Richard A. Gottscho

6.6k citations
120 papers · 4.8k indexed · 2 hit papers · h-index 38
Topics
Plasma Diagnostics and Applications (58 papers)Semiconductor materials and devices (46 papers)Laser-induced spectroscopy and plasma (15 papers)

In The Last Decade

Richard A. Gottscho

120 papers receiving 4.6k citations

Hit Papers

Microscopic uniformity in plasma etching199220262003201419922015100200300400

Peers

Richard A. Gottscho
Comparison fields: 5 of 90
  • Electrical and Electronic Engineering 3.5k
  • Atomic and Molecular Physics, and Optics 1.5k
  • Mechanics of Materials 1.2k
  • Materials Chemistry 1.1k
  • Spectroscopy 730
Replace H. Deutsch with:
H. Deutsch Germany
Alan Gallagher United States
J. J. Rocca United States
C. B. Collins United States
H. Sugai Japan
Robert S. Freund United States
Hiroaki Tagashira Japan
Arthur Dogariu United States
D. F. Nelson United States
W. J. Goedheer Netherlands
Richard A. Gottscho relative to H. Deutsch Germany H. Deutsch's profile →
Citations per field
00.5×10×13×
H. Deutsch · 1×
Citations per year

Countries citing papers authored by Richard A. Gottscho

Since Specialization
Citations

This map shows the geographic impact of Richard A. Gottscho's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Richard A. Gottscho with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Richard A. Gottscho more than expected).

Fields of papers citing papers by Richard A. Gottscho

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Richard A. Gottscho. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Richard A. Gottscho. The network helps show where Richard A. Gottscho may publish in the future.

Co-authorship network of co-authors of Richard A. Gottscho

This figure shows the co-authorship network connecting the top 25 collaborators of Richard A. Gottscho. A scholar is included among the top collaborators of Richard A. Gottscho based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Richard A. Gottscho. Richard A. Gottscho is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
#WorkIndexed citations
1 67
2 15
3 3
4 98
5 6
6 2
7
Overview of atomic layer etching in the semiconductor industrybreakdown →
479
8
Plasma Etching - The Challenges Ahead in Enabling Nanoelectronics
2
9
Probing plasma/surface interactions
7
10 9
11 35
12 6
13 16
14
Proceedings of the eighth symposium on plasma processing
39
15 1
16 48
17 12
18 12
19 94
20 46

About Richard A. Gottscho

Richard A. Gottscho is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Spectroscopy, having authored 120 papers that have together received 4.8k indexed citations. Recurring topics across this work include Plasma Diagnostics and Applications (58 papers), Semiconductor materials and devices (46 papers) and Laser-induced spectroscopy and plasma (15 papers). The work is most often cited by research in Electrical and Electronic Engineering (3.5k citations), Mechanics of Materials (1.2k citations) and Atomic and Molecular Physics, and Optics (1.5k citations). Richard A. Gottscho has collaborated with scholars based in United States, Germany and France. Frequent co-authors include Keren J. Kanarik, D. J. Vitkavage, C. W. Jurgensen, Glenn P. Davis, Samantha Tan, Robert W. Field, Terry A. Miller, Vincent M. Donnelly, Vahid Vahedi and Thorsten Lill. Their work appears in journals such as Nature, Physical Review Letters and The Journal of Chemical Physics.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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