Ted Liang

827 total citations
51 papers, 692 citations indexed

About

Ted Liang is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Industrial and Manufacturing Engineering. According to data from OpenAlex, Ted Liang has authored 51 papers receiving a total of 692 indexed citations (citations by other indexed papers that have themselves been cited), including 50 papers in Electrical and Electronic Engineering, 46 papers in Surfaces, Coatings and Films and 4 papers in Industrial and Manufacturing Engineering. Recurrent topics in Ted Liang's work include Advancements in Photolithography Techniques (48 papers), Electron and X-Ray Spectroscopy Techniques (45 papers) and Integrated Circuits and Semiconductor Failure Analysis (31 papers). Ted Liang is often cited by papers focused on Advancements in Photolithography Techniques (48 papers), Electron and X-Ray Spectroscopy Techniques (45 papers) and Integrated Circuits and Semiconductor Failure Analysis (31 papers). Ted Liang collaborates with scholars based in United States, United Kingdom and Japan. Ted Liang's co-authors include Alan R. Stivers, Guojing Zhang, Pei-yang Yan, Richard H. Livengood, Philip D. Rack, Jeong Young Park, Gábor A. Somorjai, Leonid Belau, Edita Tejnil and T. Shimomura and has published in prestigious journals such as Journal of Applied Physics, Journal of The Electrochemical Society and Microelectronic Engineering.

In The Last Decade

Ted Liang

50 papers receiving 632 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Ted Liang United States 15 569 436 136 112 105 51 692
Alan R. Stivers United States 13 409 0.7× 291 0.7× 103 0.8× 69 0.6× 76 0.7× 38 479
Dan Herr United States 10 206 0.4× 76 0.2× 65 0.5× 125 1.1× 37 0.4× 68 389
Yu. A. Novikov Russia 18 487 0.9× 686 1.6× 70 0.5× 75 0.7× 320 3.0× 113 871
Cheryl Hartfield United States 8 130 0.2× 55 0.1× 53 0.4× 136 1.2× 46 0.4× 30 304
K. Ansari Singapore 12 266 0.5× 72 0.2× 107 0.8× 275 2.5× 12 0.1× 23 446
Guoping Fang China 9 158 0.3× 366 0.8× 186 1.4× 131 1.2× 6 0.1× 12 493
N. Hayasaka Japan 13 415 0.7× 55 0.1× 83 0.6× 88 0.8× 14 0.1× 32 494
Manish Chandhok United States 16 597 1.0× 249 0.6× 61 0.4× 182 1.6× 3 0.0× 51 666
L. P. Muray United States 12 316 0.6× 145 0.3× 15 0.1× 175 1.6× 53 0.5× 21 434
R Shuttlesworth United States 6 61 0.1× 91 0.2× 60 0.4× 69 0.6× 140 1.3× 7 387

Countries citing papers authored by Ted Liang

Since Specialization
Citations

This map shows the geographic impact of Ted Liang's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Ted Liang with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Ted Liang more than expected).

Fields of papers citing papers by Ted Liang

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Ted Liang. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Ted Liang. The network helps show where Ted Liang may publish in the future.

Co-authorship network of co-authors of Ted Liang

This figure shows the co-authorship network connecting the top 25 collaborators of Ted Liang. A scholar is included among the top collaborators of Ted Liang based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Ted Liang. Ted Liang is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Sayan, Şafak, K. K. Chakravorty, Takahiro Shirai, et al.. (2021). Laser-assisted discharge produced plasma (LDP) EUV source for actinic patterned mask inspection (APMI). 20–20. 5 indexed citations
2.
Lio, Anna, et al.. (2016). EUV progress toward HVM readiness. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9776. 977602–977602. 58 indexed citations
3.
George, Simi, et al.. (2010). Extreme ultraviolet mask surface cleaning effects on lithography process performance. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 28(6). C6E31–C6E35. 2 indexed citations
4.
Kloster, Grant M., et al.. (2010). Printability of extreme ultraviolet lithography mask pattern defects for 22-40 nm half-pitch features. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7636. 76360M–76360M. 4 indexed citations
5.
Jonckheere, R., et al.. (2010). Techniques for removal of contamination from EUVL mask without surface damage. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7636. 76360Y–76360Y. 12 indexed citations
6.
Neureuther, Andrew R., et al.. (2009). Investigation of buried EUV mask defect printability using actinic inspection and fast simulation. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7488. 74882H–74882H. 5 indexed citations
7.
Ma, Andy, et al.. (2009). Improvement of EUVL mask blank inspection capability at Intel. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7379. 73790I–73790I. 4 indexed citations
8.
Chandhok, Manish, E. Steve Putna, Todd R. Younkin, et al.. (2009). Demonstration of full-field patterning of 32 nm test chips using EUVL. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7271. 727116–727116. 8 indexed citations
9.
Wang, Jing, David Y.H. Pui, Chaolong Qi, et al.. (2008). Controlled deposition of NIST-traceable nanoparticles as additional size standards for photomask applications. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6922. 69220G–69220G. 5 indexed citations
10.
Livengood, Richard H., et al.. (2007). Helium ion microscope invasiveness and imaging study for semiconductor applications. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 25(6). 2547–2552. 27 indexed citations
11.
Roberts, J. M., Robert Bristol, Heidi B. Cao, et al.. (2006). Exposing extreme ultraviolet lithography at Intel. Microelectronic Engineering. 83(4-9). 672–675. 14 indexed citations
12.
Liang, Ted, et al.. (2006). EUV mask pattern defect printability. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6283. 62830K–62830K. 16 indexed citations
13.
Liang, Ted, et al.. (2005). Understanding and reduction of defects on finished EUV masks. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5752. 654–654. 4 indexed citations
14.
Liang, Ted, et al.. (2005). Advanced photolithographic mask repair using electron beams. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 23(6). 3101–3105. 71 indexed citations
15.
Gullikson, Eric M., Edita Tejnil, Ted Liang, & Alan R. Stivers. (2004). EUVL defect printability at the 32-nm node. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5374. 791–791. 17 indexed citations
16.
Hau‐Riege, Stefan P., Anton Barty, Paul B. Mirkarimi, et al.. (2004). Repair of phase defects in extreme-ultraviolet lithography mask blanks. Journal of Applied Physics. 96(11). 6812–6821. 10 indexed citations
17.
Liang, Ted, et al.. (2004). Demonstration of damage-free mask repair using electron beam-induced processes. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5446. 291–291. 17 indexed citations
18.
Liang, Ted, et al.. (2003). EUV substrate and blank inspection with confocal microscopy. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5256. 556–556. 16 indexed citations
19.
Yan, Pei-yang, Guojing Zhang, Andy Ma, & Ted Liang. (2001). <title>TaN EUVL mask fabrication and characterization</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4343. 409–414. 19 indexed citations
20.
Zhang, Guojing, Pei-yang Yan, & Ted Liang. (2001). Cr absorber mask for extreme-ultraviolet lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4186. 774–774. 3 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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