Kim Dean

478 total citations
42 papers, 358 citations indexed

About

Kim Dean is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, Kim Dean has authored 42 papers receiving a total of 358 indexed citations (citations by other indexed papers that have themselves been cited), including 40 papers in Electrical and Electronic Engineering, 21 papers in Surfaces, Coatings and Films and 10 papers in Biomedical Engineering. Recurrent topics in Kim Dean's work include Advancements in Photolithography Techniques (40 papers), Integrated Circuits and Semiconductor Failure Analysis (24 papers) and Electron and X-Ray Spectroscopy Techniques (20 papers). Kim Dean is often cited by papers focused on Advancements in Photolithography Techniques (40 papers), Integrated Circuits and Semiconductor Failure Analysis (24 papers) and Electron and X-Ray Spectroscopy Techniques (20 papers). Kim Dean collaborates with scholars based in United States, France and Greece. Kim Dean's co-authors include James L. McAtee, Patrick Naulleau, Kenneth E. Gonsalves, Robert L. Brainard, Kenneth A. Goldberg, Paul Denham, Gregg M. Gallatin, R. J. Matyi, Jason P. Cain and Daniel A. Miller and has published in prestigious journals such as IEEE Journal of Quantum Electronics, Applied Clay Science and Journal of Luminescence.

In The Last Decade

Kim Dean

37 papers receiving 309 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Kim Dean United States 11 302 167 105 32 31 42 358
Karine Kenis Belgium 10 244 0.8× 33 0.2× 107 1.0× 11 0.3× 13 0.4× 50 363
Jeroen H. Lammers Belgium 8 236 0.8× 141 0.8× 97 0.9× 10 0.3× 15 318
Yongxiang Sun China 11 193 0.6× 17 0.1× 95 0.9× 156 4.9× 112 3.6× 17 325
Tatsuhiko Shigematsu Japan 11 295 1.0× 9 0.1× 56 0.5× 5 0.2× 4 0.1× 18 401
Zoran Falkenstein United States 9 400 1.3× 63 0.4× 27 0.3× 8 0.3× 14 517
Н. А. Дроздов Belarus 9 263 0.9× 7 0.0× 43 0.4× 54 1.7× 7 0.2× 34 370
Ricardo Canute Kamikawachi Brazil 12 468 1.5× 4 0.0× 116 1.1× 3 0.1× 9 0.3× 51 547
Michael Chatzidakis Canada 4 357 1.2× 18 0.1× 17 0.2× 17 0.5× 4 426
A. Martelli Italy 9 124 0.4× 5 0.0× 32 0.3× 8 0.3× 52 279
S. Ahuja United States 5 49 0.2× 20 0.1× 55 0.5× 1 0.0× 3 0.1× 15 176

Countries citing papers authored by Kim Dean

Since Specialization
Citations

This map shows the geographic impact of Kim Dean's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Kim Dean with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Kim Dean more than expected).

Fields of papers citing papers by Kim Dean

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Kim Dean. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Kim Dean. The network helps show where Kim Dean may publish in the future.

Co-authorship network of co-authors of Kim Dean

This figure shows the co-authorship network connecting the top 25 collaborators of Kim Dean. A scholar is included among the top collaborators of Kim Dean based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Kim Dean. Kim Dean is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Anderson, Christopher N., et al.. (2008). Influence of base and PAG on deprotection blur in EUV photoresists and some thoughts on shot noise. University of North Texas Digital Library (University of North Texas). 26.
2.
Gallatin, Gregg M., et al.. (2008). Resolution, LER, and sensitivity limitations of photoresists. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6921. 69211E–69211E. 40 indexed citations
3.
Anderson, Christopher N., et al.. (2008). Influence of base and photoacid generator on deprotection blur in extreme ultraviolet photoresists and some thoughts on shot noise. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 26(6). 2295–2299. 4 indexed citations
4.
Dean, Kim, Iwao Nishiyama, Hiroaki Oizumi, et al.. (2007). An analysis of EUV-resist outgassing measurements. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6519. 65191P–65191P. 23 indexed citations
5.
Dean, Kim, et al.. (2007). EUV Resist Outgassing: How Much is Too Much?. Journal of Photopolymer Science and Technology. 20(3). 393–402. 11 indexed citations
6.
Denbeaux, Greg, et al.. (2007). Quantitative measurement of EUV resist outgassing. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6533. 653318–653318. 12 indexed citations
7.
Naulleau, Patrick, Jason P. Cain, Kim Dean, & Kenneth A. Goldberg. (2006). Lithographic characterization of low-order aberrations in a 0.3-NA EUV microfield exposure \ntool. eScholarship (California Digital Library). 5 indexed citations
8.
Dean, Kim, et al.. (2006). Effects of material design on extreme ultraviolet (EUV) resist outgassing. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6153. 61531E–61531E. 19 indexed citations
9.
Dean, Kim, et al.. (2006). Molecular Challenges of Immersion and Extreme Ultraviolet (EUV) Resists. Journal of Photopolymer Science and Technology. 19(4). 487–499. 7 indexed citations
10.
Naulleau, Patrick, Kenneth A. Goldberg, Erik Anderson, et al.. (2005). Characterization of the synchrotron-based 0.3-NA EUV microexposuretool at the ALS. Journal of Vacuum Science and Technology. 23(6). 1 indexed citations
11.
Gonsalves, Kenneth E., et al.. (2005). Design and Performance of EUV Resist Containing Photoacid Generator for Sub-100 nm Lithography. Journal of Nanoscience and Nanotechnology. 5(7). 1181–1183. 5 indexed citations
12.
Gonsalves, Kenneth E., et al.. (2005). Newly developed polymer bound photoacid generator resist for sub-100-nm pattern by EUV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5753. 771–771. 6 indexed citations
13.
Gonsalves, Kenneth E., et al.. (2005). Material design and evaluation of nanocomposite resist for next generation lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5753. 467–467. 5 indexed citations
14.
Tegou, E., Εvangelos Gogolides, Panagiotis Argitis, et al.. (2003). Polyhedral oligomeric silsesquioxane (POSS) based resist materials for 157-nm lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5039. 453–453. 3 indexed citations
15.
Smith, Bruce W., Will Conley, Daniel A. Miller, et al.. (2002). Aberration determination in early 157-nm exposure system. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4691. 1635–1635. 2 indexed citations
16.
McCallum, Martin, Kim Dean, & Jeffrey D. Byers. (1999). Integration considerations for 193nm photoresists. Microelectronic Engineering. 46(1-4). 335–338. 1 indexed citations
17.
Petersen, John S., Theodore H. Fedynyshyn, James W. Thackeray, et al.. (1995). Survey of processing affects on substrate compatibility of chemically amplified resists.. Journal of Photopolymer Science and Technology. 8(4). 571–597. 2 indexed citations
18.
Dean, Kim, et al.. (1995). <title>Investigation of deep-ultraviolet photoresists on TiN substrates</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2438. 514–528. 1 indexed citations
19.
Dean, Kim & S. E. Webber. (1989). Photon harvesting by surface-bound polymers: Poly(2-vinylnaphthalene-alt-methacrylic acid) sensitization of pyrenebutyric acid on zeolite. Journal of Luminescence. 43(3). 147–159. 1 indexed citations
20.
Dean, Kim & James L. McAtee. (1986). Asphaltene adsorption on clay. Applied Clay Science. 1(4). 313–319. 34 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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