). Exploring the use of soft X‐ray microscopy for imaging subcellular structures of the inner ear1. Journal of Microscopy. 215(2). 203–212. 10 indexed citations
19.
Denbeaux, Greg. (2000). Spectromicroscopy at the XM-1. AIP conference proceedings. 507. 478–483. 5 indexed citations
20.
Denbeaux, Greg, et al.. (1997). Resorting the NIST undulator using simulated annealing for field error reduction. AIP conference proceedings. 58–58. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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