Richard E. Schenker

584 total citations
25 papers, 343 citations indexed

About

Richard E. Schenker is a scholar working on Electrical and Electronic Engineering, Ceramics and Composites and Computational Mechanics. According to data from OpenAlex, Richard E. Schenker has authored 25 papers receiving a total of 343 indexed citations (citations by other indexed papers that have themselves been cited), including 18 papers in Electrical and Electronic Engineering, 6 papers in Ceramics and Composites and 4 papers in Computational Mechanics. Recurrent topics in Richard E. Schenker's work include Advancements in Photolithography Techniques (14 papers), Integrated Circuits and Semiconductor Failure Analysis (6 papers) and Glass properties and applications (6 papers). Richard E. Schenker is often cited by papers focused on Advancements in Photolithography Techniques (14 papers), Integrated Circuits and Semiconductor Failure Analysis (6 papers) and Glass properties and applications (6 papers). Richard E. Schenker collaborates with scholars based in United States. Richard E. Schenker's co-authors include W.G. Oldham, Wenhao Cheng, G. Dewey, R. Chau, Reza Arghavani, Barry M. Doyle, A. Murthy, J. Kavalieros, B. Roberds and Douglas W. Barlage and has published in prestigious journals such as Journal of Applied Physics, Applied Optics and Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena.

In The Last Decade

Richard E. Schenker

25 papers receiving 322 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Richard E. Schenker United States 10 223 77 76 73 51 25 343
Mark Feldman United States 11 192 0.9× 53 0.7× 57 0.8× 22 0.3× 133 2.6× 26 320
K. Asama Japan 11 334 1.5× 59 0.8× 24 0.3× 14 0.2× 118 2.3× 42 390
A. Cacciato Belgium 14 581 2.6× 70 0.9× 136 1.8× 27 0.4× 127 2.5× 64 672
Wei Jia China 11 275 1.2× 33 0.4× 15 0.2× 35 0.5× 123 2.4× 45 367
Kazuo Moriya Japan 9 211 0.9× 123 1.6× 78 1.0× 8 0.1× 81 1.6× 17 379
John J. Villa United States 5 209 0.9× 84 1.1× 40 0.5× 21 0.3× 149 2.9× 7 336
Jesús del Hoyo Spain 12 102 0.5× 134 1.7× 186 2.4× 73 1.0× 127 2.5× 36 323
T.C. May-Smith United Kingdom 15 476 2.1× 26 0.3× 49 0.6× 38 0.5× 232 4.5× 39 542
R. Hawley United States 5 77 0.3× 129 1.7× 187 2.5× 20 0.3× 37 0.7× 5 293
T. Parham United States 6 90 0.4× 96 1.2× 126 1.7× 7 0.1× 43 0.8× 10 225

Countries citing papers authored by Richard E. Schenker

Since Specialization
Citations

This map shows the geographic impact of Richard E. Schenker's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Richard E. Schenker with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Richard E. Schenker more than expected).

Fields of papers citing papers by Richard E. Schenker

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Richard E. Schenker. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Richard E. Schenker. The network helps show where Richard E. Schenker may publish in the future.

Co-authorship network of co-authors of Richard E. Schenker

This figure shows the co-authorship network connecting the top 25 collaborators of Richard E. Schenker. A scholar is included among the top collaborators of Richard E. Schenker based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Richard E. Schenker. Richard E. Schenker is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Singh, Gurpreet, Nityan Nair, Florian Gstrein, & Richard E. Schenker. (2024). Directed self-assembly enhanced EUV multi-patterning for low variability metal pitch scaling. 16–16. 3 indexed citations
2.
Chawla, J. S., Kanwal Jit Singh, Alan Myers, et al.. (2014). Patterning challenges in the fabrication of 12 nm half-pitch dual damascene copper ultra low-k interconnects. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9054. 905404–905404. 14 indexed citations
3.
Schenker, Richard E. & Vinita Singh. (2013). Foundations for scaling beyond 14nm. 1–4. 2 indexed citations
4.
Chawla, J. S., Ramanan Chebiam, Rohan Akolkar, et al.. (2013). Demonstration of a 12 nm-half-pitch copper ultralow-k interconnect process. 1–3. 12 indexed citations
5.
Allen, Gary, Tejaswi Indukuri, Christopher Jezewski, et al.. (2012). Demonstration of an electrically functional 34 nm metal pitch interconnect in ultralow-k ILD using spacer-based pitch quartering. 1–3. 14 indexed citations
6.
Schenker, Richard E., et al.. (2010). The role of strong phase shift masks in Intel's DFM infrastructure development. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7641. 76410S–76410S. 5 indexed citations
7.
Cheng, Wenhao, et al.. (2008). Fabrication of defect-free full-field pixelated phase mask. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6924. 69241G–69241G. 5 indexed citations
8.
Schenker, Richard E., et al.. (2008). Integration of pixelated phase masks for full-chip random logic layers. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6924. 69240I–69240I. 8 indexed citations
9.
Cheng, Wenhao, et al.. (2008). Pixelated phase mask as novel lithography RET. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6924. 69240E–69240E. 21 indexed citations
10.
Schenker, Richard E., et al.. (2003). Alternating phase-shift masks for contact patterning. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5040. 294–294. 3 indexed citations
11.
Schenker, Richard E., Gary Allen, Edita Tejnil, et al.. (2002). Lithography strategy for 65-nm node. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4754. 1–1. 7 indexed citations
12.
Chau, R., J. Kavalieros, B. Roberds, et al.. (2002). 30 nm physical gate length CMOS transistors with 1.0 ps n-MOS and 1.7 ps p-MOS gate delays. 45–48. 81 indexed citations
13.
Schenker, Richard E., et al.. (2000). Alt-PSM for 0.10-μm and 0.13-μm polypatterning. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4000. 112–112. 1 indexed citations
14.
Tejnil, Edita, et al.. (2000). Evaluation of printability and inspection of phase defects on hidden-shifter alternating phase-shift masks. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4066. 376–376. 2 indexed citations
15.
Schenker, Richard E.. (1999). Effects of phase-shift masks on across-field linewidth control. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3679. 18–18. 4 indexed citations
16.
Schenker, Richard E. & W.G. Oldham. (1998). Damage-limited lifetime of 193-nm lithography tools as a function of system variables. Applied Optics. 37(4). 733–733. 1 indexed citations
17.
Schenker, Richard E. & W.G. Oldham. (1997). Ultraviolet-induced densification in fused silica. Journal of Applied Physics. 82(3). 1065–1071. 75 indexed citations
18.
Schenker, Richard E., et al.. (1997). Temperature dependence of UV-induced compaction in fused silica. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3051. 907–907. 2 indexed citations
19.
Schenker, Richard E., et al.. (1997). Durability of experimental fused silicas to 193-nm induced compaction. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3051. 44–44. 4 indexed citations
20.
Schenker, Richard E., Paul Schermerhorn, & W.G. Oldham. (1994). Deep-ultraviolet damage to fused silica. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 12(6). 3275–3279. 21 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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