Alan R. Stivers

583 total citations
38 papers, 479 citations indexed

About

Alan R. Stivers is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Industrial and Manufacturing Engineering. According to data from OpenAlex, Alan R. Stivers has authored 38 papers receiving a total of 479 indexed citations (citations by other indexed papers that have themselves been cited), including 36 papers in Electrical and Electronic Engineering, 23 papers in Surfaces, Coatings and Films and 8 papers in Industrial and Manufacturing Engineering. Recurrent topics in Alan R. Stivers's work include Advancements in Photolithography Techniques (30 papers), Electron and X-Ray Spectroscopy Techniques (22 papers) and Integrated Circuits and Semiconductor Failure Analysis (18 papers). Alan R. Stivers is often cited by papers focused on Advancements in Photolithography Techniques (30 papers), Electron and X-Ray Spectroscopy Techniques (22 papers) and Integrated Circuits and Semiconductor Failure Analysis (18 papers). Alan R. Stivers collaborates with scholars based in United States, United Kingdom and Belgium. Alan R. Stivers's co-authors include Ted Liang, C. T. Sah, Edita Tejnil, Guojing Zhang, Pei-yang Yan, Eric M. Gullikson, Richard H. Livengood, M. J. Penn, Alan Myers and Gregory F. Cardinale and has published in prestigious journals such as Journal of Applied Physics, Applied Surface Science and Microelectronic Engineering.

In The Last Decade

Alan R. Stivers

37 papers receiving 446 citations

Peers

Alan R. Stivers

EEE

SCF

Ted Liang United States

M. G. R. Thomson United States

Cornel Bozdog United States

D. P. Adams United States

R. J. Joyce United States

Tsutomu Shoki Japan

H. Löschner Austria

T. R. Groves United States

K. Haberger Germany

Anthony R. Forte United States

Ted Liang United States

Alan R. Stivers

569 ×1.4

EEE

436 ×1.5

SCF

136 ×1.3

105 ×1.4

112 ×1.6

Citations per year, relative to Alan R. Stivers Alan R. Stivers (= 1×) peers Ted Liang

Countries citing papers authored by Alan R. Stivers

Since Specialization

Citations

This map shows the geographic impact of Alan R. Stivers's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Alan R. Stivers with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Alan R. Stivers more than expected).

Fields of papers citing papers by Alan R. Stivers

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Alan R. Stivers. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Alan R. Stivers. The network helps show where Alan R. Stivers may publish in the future.

Co-authorship network of co-authors of Alan R. Stivers

This figure shows the co-authorship network connecting the top 25 collaborators of Alan R. Stivers. A scholar is included among the top collaborators of Alan R. Stivers based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Alan R. Stivers. Alan R. Stivers is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Chandhok, Manish, et al.. (2008). Pattern placement correction due to bending in EUVL masks. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7122. 71222C–71222C. 2 indexed citations

Liang, Ted, et al.. (2006). EUV mask pattern defect printability. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6283. 62830K–62830K. 16 indexed citations

Liang, Ted, et al.. (2005). Understanding and reduction of defects on finished EUV masks. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5752. 654–654. 4 indexed citations

Mirkarimi, Paul B., Eberhard Spiller, Sherry L. Baker, et al.. (2005). Advancing the ion beam thin film planarization process for the smoothing of substrate particles. Microelectronic Engineering. 77(3-4). 369–381. 10 indexed citations

Sun, Yong, et al.. (2005). Electron-beam-assisted etching of CrOx films by Cl2. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 23(1). 206–209. 7 indexed citations

Liang, Ted, et al.. (2005). Advanced photolithographic mask repair using electron beams. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 23(6). 3101–3105. 71 indexed citations

Lee, Kyung Min, et al.. (2005). Magnetron reactive sputtering of TaN and TaON films for EUV mask applications. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5992. 59922B–59922B. 2 indexed citations

Gullikson, Eric M., et al.. (2005). Modeling the defect inspection sensitivity of a confocal microscope. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5751. 1223–1223. 9 indexed citations

Gullikson, Eric M., Edita Tejnil, Ted Liang, & Alan R. Stivers. (2004). EUVL defect printability at the 32-nm node. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5374. 791–791. 17 indexed citations

10.

Hau‐Riege, Stefan P., Anton Barty, Paul B. Mirkarimi, et al.. (2004). Repair of phase defects in extreme-ultraviolet lithography mask blanks. Journal of Applied Physics. 96(11). 6812–6821. 10 indexed citations

11.

Liang, Ted, et al.. (2004). Demonstration of damage-free mask repair using electron beam-induced processes. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5446. 291–291. 17 indexed citations

12.

Tejnil, Edita, Eric M. Gullikson, & Alan R. Stivers. (2004). Characterization of defect detection sensitivity in inspection of mask substrates and blanks for extreme-ultraviolet lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5567. 943–943. 14 indexed citations

13.

Liang, Ted, et al.. (2003). EUV substrate and blank inspection with confocal microscopy. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5256. 556–556. 16 indexed citations

14.

Liang, Ted, Alan R. Stivers, Pei-yang Yan, Edita Tejnil, & Guojing Zhang. (2002). Enhanced optical inspectability of patterned EUVL mask. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4562. 288–288. 9 indexed citations

15.

Stivers, Alan R. & Edita Tejnil. (2002). Dependence of mask-defect printability and printability criteria on lithography process resolution. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4562. 122–122. 1 indexed citations

16.

Schenker, Richard E., et al.. (2000). Alt-PSM for 0.10-μm and 0.13-μm polypatterning. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4000. 112–112. 1 indexed citations

17.

Liang, Ted, et al.. (2000). Progress in extreme ultraviolet mask repair using a focused ion beam. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 18(6). 3216–3220. 46 indexed citations

18.

Tejnil, Edita & Alan R. Stivers. (1999). Options for at-wavelength inspection of patterned extreme ultraviolet lithography masks. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3873. 792–792. 4 indexed citations

19.

Stivers, Alan R., et al.. (1986). Fault Contrast: A New Voltage Contrast VLSI Diagnosis Technique. Reliability physics. 109–114. 4 indexed citations

20.

Stivers, Alan R. & C. T. Sah. (1980). A study of oxide traps and interface states of the silicon-silicon dioxide interface. Journal of Applied Physics. 51(12). 6292–6304. 51 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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