Richard E. Schenker

584 citations

25 papers · 343 indexed · h-index 10

Co-authors: W.G. Oldham Wenhao Cheng G. Dewey R. Chau Reza Arghavani Barry M. Doyle A. Murthy J. Kavalieros
Topics: Advancements in Photolithography Techniques (14 papers)Integrated Circuits and Semiconductor Failure Analysis (6 papers)Glass properties and applications (6 papers)
Cited by: Ceramics and Composites Surfaces, Coatings and Films Electrical and Electronic Engineering
Journals: Journal of Applied PhysicsApplied OpticsJournal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena
Partner nations: United States

In The Last Decade

Richard E. Schenker

25 papers receiving 322 citations

Peers

Countries citing papers authored by Richard E. Schenker

Since Specialization

Citations

This map shows the geographic impact of Richard E. Schenker's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Richard E. Schenker with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Richard E. Schenker more than expected).

Fields of papers citing papers by Richard E. Schenker

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Richard E. Schenker. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Richard E. Schenker. The network helps show where Richard E. Schenker may publish in the future.

Co-authorship network of co-authors of Richard E. Schenker

This figure shows the co-authorship network connecting the top 25 collaborators of Richard E. Schenker. A scholar is included among the top collaborators of Richard E. Schenker based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Richard E. Schenker. Richard E. Schenker is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Directed self-assembly enhanced EUV multi-patterning for low variability metal pitch scaling 2024 ·Gurpreet Singh,Nityan Nair,Florian Gstrein,Richard E. Schenker	3
2	Patterning challenges in the fabrication of 12 nm half-pitch dual damascene copper ultra low-k interconnects 2014 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·J. S. Chawla,Kanwal Jit Singh,Alan Myers,David J. Michalak,Richard E. Schenker,Christopher Jezewski,B. Krist,Florian Gstrein,Tejaswi Indukuri,Hui Jae Yoo	14
3	Foundations for scaling beyond 14nm 2013 ·Richard E. Schenker,Vinita Singh	2
4	Demonstration of a 12 nm-half-pitch copper ultralow-k interconnect process 2013 ·J. S. Chawla,Ramanan Chebiam,Rohan Akolkar,Gary Allen,C.T. Carver,(unknown),Florian Gstrein,(unknown),Tejaswi Indukuri,Christopher Jezewski,B. Krist,(unknown),Alan Myers,Richard E. Schenker,Kanwal Jit Singh,R. Turkot,Hui Jae Yoo	12
5	Demonstration of an electrically functional 34 nm metal pitch interconnect in ultralow-k ILD using spacer-based pitch quartering 2012 ·(unknown),Gary Allen,(unknown),Tejaswi Indukuri,Christopher Jezewski,B. Krist,(unknown),Alan Myers,Richard E. Schenker,Kanwal Jit Singh,R. Turkot,Hui Jae Yoo	14
6	The role of strong phase shift masks in Intel's DFM infrastructure development 2010 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Richard E. Schenker,Vivek K. Singh,(unknown)	5
7	Fabrication of defect-free full-field pixelated phase mask 2008 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Wenhao Cheng,(unknown),(unknown),(unknown),(unknown),(unknown),(unknown),Yiping Liu,Jun Kim,(unknown),(unknown),Richard E. Schenker,(unknown)	5
8	Integration of pixelated phase masks for full-chip random logic layers 2008 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Richard E. Schenker,(unknown),Bin Hu,(unknown),Vinita Singh,(unknown),Wenhao Cheng,(unknown)	8
9	Pixelated phase mask as novel lithography RET 2008 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown),Wenhao Cheng,Richard E. Schenker,Vivek K. Singh	21
10	Alternating phase-shift masks for contact patterning 2003 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Richard E. Schenker,Gary Allen,Edita Tejnil,(unknown)	3
11	Lithography strategy for 65-nm node 2002 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown),Richard E. Schenker,Gary Allen,Edita Tejnil,(unknown),(unknown),Vinita Singh,Robert E. Gleason,Joseph Brandenburg,R. Bigwood	7
12	30 nm physical gate length CMOS transistors with 1.0 ps n-MOS and 1.7 ps p-MOS gate delays 2002 ·R. Chau,J. Kavalieros,B. Roberds,Richard E. Schenker,(unknown),Douglas W. Barlage,Barry M. Doyle,Reza Arghavani,A. Murthy,G. Dewey	81
13	Alt-PSM for 0.10-μm and 0.13-μm polypatterning 2000 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Richard E. Schenker,(unknown),Alan R. Stivers,Edita Tejnil	1
14	Evaluation of printability and inspection of phase defects on hidden-shifter alternating phase-shift masks 2000 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Edita Tejnil,Alan R. Stivers,Richard E. Schenker,(unknown)	2
15	Effects of phase-shift masks on across-field linewidth control 1999 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Richard E. Schenker	4
16	Damage-limited lifetime of 193-nm lithography tools as a function of system variables 1998 ·Applied Optics ·Richard E. Schenker,W.G. Oldham	1
17	Ultraviolet-induced densification in fused silica 1997 ·Journal of Applied Physics ·Richard E. Schenker,W.G. Oldham	75
18	Temperature dependence of UV-induced compaction in fused silica 1997 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown),Richard E. Schenker,W.G. Oldham	2
19	Durability of experimental fused silicas to 193-nm induced compaction 1997 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Richard E. Schenker,(unknown),W.G. Oldham	4
20	Deep-ultraviolet damage to fused silica 1994 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Richard E. Schenker,Paul Schermerhorn,W.G. Oldham	21

About Richard E. Schenker

Richard E. Schenker is a scholar working on Ceramics and Composites, Surfaces, Coatings and Films and Radiation, having authored 25 papers that have together received 343 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (14 papers), Integrated Circuits and Semiconductor Failure Analysis (6 papers) and Glass properties and applications (6 papers). The work is most often cited by research in Ceramics and Composites (73 citations), Surfaces, Coatings and Films (31 citations) and Electrical and Electronic Engineering (223 citations). Richard E. Schenker has collaborated with scholars based in United States. Frequent co-authors include W.G. Oldham, Wenhao Cheng, G. Dewey, R. Chau, Reza Arghavani, Barry M. Doyle, A. Murthy, J. Kavalieros, B. Roberds and Douglas W. Barlage. Their work appears in journals such as Journal of Applied Physics, Applied Optics and Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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