Ramakrishnan Ayothi

752 total citations
26 papers, 633 citations indexed

About

Ramakrishnan Ayothi is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films. According to data from OpenAlex, Ramakrishnan Ayothi has authored 26 papers receiving a total of 633 indexed citations (citations by other indexed papers that have themselves been cited), including 21 papers in Electrical and Electronic Engineering, 14 papers in Biomedical Engineering and 8 papers in Surfaces, Coatings and Films. Recurrent topics in Ramakrishnan Ayothi's work include Advancements in Photolithography Techniques (20 papers), Integrated Circuits and Semiconductor Failure Analysis (11 papers) and Nanofabrication and Lithography Techniques (10 papers). Ramakrishnan Ayothi is often cited by papers focused on Advancements in Photolithography Techniques (20 papers), Integrated Circuits and Semiconductor Failure Analysis (11 papers) and Nanofabrication and Lithography Techniques (10 papers). Ramakrishnan Ayothi collaborates with scholars based in United States, Belgium and Germany. Ramakrishnan Ayothi's co-authors include Christopher K. Ober, Sitaraman Krishnan, Daniel A. Fischer, Karen E. Sohn, Edward J. Krämer, Alexander Hexemer, Maureen E. Callow, James A. Callow, Ruth M. Perry and John A. Finlay and has published in prestigious journals such as Chemistry of Materials, Langmuir and Journal of Materials Chemistry.

In The Last Decade

Ramakrishnan Ayothi

26 papers receiving 606 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Ramakrishnan Ayothi United States 11 306 244 196 184 129 26 633
Carl L. Willis United States 9 194 0.6× 113 0.5× 108 0.6× 194 1.1× 98 0.8× 11 444
Claudia M. Grozea Canada 8 267 0.9× 65 0.3× 100 0.5× 101 0.5× 77 0.6× 9 448
George Yiapanis Australia 12 96 0.3× 74 0.3× 111 0.6× 26 0.1× 102 0.8× 23 443
Prashant Sinha India 9 84 0.3× 64 0.3× 142 0.7× 11 0.1× 63 0.5× 18 471
Yongqiang Tang China 11 186 0.6× 57 0.2× 91 0.5× 16 0.1× 133 1.0× 20 433
David Küttner Germany 6 90 0.3× 82 0.3× 196 1.0× 18 0.1× 32 0.2× 7 490
Zifei Chen China 13 58 0.2× 112 0.5× 80 0.4× 52 0.3× 89 0.7× 37 624
Mieko Tagawa Japan 11 123 0.4× 115 0.5× 135 0.7× 16 0.1× 30 0.2× 53 403

Countries citing papers authored by Ramakrishnan Ayothi

Since Specialization
Citations

This map shows the geographic impact of Ramakrishnan Ayothi's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Ramakrishnan Ayothi with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Ramakrishnan Ayothi more than expected).

Fields of papers citing papers by Ramakrishnan Ayothi

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Ramakrishnan Ayothi. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Ramakrishnan Ayothi. The network helps show where Ramakrishnan Ayothi may publish in the future.

Co-authorship network of co-authors of Ramakrishnan Ayothi

This figure shows the co-authorship network connecting the top 25 collaborators of Ramakrishnan Ayothi. A scholar is included among the top collaborators of Ramakrishnan Ayothi based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Ramakrishnan Ayothi. Ramakrishnan Ayothi is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Guo, Jing, Anuja De Silva, Yann Mignot, et al.. (2018). Polymer brush as adhesion promoter for EUV patterning. 10143. 17–17. 1 indexed citations
2.
Silva, Anuja De, Karen Petrillo, Luciana Meli, et al.. (2017). Single-expose patterning development for EUV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10143. 101431G–101431G. 7 indexed citations
3.
Seshadri, Indira, Anuja De Silva, Luciana Meli, et al.. (2017). Ultrathin EUV patterning stack using polymer brush as an adhesion promotion layer. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10143. 101431D–101431D. 3 indexed citations
4.
Furukawa, Tsuyoshi, et al.. (2017). Novel EUV photoresist for sub-7nm node (Conference Presentation). 29–29. 3 indexed citations
5.
Nakagawa, Hisashi, et al.. (2015). Novel EUV Resist Development for Sub-14nm Half Pitch. Journal of Photopolymer Science and Technology. 28(4). 519–523. 20 indexed citations
6.
Fujisawa, Tomohisa, et al.. (2014). Novel EUV Resists Materials for 16nm HP and beyond. Journal of Photopolymer Science and Technology. 27(5). 639–644. 4 indexed citations
7.
Maruyama, Ken, et al.. (2013). Novel EUV resist materials and process for 20 nm half pitch and beyond. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8682. 86820B–86820B. 11 indexed citations
8.
Ayothi, Ramakrishnan, Jed W. Pitera, Linda K. Sundberg, et al.. (2012). Fundamental study of extreme UV resist line edge roughness: Characterization, experiment, and modeling. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 30(6). 06F506–06F506. 2 indexed citations
9.
Yi, Yi, Ramakrishnan Ayothi, Wang Yueh, et al.. (2009). Sulfonium Salts of Alicyclic Group Functionalized Semifluorinated Alkyl Ether Sulfonates As Photoacid Generators. Chemistry of Materials. 21(17). 4037–4046. 13 indexed citations
10.
Ayothi, Ramakrishnan, et al.. (2008). Non-ionic photo-acid generators for applications in two-photon lithography. Journal of Materials Chemistry. 19(4). 505–513. 35 indexed citations
11.
Bratton, Daniel, Ramakrishnan Ayothi, Hai Deng, Heidi B. Cao, & Christopher K. Ober. (2007). Diazonaphthoquinone Molecular Glass Photoresists:  Patterning without Chemical Amplification. Chemistry of Materials. 19(15). 3780–3786. 34 indexed citations
12.
Ayothi, Ramakrishnan, et al.. (2007). Creating Defined 3‐D Defects Inside an Opaline Ormocer® Matrix with Two‐Photon Lithography. Macromolecular Rapid Communications. 28(8). 922–926. 7 indexed citations
13.
Ayothi, Ramakrishnan, et al.. (2007). Arylonium Photoacid Generators Containing Environmentally Compatible Aryloxyperfluoroalkanesulfonate Groups. Chemistry of Materials. 19(6). 1434–1444. 35 indexed citations
14.
Krishnan, Sitaraman, Ramakrishnan Ayothi, J. A. Finlay, et al.. (2006). Anti-Biofouling Properties of Comb-Like Block Copolymer With Amphiphilic Side-Chains | NIST. Langmuir. 22. 3 indexed citations
15.
Ayothi, Ramakrishnan, et al.. (2006). All-organic non-PFOS nonionic photoacid generating compounds with functionalized fluoroorganic sulfonate motif for chemically amplified resists. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6153. 61530J–61530J. 1 indexed citations
16.
Ayothi, Ramakrishnan, Seung Wook Chang, Nelson Felix, et al.. (2006). New PFOS Free Photoresist Systems for EUV Lithography. Journal of Photopolymer Science and Technology. 19(4). 515–520. 10 indexed citations
17.
Bratton, Daniel, Ramakrishnan Ayothi, Nelson Felix, et al.. (2006). Molecular glass resists for next generation lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6153. 61531D–61531D. 17 indexed citations
18.
Chang, Seung Wook, Ramakrishnan Ayothi, Daniel Bratton, et al.. (2006). Sub-50 nm feature sizes using positive tone molecular glass resists for EUV lithography. Journal of Materials Chemistry. 16(15). 1470–1470. 70 indexed citations
19.
Kim, Kyung Min, Ramakrishnan Ayothi, & Christopher K. Ober. (2005). Synthesis, Characterization and Lithography Performance of Photoacid Generator with Short Perfluoroalkyl Anion. Polymer Bulletin. 55(5). 333–340. 4 indexed citations
20.
Krishnan, Sitaraman, Christopher K. Ober, Ramakrishnan Ayothi, et al.. (2005). Hydrophobic and Hydrophilic Fluoropolymers as Non-Adhesive Interfaces in Marine Biofouling. 46(2). 2 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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