Senajith Rekawa

942 total citations
36 papers, 564 citations indexed

About

Senajith Rekawa is a scholar working on Electrical and Electronic Engineering, Radiation and Surfaces, Coatings and Films. According to data from OpenAlex, Senajith Rekawa has authored 36 papers receiving a total of 564 indexed citations (citations by other indexed papers that have themselves been cited), including 28 papers in Electrical and Electronic Engineering, 21 papers in Radiation and 17 papers in Surfaces, Coatings and Films. Recurrent topics in Senajith Rekawa's work include Advancements in Photolithography Techniques (26 papers), Advanced X-ray Imaging Techniques (20 papers) and Electron and X-Ray Spectroscopy Techniques (16 papers). Senajith Rekawa is often cited by papers focused on Advancements in Photolithography Techniques (26 papers), Advanced X-ray Imaging Techniques (20 papers) and Electron and X-Ray Spectroscopy Techniques (16 papers). Senajith Rekawa collaborates with scholars based in United States, France and South Korea. Senajith Rekawa's co-authors include Erik H. Anderson, Weilun Chao, Peter Fischer, Patrick Naulleau, Kenneth A. Goldberg, Paul Denham, Jeffrey Bokor, Keith Jackson, J. Alexander Liddle and Pascal Mercère and has published in prestigious journals such as Optics Letters, Optics Express and Review of Scientific Instruments.

In The Last Decade

Senajith Rekawa

35 papers receiving 529 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Senajith Rekawa United States 12 339 301 148 121 108 36 564
R. Conley United States 13 522 1.5× 145 0.5× 90 0.6× 56 0.5× 269 2.5× 39 672
Hikaru Yokoyama Japan 6 532 1.6× 172 0.6× 39 0.3× 111 0.9× 250 2.3× 10 677
Iacopo Mochi Switzerland 15 352 1.0× 699 2.3× 411 2.8× 114 0.9× 57 0.5× 120 934
Soichiro Handa Japan 10 633 1.9× 166 0.6× 47 0.3× 117 1.0× 257 2.4× 25 763
Matias Kagias Switzerland 15 402 1.2× 163 0.5× 42 0.3× 123 1.0× 41 0.4× 31 652
М. Н. Торопов Russia 15 170 0.5× 177 0.6× 85 0.6× 133 1.1× 36 0.3× 61 562
Lorenzo Raimondi Italy 13 296 0.9× 201 0.7× 20 0.1× 143 1.2× 90 0.8× 50 432
V. Yunkin Russia 17 599 1.8× 174 0.6× 60 0.4× 63 0.5× 226 2.1× 63 759
D. Maneuski United Kingdom 12 183 0.5× 206 0.7× 168 1.1× 89 0.7× 162 1.5× 49 512
L. Grella United States 14 145 0.4× 339 1.1× 178 1.2× 79 0.7× 55 0.5× 57 522

Countries citing papers authored by Senajith Rekawa

Since Specialization
Citations

This map shows the geographic impact of Senajith Rekawa's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Senajith Rekawa with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Senajith Rekawa more than expected).

Fields of papers citing papers by Senajith Rekawa

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Senajith Rekawa. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Senajith Rekawa. The network helps show where Senajith Rekawa may publish in the future.

Co-authorship network of co-authors of Senajith Rekawa

This figure shows the co-authorship network connecting the top 25 collaborators of Senajith Rekawa. A scholar is included among the top collaborators of Senajith Rekawa based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Senajith Rekawa. Senajith Rekawa is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Anderson, Christopher N., Weilun Chao, C. Cork, et al.. (2019). Overview and status of the 0.5NA EUV microfield exposure tool at Berkeley Lab. eScholarship (California Digital Library). 4–4. 3 indexed citations
2.
Goldberg, Kenneth A., Markus P. Benk, Antoine Wojdyla, et al.. (2014). Actinic mask imaging: recent results and future directions from the SHARP EUV microscope. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9048. 90480Y–90480Y. 21 indexed citations
3.
Yashchuk, Valeriy V., Kenneth A. Goldberg, Martin Kunz, et al.. (2013). Methodology for optimalin situalignment and setting of bendable optics for nearly diffraction-limited focusing of soft x-rays. Optical Engineering. 52(3). 33603–33603. 17 indexed citations
4.
Goldberg, Kenneth A., Iacopo Mochi, Markus P. Benk, et al.. (2012). Creating an EUV mask microscope for lithography generations reaching 8 NM. eScholarship (California Digital Library). 1 indexed citations
5.
Goldberg, Kenneth A., Valeriy V. Yashchuk, Wayne R. McKinney, et al.. (2012). In situ fine tuning of bendable soft x-ray mirrors using a lateral shearing interferometer. Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment. 710. 82–86. 10 indexed citations
6.
Goldberg, Kenneth A., et al.. (2011). An EUV Fresnel zoneplate mask-imaging microscope for lithography generations reaching 8 nm. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7969. 796910–796910. 12 indexed citations
7.
George, Simi, et al.. (2010). Assessing out-of-band flare effects at the wafer level for EUV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7636. 763626–763626. 11 indexed citations
8.
Chao, Weilun, et al.. (2009). Hydrogen silsesquioxane double patterning process for 12nm resolution x-ray zone plates. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 27(6). 2606–2611. 13 indexed citations
9.
Barty, Anton, Kenneth A. Goldberg, Patrick A. Kearney, et al.. (2006). Multilayer defects nucleated by substrate pits: a comparison of actinic inspection and non-actinic inspection techniques. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6349. 63492M–63492M. 4 indexed citations
10.
Mercère, Pascal, Samuel Bucourt, D. Douillet, et al.. (2005). X-ray beam metrology and x-ray optic alignment by Hartmann wavefront sensing. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5921. 592109–592109. 12 indexed citations
11.
Goldberg, Kenneth A., Patrick Naulleau, Senajith Rekawa, et al.. (2005). Ultra-high accuracy optical testing: creating diffraction-limited short-wavelength optical systems. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5900. 59000G–59000G. 6 indexed citations
12.
Goldberg, Kenneth A., Patrick Naulleau, Paul Denham, et al.. (2004). EUV interferometric testing and alignment of the 0.3-NA MET optic. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5374. 64–64. 16 indexed citations
13.
Goldberg, Kenneth A., Patrick Naulleau, Paul Denham, et al.. (2004). At-wavelength alignment and testing of the 0.3 NA MET optic. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 22(6). 2956–2961. 26 indexed citations
14.
Goldberg, Kenneth A., Patrick Naulleau, Senajith Rekawa, et al.. (2003). At-wavelength interferometry of high-NA diffraction-limited EUV optics. University of North Texas Digital Library (University of North Texas). 1 indexed citations
15.
Mercère, Pascal, Philippe Zeitoun, S. Le Pape, et al.. (2003). Hartmann wave-front measurement at 134 nm with λ_EUV/120 accuracy. Optics Letters. 28(17). 1534–1534. 65 indexed citations
16.
Naulleau, Patrick, et al.. (2003). Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography. Applied Optics. 42(5). 820–820. 35 indexed citations
17.
Goldberg, Kenneth A., Patrick Naulleau, Paul Denham, et al.. (2003). EUV interferometry of the 0.3-NA MET optic. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5037. 69–69. 7 indexed citations
18.
Naulleau, Patrick, Kenneth A. Goldberg, Erik H. Anderson, et al.. (2001). <title>Adding static printing capabilities to the EUV phase-shifting point diffraction interferometer</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4343. 639–645. 7 indexed citations
19.
Jeong, Seongtae, Chih‐Wei Lai, Senajith Rekawa, C. Walton, & Jeffrey Bokor. (2000). <title>Actinic defect counting statistics over 1-cm2 area of EUVL mask blank</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3997. 431–440. 4 indexed citations
20.
Jeong, Seongtae, Lewis Johnson, Senajith Rekawa, et al.. (1999). Actinic EUVL mask blank defect inspection system. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3676. 298–298. 4 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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