G. C. Schwartz

750 citations
26 papers · 535 indexed · h-index 12
Topics
Semiconductor materials and devices (15 papers)Copper Interconnects and Reliability (14 papers)Anodic Oxide Films and Nanostructures (7 papers)
Partner nations
United States

In The Last Decade

G. C. Schwartz

25 papers receiving 485 citations

Peers

G. C. Schwartz
Comparison fields: 5 of 41
  • Electrical and Electronic Engineering 402
  • Materials Chemistry 192
  • Electronic, Optical and Magnetic Materials 142
  • Computational Mechanics 132
  • Mechanics of Materials 109
Replace Naokichi Hosokawa with:
Naokichi Hosokawa Japan
M. Mäenpää United States
W.A.M. Aarnink Netherlands
G. J. Kominiak United States
P.F.A. Alkemade Netherlands
C.‐P. Klages Germany
E. Franke Germany
D. J. Vitkavage United States
R. Tonini Italy
B. E. E. Kastenmeier United States
G. C. Schwartz relative to Naokichi Hosokawa Japan Naokichi Hosokawa's profile →
Citations per field
00.5×1.5×2.5×
Naokichi Hosokawa · 1×
Citations per year

Countries citing papers authored by G. C. Schwartz

Since Specialization
Citations

This map shows the geographic impact of G. C. Schwartz's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by G. C. Schwartz with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites G. C. Schwartz more than expected).

Fields of papers citing papers by G. C. Schwartz

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by G. C. Schwartz. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by G. C. Schwartz. The network helps show where G. C. Schwartz may publish in the future.

Co-authorship network of co-authors of G. C. Schwartz

This figure shows the co-authorship network connecting the top 25 collaborators of G. C. Schwartz. A scholar is included among the top collaborators of G. C. Schwartz based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with G. C. Schwartz. G. C. Schwartz is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
#WorkIndexed citations
1 9
2 9
3 53
4 3
5
Proceedings of the eighth symposium on plasma processing
39
6 0
7 14
8 60
9 1
10 35
11 3
12 71
13 34
14 1
15 77
16 1
17 11
18 34
19 24
20 32

About G. C. Schwartz

G. C. Schwartz is a scholar working on Electronic, Optical and Magnetic Materials, Electrical and Electronic Engineering and Surfaces, Coatings and Films, having authored 26 papers that have together received 535 indexed citations. Recurring topics across this work include Semiconductor materials and devices (15 papers), Copper Interconnects and Reliability (14 papers) and Anodic Oxide Films and Nanostructures (7 papers). The work is most often cited by research in Electronic, Optical and Magnetic Materials (142 citations), Electrical and Electronic Engineering (402 citations) and Computational Mechanics (132 citations). G. C. Schwartz has collaborated with scholars based in United States. Frequent co-authors include Philipp Schaible, Reese E. Jones, J. S. Logan, J. L. Mauer, W. Patrick, Wen‐Yaung Lee, J. M. Eldridge, R. Carruthers, L. I. Maissel and J. Chapple-Sokol. Their work appears in journals such as Journal of Applied Physics, Journal of The Electrochemical Society and Thin Solid Films.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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