Allen G. Timko

1.1k total citations
47 papers, 824 citations indexed

About

Allen G. Timko is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films. According to data from OpenAlex, Allen G. Timko has authored 47 papers receiving a total of 824 indexed citations (citations by other indexed papers that have themselves been cited), including 45 papers in Electrical and Electronic Engineering, 23 papers in Biomedical Engineering and 8 papers in Surfaces, Coatings and Films. Recurrent topics in Allen G. Timko's work include Advancements in Photolithography Techniques (37 papers), Nanofabrication and Lithography Techniques (18 papers) and Semiconductor materials and devices (12 papers). Allen G. Timko is often cited by papers focused on Advancements in Photolithography Techniques (37 papers), Nanofabrication and Lithography Techniques (18 papers) and Semiconductor materials and devices (12 papers). Allen G. Timko collaborates with scholars based in United States, Germany and Japan. Allen G. Timko's co-authors include O. Nalamasu, Ananth Dodabalapur, R. E. Slusher, Attila Mekis, M. Meier, John D. Joannopoulos, Magnus Berggren, Omkaram Nalamasu, Elsa Reichmanis and Richard S. Hutton and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of The Electrochemical Society.

In The Last Decade

Allen G. Timko

44 papers receiving 747 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
Allen G. Timko United States	12	703	425	239	129	126	47	824
O. Nalamasu United States	12	702 1.0×	440 1.0×	315 1.3×	148 1.1×	103 0.8×	26	902
R. Vijaya India	13	531 0.8×	616 1.4×	276 1.2×	115 0.9×	95 0.8×	92	823
Ivan Divliansky United States	14	671 1.0×	606 1.4×	246 1.0×	136 1.1×	140 1.1×	71	954
Bei Yan China	21	740 1.1×	675 1.6×	277 1.2×	58 0.4×	179 1.4×	53	1.2k
Hugo J. Cornelissen Netherlands	15	348 0.5×	303 0.7×	155 0.6×	151 1.2×	125 1.0×	42	567
J. A. E. Wasey United Kingdom	13	828 1.2×	324 0.8×	387 1.6×	76 0.6×	296 2.3×	17	1.1k
Rebecca H. Jordan United States	10	878 1.2×	397 0.9×	177 0.7×	53 0.4×	218 1.7×	13	1.1k
Iam-Choon Khoo United States	13	232 0.3×	400 0.9×	355 1.5×	77 0.6×	84 0.7×	17	844
T. V. Murzina Russia	16	297 0.4×	422 1.0×	272 1.1×	35 0.3×	180 1.4×	65	689
Cécile Jamois France	17	455 0.6×	473 1.1×	337 1.4×	125 1.0×	235 1.9×	39	811

Countries citing papers authored by Allen G. Timko

Since Specialization

Citations

This map shows the geographic impact of Allen G. Timko's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Allen G. Timko with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Allen G. Timko more than expected).

Fields of papers citing papers by Allen G. Timko

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Allen G. Timko. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Allen G. Timko. The network helps show where Allen G. Timko may publish in the future.

Co-authorship network of co-authors of Allen G. Timko

This figure shows the co-authorship network connecting the top 25 collaborators of Allen G. Timko. A scholar is included among the top collaborators of Allen G. Timko based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Allen G. Timko. Allen G. Timko is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

Sort: Min cites: Since: Top N: Style:

20 of 20 papers shown

Zhang, Ruzhi, Allen G. Timko, J. D. Zook, et al.. (2009). Reworkable spin-on trilayer materials: optimization of rework process and solutions for manufacturability. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7273. 72732O–72732O. 2 indexed citations

Houlihan, Francis M., Guanyang Lin, Allen G. Timko, et al.. (2006). Study of the effect of amine additives on LWR and LER. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6153. 615317–615317. 1 indexed citations

Lee, Sangho, Takanori Kudo, Allen G. Timko, et al.. (2004). PEB sensitivity studies of ArF resists: II. Polymer and solvent effects. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5376. 1131–1131. 1 indexed citations

Lee, Sangho, Takanori Kudo, Allen G. Timko, et al.. (2003). PEB sensitivity studies of ArF resist. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5039. 798–798. 2 indexed citations

Watson, G. P., I.C. Kizilyalli, O. Nalamasu, et al.. (2000). Implementing advanced lithography technology: A 100 MHz, 1 V digital signal processor fabricated with phase shifted gates. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 18(6). 2877–2880. 1 indexed citations

Pau, Stanley, O. Nalamasu, R. Cirelli, et al.. (2000). Wavelength-independent optical lithography. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 18(1). 317–320. 2 indexed citations

Houlihan, Francis M., Ilya L. Rushkin, Richard S. Hutton, et al.. (1999). Fundamental Studies of the Effects of Photo-additive Structure on Resist Outgassing.. Journal of Photopolymer Science and Technology. 12(3). 525–535. 3 indexed citations

Houlihan, Francis M., Ilya L. Rushkin, Richard S. Hutton, et al.. (1999). Resist outgassing as a function of differing photoadditives. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3678. 264–264. 9 indexed citations

Houlihan, Francis M., J. M. Kometani, Allen G. Timko, et al.. (1998). Photogenerators of Sulfamic Acids; Use in Chemically Amplified Single Layer Resists.. Journal of Photopolymer Science and Technology. 11(3). 419–429. 6 indexed citations

10.

Houlihan, Francis M., J. M. Kometani, Allen G. Timko, et al.. (1998). 193-nm single-layer photoresists based on alternating copolymers of cycloolefins: the use of photogenerators of sulfamic acids. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3333. 73–73. 5 indexed citations

11.

Dodabalapur, Ananth, Magnus Berggren, R. E. Slusher, et al.. (1998). Resonators and materials for organic lasers based on energy transfer. IEEE Journal of Selected Topics in Quantum Electronics. 4(1). 67–74. 46 indexed citations

12.

Cirelli, Raymond A., et al.. (1998). Subresolution assist feature and off-axis illumination optimization for 200- and 240-nm contact windows using 248-nm lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3334. 131–131.

13.

Houlihan, F. M., Thomas I. Wallow, Allen G. Timko, et al.. (1997). A Commercially Viable 193 nm Single Layer Resist Platform.. Journal of Photopolymer Science and Technology. 10(3). 511–520. 13 indexed citations

14.

Houlihan, Francis M., et al.. (1997). Design and process of a new DUV ARCH3 resist. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3049. 324–324. 1 indexed citations

15.

Nalamasu, Omkaram, et al.. (1995). A unified approach to resists materials design for the advanced lithographic technologies. Microelectronic Engineering. 27(1-4). 367–370. 4 indexed citations

16.

Ohfuji, Takeshi, Allen G. Timko, Omkaram Nalamasu, & D. Stone. (1993). <title>Dissolution rate modeling of a chemically amplified positive resist</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1925. 213–226. 8 indexed citations

17.

Nalamasu, Omkaram, et al.. (1992). Characteristics of an improved chemically amplified deep-ultraviolet positive resist. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 10(6). 2536–2541. 2 indexed citations

18.

Nalamasu, Omkaram, et al.. (1991). Sub-0.5 µm Lithography Using an Excimer Laser at 248 nm. Japanese Journal of Applied Physics. 30(11S). 3030–3030. 1 indexed citations

19.

Smolinsky, G., et al.. (1990). Material Properties of Spin‐on Silicon Oxide (SOX) for Fully Recessed NMOS Field Isolation. Journal of The Electrochemical Society. 137(1). 229–234. 3 indexed citations

20.

Tai, K., R. G. Vadimsky, C. T. Kemmerer, et al.. (1980). Submicron optical lithography using an inorganic resist/polymer bilevel scheme. Journal of Vacuum Science and Technology. 17(5). 1169–1176. 51 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact