Toshiyuki Yoshimura

581 total citations
29 papers, 497 citations indexed

About

Toshiyuki Yoshimura is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, Toshiyuki Yoshimura has authored 29 papers receiving a total of 497 indexed citations (citations by other indexed papers that have themselves been cited), including 25 papers in Electrical and Electronic Engineering, 14 papers in Biomedical Engineering and 8 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in Toshiyuki Yoshimura's work include Advancements in Photolithography Techniques (17 papers), Integrated Circuits and Semiconductor Failure Analysis (9 papers) and Nanofabrication and Lithography Techniques (8 papers). Toshiyuki Yoshimura is often cited by papers focused on Advancements in Photolithography Techniques (17 papers), Integrated Circuits and Semiconductor Failure Analysis (9 papers) and Nanofabrication and Lithography Techniques (8 papers). Toshiyuki Yoshimura collaborates with scholars based in Japan. Toshiyuki Yoshimura's co-authors include Shinji Okazaki, Hiroshi Shiraishi, Jiro Yamamoto, Yoshinori Nakayama, Hideyuki Matsuoka, Eiji Takeda, C. Haginoya, Yoshiyuki Hirayama, Kazuyuki Koike and Masayoshi Ishibashi and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of The Electrochemical Society.

In The Last Decade

Toshiyuki Yoshimura

29 papers receiving 476 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Toshiyuki Yoshimura Japan 11 386 235 147 90 77 29 497
A. C. F. Hoole United Kingdom 8 248 0.6× 192 0.8× 225 1.5× 49 0.5× 93 1.2× 13 464
I. Babich United States 10 372 1.0× 160 0.7× 89 0.6× 59 0.7× 235 3.1× 18 538
Mark Somervell United States 17 381 1.0× 272 1.2× 57 0.4× 97 1.1× 300 3.9× 42 568
L. M. Shirey United States 9 229 0.6× 252 1.1× 190 1.3× 50 0.6× 109 1.4× 15 450
Rafal Dylewicz United Kingdom 10 229 0.6× 76 0.3× 130 0.9× 43 0.5× 63 0.8× 36 317
Koji Asakawa Japan 12 296 0.8× 238 1.0× 86 0.6× 145 1.6× 224 2.9× 45 515
S. Matthias Germany 9 235 0.6× 203 0.9× 222 1.5× 47 0.5× 277 3.6× 13 479
W.H. Bruenger Germany 9 191 0.5× 101 0.4× 85 0.6× 81 0.9× 110 1.4× 29 321
Vladimir Djara Ireland 17 711 1.8× 178 0.8× 211 1.4× 34 0.4× 210 2.7× 47 780
Christophe Defranoux France 11 511 1.3× 142 0.6× 104 0.7× 34 0.4× 145 1.9× 38 581

Countries citing papers authored by Toshiyuki Yoshimura

Since Specialization
Citations

This map shows the geographic impact of Toshiyuki Yoshimura's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Toshiyuki Yoshimura with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Toshiyuki Yoshimura more than expected).

Fields of papers citing papers by Toshiyuki Yoshimura

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Toshiyuki Yoshimura. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Toshiyuki Yoshimura. The network helps show where Toshiyuki Yoshimura may publish in the future.

Co-authorship network of co-authors of Toshiyuki Yoshimura

This figure shows the co-authorship network connecting the top 25 collaborators of Toshiyuki Yoshimura. A scholar is included among the top collaborators of Toshiyuki Yoshimura based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Toshiyuki Yoshimura. Toshiyuki Yoshimura is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Yoshimura, Toshiyuki, et al.. (1998). Nanometer-level metrology with a low-voltage CD SEM. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3332. 61–61. 3 indexed citations
2.
Yamamoto, Jiro, et al.. (1997). Accurate critical dimension control by using an azide/novolak resist process for electron-beam lithography. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 15(6). 2868–2871. 9 indexed citations
3.
Yoshimura, Toshiyuki, et al.. (1996). Nanofabrication with a Novel EB System with a Large and Stable Beam Current. Japanese Journal of Applied Physics. 35(12S). 6421–6421. 6 indexed citations
4.
Yamamoto, Jiro, et al.. (1996). Nanometer Electron Beam Lithography with Azide-Phenolic Resin Resist Systems. Japanese Journal of Applied Physics. 35(12S). 6511–6511. 9 indexed citations
5.
Yoshimura, Toshiyuki, Hiroshi Shiraishi, Tsuneo Terasawa, & Shinji Okazaki. (1996). Acid-diffusion suppression in chemical amplification resists by controlling acid-diffusion channels in base matrix polymers. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 14(6). 4216–4220. 8 indexed citations
6.
Yoshimura, Toshiyuki, et al.. (1995). Resist-Polymer-Matrix Effects on Nanometer Lithography.. Kobunshi. 44(4). 242–243. 2 indexed citations
7.
Yoshimura, Toshiyuki, Hiroshi Shiraishi, & Shinji Okazaki. (1995). Suppression of Acid Diffusion in Chemical Amplification Resists by Molecular Control of Base Matrix Polymers. Japanese Journal of Applied Physics. 34(Part 1, No. 12B). 6786–6793. 10 indexed citations
8.
Yoshimura, Toshiyuki, Hiroshi Shiraishi, & Shinji Okazaki. (1995). Suppression of Acid Diffusion in Chemical Amplification Resists by Molecular Control of Base Matrix Polymers. Japanese Journal of Applied Physics. 34(12S). 6786–6786. 16 indexed citations
9.
Wada, Yasuo, T. Kure, Toshiyuki Yoshimura, et al.. (1994). Quantum transport in polycrystalline silicon ‘‘slit nano wire’’. Applied Physics Letters. 65(5). 624–626. 4 indexed citations
10.
Matsuoka, Hideyuki, et al.. (1994). Coulomb blockade in the inversion layer of a Si metal-oxide-semiconductor field-effect transistor with a dual-gate structure. Applied Physics Letters. 64(5). 586–588. 28 indexed citations
11.
Wada, Yasuo, T. Kure, Toshiyuki Yoshimura, et al.. (1994). Fabrication of Less Than a 10 nm Wide Polycrystalline Silicon Nano Wire. Japanese Journal of Applied Physics. 33(1S). 905–905. 6 indexed citations
12.
Wada, Yasuo, et al.. (1994). Polycrystalline silicon ‘‘slit nanowire’’ for possible quantum devices. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 12(1). 48–53. 20 indexed citations
13.
Shiraishi, Hiroshi, et al.. (1994). Nanometer-scale imaging characteristics of novolak resin-based chemical amplification negative resist systems and molecular weight distribution effects of the resin matrix. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 12(6). 3895–3899. 34 indexed citations
14.
Matsuoka, Hideyuki, et al.. (1994). Mesoscopic transport in Si metal-oxide-semiconductor field-effect transistors with a dual-gate structure. Journal of Applied Physics. 76(9). 5561–5566. 6 indexed citations
15.
Wada, Yasuo, et al.. (1994). Nucleation and Crystallization Characteristics of Phosphorus‐Doped Amorphous Silicon “Slit Nano Wire”. Journal of The Electrochemical Society. 141(5). 1392–1397. 6 indexed citations
16.
Yoshimura, Toshiyuki, et al.. (1993). Correlation of Nano Edge Roughness in Resist Patterns with Base Polymers. Japanese Journal of Applied Physics. 32(12S). 6065–6065. 80 indexed citations
17.
Yoshimura, Toshiyuki, et al.. (1991). Direct delineation of fine metallic patterns through hydrogen reduction of inorganic resist HPA. Microelectronic Engineering. 13(1-4). 97–100. 1 indexed citations
18.
Yoshimura, Toshiyuki, et al.. (1991). Direct delineation of fine metallic patterns through hydrogen reduction of the inorganic resist HPA. Microelectronic Engineering. 14(3-4). 149–158. 2 indexed citations
19.
Yoshimura, Toshiyuki, et al.. (1988). PRISM: Process for resist profile improvement with surface modification. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 6(6). 2249–2253. 6 indexed citations
20.
Hosokawa, Shinya, Makoto Yao, Toshiyuki Yoshimura, & Hirohisa Endo. (1985). Electronic Properties of Liquid Selenium Containing Alkali and Halogen Impurities. Journal of the Physical Society of Japan. 54(12). 4717–4725. 13 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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