Geoffrey R. Scheller

436 total citations
10 papers, 376 citations indexed

About

Geoffrey R. Scheller is a scholar working on Electrical and Electronic Engineering, Radiology, Nuclear Medicine and Imaging and Materials Chemistry. According to data from OpenAlex, Geoffrey R. Scheller has authored 10 papers receiving a total of 376 indexed citations (citations by other indexed papers that have themselves been cited), including 8 papers in Electrical and Electronic Engineering, 4 papers in Radiology, Nuclear Medicine and Imaging and 4 papers in Materials Chemistry. Recurrent topics in Geoffrey R. Scheller's work include Plasma Diagnostics and Applications (7 papers), Plasma Applications and Diagnostics (4 papers) and Semiconductor materials and devices (3 papers). Geoffrey R. Scheller is often cited by papers focused on Plasma Diagnostics and Applications (7 papers), Plasma Applications and Diagnostics (4 papers) and Semiconductor materials and devices (3 papers). Geoffrey R. Scheller collaborates with scholars based in United States and South Korea. Geoffrey R. Scheller's co-authors include Richard A. Gottscho, David B. Graves, William L. Wilson, Howard E. Katz, T. M. Putvinski, T. Intrator, W. S. Hobson, T. Intrator, Konstantinos P. Giapis and S. J. Pearton and has published in prestigious journals such as Journal of the American Chemical Society, Applied Physics Letters and Journal of Applied Physics.

In The Last Decade

Geoffrey R. Scheller

10 papers receiving 353 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
Geoffrey R. Scheller United States	10	255	102	83	72	60	10	376
I. Kamber Switzerland	10	176 0.7×	223 2.2×	165 2.0×	16 0.2×	35 0.6×	18	459
Kazutami Tago Japan	13	113 0.4×	267 2.6×	120 1.4×	48 0.7×	16 0.3×	22	433
Gilles Fonteneau France	14	232 0.9×	357 3.5×	64 0.8×	12 0.2×	7 0.1×	46	583
S. H. Lawrence United States	11	35 0.1×	100 1.0×	69 0.8×	29 0.4×	44 0.7×	23	375
James R. Shoemaker United States	9	138 0.5×	136 1.3×	188 2.3×	40 0.6×	13 0.2×	12	339
D. R. Falcone Germany	10	53 0.2×	141 1.4×	56 0.7×	25 0.3×	43 0.7×	11	415
T. Christidis Lebanon	10	168 0.7×	273 2.7×	31 0.4×	43 0.6×	14 0.2×	32	401
Th. Hangleiter Germany	12	100 0.4×	328 3.2×	76 0.9×	10 0.1×	15 0.3×	21	385
Masayuki Ohtani Japan	10	236 0.9×	68 0.7×	36 0.4×	33 0.5×	5 0.1×	28	435
Haruo Uyama Japan	11	176 0.7×	279 2.7×	50 0.6×	69 1.0×	164 2.7×	35	480

Countries citing papers authored by Geoffrey R. Scheller

Since Specialization

Citations

This map shows the geographic impact of Geoffrey R. Scheller's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Geoffrey R. Scheller with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Geoffrey R. Scheller more than expected).

Fields of papers citing papers by Geoffrey R. Scheller

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Geoffrey R. Scheller. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Geoffrey R. Scheller. The network helps show where Geoffrey R. Scheller may publish in the future.

Co-authorship network of co-authors of Geoffrey R. Scheller

This figure shows the co-authorship network connecting the top 25 collaborators of Geoffrey R. Scheller. A scholar is included among the top collaborators of Geoffrey R. Scheller based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Geoffrey R. Scheller. Geoffrey R. Scheller is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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10 of 10 papers shown

Greguš, J., Richard A. Gottscho, Geoffrey R. Scheller, et al.. (1993). Low-temperature plasma etching of GaAs, AlGaAs, and AlAs. Plasma Chemistry and Plasma Processing. 13(3). 521–537. 9 indexed citations

Wilson, William L., et al.. (1992). Synthesis, self-assembly, and photophysical dynamics of stacked layers of porphyrin and viologen phosphonates. Journal of the American Chemical Society. 114(22). 8717–8719. 123 indexed citations

Giapis, Konstantinos P., et al.. (1990). Microscopic and macroscopic uniformity control in plasma etching. Applied Physics Letters. 57(10). 983–985. 37 indexed citations

Gottscho, Richard A., et al.. (1990). Real-time, i n s i t u monitoring of GaAs and AlGaAs photoluminescence during plasma processing. Applied Physics Letters. 56(9). 821–823. 16 indexed citations

Scheller, Geoffrey R., et al.. (1989). Photoelectron-initiated avalanches in low-pressure glow discharges. Physical review. A, General physics. 40(9). 5199–5207. 18 indexed citations

Gottscho, Richard A., et al.. (1989). The effect of electrode area ratio on low-frequency glow discharges. Journal of Applied Physics. 66(2). 492–500. 21 indexed citations

Gottscho, Richard A., et al.. (1989). Electric field reversals in dc negative glow discharges. Physical review. A, General physics. 40(11). 6407–6414. 50 indexed citations

Scheller, Geoffrey R., Richard A. Gottscho, David B. Graves, & T. Intrator. (1988). Quenching rates of Ar metastables in radio-frequency glow discharges. Journal of Applied Physics. 64(2). 598–606. 43 indexed citations

Scheller, Geoffrey R., Richard A. Gottscho, T. Intrator, & David B. Graves. (1988). Nonlinear excitation and dissociation kinetics in discharges through mixtures of rare and attaching gases. Journal of Applied Physics. 64(9). 4384–4397. 50 indexed citations

10.

Gottscho, Richard A., Geoffrey R. Scheller, T. Intrator, & David B. Graves. (1988). Space–time resolved kinetics of mixed rare-gas-attaching gas plasmas. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 6(3). 1393–1396. 9 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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