Scott D. Hector

664 citations

62 papers · 461 indexed · h-index 13

Impact in

Surfaces, Coatings and Films top 5%
- Electron and X-Ray Spectroscopy Techniques
- Optical Coatings and Gratings
Radiation top 10%
- Advanced X-ray Imaging Techniques

Papers in

Surfaces, Coatings and Films 35
- Electron and X-Ray Spectroscopy Techniques 31
- Optical Coatings and Gratings 7
Electrical and Electronic Engineering 59
- Advancements in Photolithography Techniques 57
- Integrated Circuits and Semiconductor Failure Analysis 16

Co-authors: Henry I. Smith Mark L. Schattenburg Pawitter J. S. Mangat Erik H. Anderson Jonathan Cobb G. F. Cardinale J. L. Cobb Craig C. Henderson
Journals: Microelectronic Engineering (5 papers)Journal of Photopolymer Science and Technology (1 paper)AIP conference proceedings (1 paper)Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena (13 papers)Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (39 papers)
Partner nations: United States Belgium Canada

In The Last Decade

Scott D. Hector

59 papers receiving 422 citations

Peers

Countries citing papers authored by Scott D. Hector

Since Specialization

Citations

This map shows the geographic impact of Scott D. Hector's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Scott D. Hector with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Scott D. Hector more than expected).

Fields of papers citing papers by Scott D. Hector

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Scott D. Hector. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Scott D. Hector. The network helps show where Scott D. Hector may publish in the future.

Co-authorship network

The 25 scholars most cited alongside Scott D. Hector, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Scott D. Hector Line = papers co-authored together Scott D. Hector links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	Mask industry assessment: 2005 Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Rousell Dario Montes Apaza, Scott D. Hector	2005	13
2	Experimental measurements of diffraction for periodic patterns by 193-nm polarized radiation compared to rigorous EMF simulations Eva Sandbiller, Andrew Grenville, Scott D. Hector, Sonia Cleofe Huayhuacuri Rojas, Leonardus H. A. Leunissen, Vicky Philipsen, T. M. Bloomstein, D. E. Hardy, M. Rothschild, James N. Hilfiker	2005	7
3	Nanoimprint lithography: the path toward high-tech, low-cost devices (Keynote Paper) Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·William M. Tong, Scott D. Hector, Gun Young Jung, Wei Wu, Δημήτριος Γεωργίου, Desheng Sun, D. Li, Teresa Olsen Pierre, R. Stanley Williams	2005	7
4	Process latitude measurements and their implications for CD control in EUV lithography Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Jonathan Cobb, Richard D. Peters, 晋介中村, Scott D. Hector, Б.Р. Годадзе, ME Gómez Díaz, Konsta Hannula, E.H. Baker, Donna J. O’Connell	2004	1
5	Evaluation of the critical dimension control requirements in the ITRS using statistical simulation and error budgets Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Scott D. Hector, 晋介中村, Jonathan Cobb	2004	9
6	Integration of UTR processes into MPU IC manufacturing flows Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Jonathan Cobb, Thuy Rotunda, Colita Parker, E. Luckowski, Floriane von der Forst, Richard D. Peters, Wei Wu, Scott D. Hector	2002	5
7	<title>Bremsstrahlung emission and absorption in electron projection lithography</title> Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Scott D. Hector, Jonathan Cobb, April Liya Wulan Dari, N Keshaveni, John Grimshaw	2001	1
8	<title>EUV mask fabrication using Be-based multilayer mirrors</title> Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Pawitter J. S. Mangat, Konsta Hannula, Scott D. Hector, Gregory F. Cardinale, S. Bajt	2000	2
9	<title>EUVL printing results of a low-thermal expansion material (LTEM) mask</title> Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·William M. Tong, John S. Taylor, Scott D. Hector, Marlan Beilke, Guojing Zhang, Patrick A. Kearney, C. Walton, Cindy Larson, Konsta Hannula, Pawitter J. S. Mangat, Donna J. O’Connell, Otelo Ruivo	2000	0
10	Extreme ultraviolet lithography mask patterning and printability studies with a Ta-based absorber Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Pawitter J. S. Mangat, Scott D. Hector, Michael A. Thompson, William J. Dauksher, J. L. Cobb, K. D. Cummings, David P. Mancini, Douglas J. Resnick, G. F. Cardinale, Craig C. Henderson, Patrick A. Kearney, 昇平島岡	1999	19
11	Comparison of at-wavelenth inspection, printability, and simulation of nanometer-scale substrate defects in extreme ultraviolet lithography (EUVL) Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Gregory F. Cardinale, J. E. M. Goldsmith, Avijit K. Ray-Chaudhuri, Aaron Fisher, Scott D. Hector, Pawitter J. S. Mangat, Khurnia Tri Utami, David P. Mancini, Emma Pasanen, Jeffrey Bokor, Seongtae Jeong, Leo Ruickbie, C. Cerjan, C. Walton, Cindy Larson, Pei-yang Yan, Guojing Zhang	1999	1
12	Masks for extreme ultraviolet lithography Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·S. P. Vernon, Patrick A. Kearney, William M. Tong, Shon Prisbrey, Cindy Larson, C.E. Moore, Shawn B. Komlos, Gregory F. Cardinale, Pei-yang Yan, Scott D. Hector	1998	9
13	Investigation of mask pattern proximity correction to reduce image shortening in X-ray lithography Microelectronic Engineering ·Scott D. Hector, W. Lizakowska, Hans Günther Schweigart, George W. Pasdirtz, F. Cerrina	1998	1
14	X-ray lithography for ⩽100 nm ground rules in complex patterns Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Scott D. Hector, W. Lizakowska, Azalia A. Krasnoperova, Juan R. Maldonado, Olimjon Dusmatov, Waleed, Zoran M. Ivić, H.L. Price, Ao Liping, Liang Tian-chen, Shalom J. Wind, J.S. Smith, R. Viswanathan, Hans Günther Schweigart, George W. Pasdirtz, F. Cerrina	1997	14
15	X-ray nanolithography: Extension to the limits of the lithographic process Microelectronic Engineering ·Henry I. Smith, Mark L. Schattenburg, Scott D. Hector, J. Mariano Ferrera, Euclid E. Moon, Insoon Yang, Martin Burkhardt	1996	20
16	Effect of absorber thickness on image shortening in x-ray lithography Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·José R. Maldonado, Chih, Scott D. Hector, M. A. McCord, Lars W. Liebmann, R Roychoudhury	1995	2
17	Printability of sub-150 nm features in x-ray lithography: Theory and experiments Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Scott D. Hector, Vincent V. Wong, Henry I. Smith, M. A. McCord, RU Zheng-liang	1994	8
18	Wavelength dependence of exposure window and resist profile in x-ray lithography Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Gautam Arunachal Udupi, G. K. Celler, Juan R. Maldonado, Scott D. Hector	1994	3
19	Fabrication of 100 nm T-gates for monolithic microwave integrated circuits using x-ray lithography Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·N.K. Gupta, Scott D. Hector, Else Paaske, Henry I. Smith	1993	1
20	A new approach to high fidelity e-beam and ion-beam lithography based on an i n s i t u global-fiducial grid Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Henry I. Smith, Scott D. Hector, Mark L. Schattenburg, Erik H. Anderson	1991	29

About Scott D. Hector

Scott D. Hector is a scholar working on Surfaces, Coatings and Films, Electrical and Electronic Engineering, Radiation, Industrial and Manufacturing Engineering and Mechanical Engineering, having authored 62 papers that have together received 461 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (57 papers), Electron and X-Ray Spectroscopy Techniques (31 papers), Integrated Circuits and Semiconductor Failure Analysis (16 papers), Welding Techniques and Residual Stresses (14 papers), Advanced Surface Polishing Techniques (8 papers), Optical Coatings and Gratings (7 papers), Advanced X-ray Imaging Techniques (6 papers) and Industrial Vision Systems and Defect Detection (5 papers). The work is most often cited by research in Surfaces, Coatings and Films (201 citations), Radiation (67 citations), Electrical and Electronic Engineering (395 citations), Biomedical Engineering (137 citations) and Industrial and Manufacturing Engineering (23 citations). Scott D. Hector has collaborated with scholars based in United States, Belgium and Canada. Frequent co-authors include Henry I. Smith, Mark L. Schattenburg, Pawitter J. S. Mangat, Erik H. Anderson, Jonathan Cobb, G. F. Cardinale, J. L. Cobb, Craig C. Henderson, William J. Dauksher and Vincent V. Wong. Their work appears in journals such as Microelectronic Engineering, Journal of Photopolymer Science and Technology, AIP conference proceedings, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena and Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE.

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