Patrick A. Kearney

965 total citations
78 papers, 815 citations indexed

About

Patrick A. Kearney is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Mechanics of Materials. According to data from OpenAlex, Patrick A. Kearney has authored 78 papers receiving a total of 815 indexed citations (citations by other indexed papers that have themselves been cited), including 63 papers in Electrical and Electronic Engineering, 54 papers in Surfaces, Coatings and Films and 12 papers in Mechanics of Materials. Recurrent topics in Patrick A. Kearney's work include Advancements in Photolithography Techniques (53 papers), Electron and X-Ray Spectroscopy Techniques (48 papers) and Integrated Circuits and Semiconductor Failure Analysis (22 papers). Patrick A. Kearney is often cited by papers focused on Advancements in Photolithography Techniques (53 papers), Electron and X-Ray Spectroscopy Techniques (48 papers) and Integrated Circuits and Semiconductor Failure Analysis (22 papers). Patrick A. Kearney collaborates with scholars based in United States, Canada and Belgium. Patrick A. Kearney's co-authors include D. G. Stearns, S. Bajt, J. M. Slaughter, Charles M. Falco, Claude Montcalm, Brian Sullivan, Mohamed Chaker, H. Pépin, Frank Goodwin and Obert R. Wood and has published in prestigious journals such as Physical review. B, Condensed matter, Journal of Applied Physics and Acta Materialia.

In The Last Decade

Patrick A. Kearney

76 papers receiving 753 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Patrick A. Kearney United States 14 541 361 189 174 138 78 815
Eric Louis Netherlands 15 275 0.5× 155 0.4× 154 0.8× 165 0.9× 119 0.9× 45 601
S. A. Yulin Germany 16 273 0.5× 116 0.3× 200 1.1× 224 1.3× 111 0.8× 45 612
Christian Laubis Germany 16 420 0.8× 306 0.8× 223 1.2× 59 0.3× 98 0.7× 65 676
A. Desalvo Italy 17 510 0.9× 126 0.3× 100 0.5× 141 0.8× 146 1.1× 72 796
H. Meiling Netherlands 21 1.0k 1.9× 223 0.6× 82 0.4× 119 0.7× 83 0.6× 64 1.1k
J. E. Yater United States 16 537 1.0× 203 0.6× 52 0.3× 172 1.0× 101 0.7× 48 851
R. Thomas United Kingdom 7 234 0.4× 415 1.1× 277 1.5× 131 0.8× 69 0.5× 10 589
T. Ishitani Japan 17 447 0.8× 212 0.6× 61 0.3× 69 0.4× 452 3.3× 47 762
Roxann L. Engelstad United States 10 554 1.0× 173 0.5× 34 0.2× 162 0.9× 73 0.5× 181 842
James A. Folta United States 12 273 0.5× 130 0.4× 89 0.5× 100 0.6× 160 1.2× 39 481

Countries citing papers authored by Patrick A. Kearney

Since Specialization
Citations

This map shows the geographic impact of Patrick A. Kearney's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Patrick A. Kearney with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Patrick A. Kearney more than expected).

Fields of papers citing papers by Patrick A. Kearney

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Patrick A. Kearney. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Patrick A. Kearney. The network helps show where Patrick A. Kearney may publish in the future.

Co-authorship network of co-authors of Patrick A. Kearney

This figure shows the co-authorship network connecting the top 25 collaborators of Patrick A. Kearney. A scholar is included among the top collaborators of Patrick A. Kearney based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Patrick A. Kearney. Patrick A. Kearney is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
House, Matthew, et al.. (2014). Study of alternative capping and absorber layers for extreme ultraviolet (EUV) masks for sub-16nm half-pitch nodes. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9048. 90480L–90480L. 15 indexed citations
2.
Jindal, V. K., et al.. (2013). Inspection and compositional analysis of sub-20 nm EUV mask blank defects by thin film decoration technique. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8679. 86791O–86791O. 9 indexed citations
3.
Kearney, Patrick A., et al.. (2012). Smoothing of substrate pits using ion beam deposition for EUV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8322. 83221S–83221S. 7 indexed citations
4.
Kearney, Patrick A., et al.. (2009). Mask defect verification using actinic inspection and defect mitigation technology. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7271. 72713J–72713J. 10 indexed citations
5.
Kearney, Patrick A., et al.. (2008). Ion beam deposition for defect-free EUVL mask blanks. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6921. 69211X–69211X. 4 indexed citations
6.
Goldberg, Kenneth A., Anton Barty, Yanwei Liu, et al.. (2006). Actinic Inspection of EUV Programmed Multilayer Defects and Cross-Comparison Measurements. University of North Texas Digital Library (University of North Texas). 3 indexed citations
7.
Barty, Anton, Kenneth A. Goldberg, Patrick A. Kearney, et al.. (2006). Multilayer defects nucleated by substrate pits: a comparison of actinic inspection and non-actinic inspection techniques. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6349. 63492M–63492M. 4 indexed citations
8.
Ma, Andy, et al.. (2005). Recent progress in the fabrication of low defect density mask blanks. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5853. 318–318. 2 indexed citations
9.
Walton, C., Patrick A. Kearney, James A. Folta, Donald W. Sweeney, & Paul B. Mirkarimi. (2003). Understanding particle defect transport in an ultra clean sputter coating process. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5037. 470–470. 4 indexed citations
10.
Folta, James A., Jordan Davidson, Cindy Larson, C. Walton, & Patrick A. Kearney. (2002). Advances in low-defect multilayers for EUVL mask blanks. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4688. 173–173. 9 indexed citations
11.
Tong, William M., John S. Taylor, Scott D. Hector, et al.. (2000). <title>EUVL printing results of a low-thermal expansion material (LTEM) mask</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3997. 855–860.
12.
Mangat, Pawitter J. S., Scott D. Hector, Michael A. Thompson, et al.. (1999). Extreme ultraviolet lithography mask patterning and printability studies with a Ta-based absorber. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 17(6). 3029–3033. 19 indexed citations
13.
Vernon, S. P., Patrick A. Kearney, William M. Tong, et al.. (1998). Masks for extreme ultraviolet lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3546. 184–184. 9 indexed citations
14.
15.
Montcalm, Claude, Patrick A. Kearney, J. M. Slaughter, et al.. (1996). Survey of Ti-, B-, and Y-based soft x-ray–extreme ultraviolet multilayer mirrors for the 2- to 12-nm wavelength region. Applied Optics. 35(25). 5134–5134. 70 indexed citations
16.
Montcalm, Claude, et al.. (1994). 8~12nm波長領域用のMo/Y多層膜鏡. Optics Letters. 19(15). 1173–1175. 10 indexed citations
17.
Kearney, Patrick A.. (1994). New Materials for Multilayer Soft X-Ray Optics for Wavelengths Below 124 Angstrom by Sputtering and Molecular Beam Epitaxy.. UA Campus Repository (The University of Arizona). 1 indexed citations
18.
Montcalm, Claude, Brian Sullivan, J. M. Slaughter, et al.. (1994). Mo/Y multilayer mirrors for the 8–12-nm wavelength region. Optics Letters. 19(15). 1173–1173. 13 indexed citations
19.
Slaughter, J. M., Patrick A. Kearney, & Charles M. Falco. (1992). <title>Characterization of Pd-B, Ag-B, and Si-B interfaces</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1547. 71–79. 5 indexed citations
20.
Slaughter, J. M., Patrick A. Kearney, A. Lampis, et al.. (1989). Multilaver Mirrors For 182Å. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1160. 235–235. 4 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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