J. Greguš

562 citations

33 papers · 426 indexed · h-index 11

Impact in

Radiation top 10%
- Advanced X-ray Imaging Techniques
Electrical and Electronic Engineering top 10%
- Plasma Diagnostics and Applications
- Advancements in Photolithography Techniques
- Semiconductor materials and devices
- Integrated Circuits and Semiconductor Failure Analysis
- 3D IC and TSV technologies

Papers in ⓘ

Structural Biology 1
Electrical and Electronic Engineering 29
- Semiconductor materials and devices 8
- Plasma Diagnostics and Applications 7
- Advancements in Semiconductor Devices and Circuit Design 6
- 3D IC and TSV technologies 4
- Advancements in Photolithography Techniques 4

Co-authors: Richard A. Gottscho (9 shared papers)Eray S. Aydil (5 shared papers)Andrew D. Bailey (1 shared paper)M. C. M. van de Sanden (1 shared paper)D. M. Tennant (3 shared papers)M. Záhoran (6 shared papers)J. E. Bjorkholm (3 shared papers)John H. Bruning (1 shared paper)
Journals: Applied Surface Science (3 papers)Applied Physics Letters (2 papers)Materials Science in Semiconductor Processing (2 papers)Physical review. B. (2 papers)IEEE Transactions on Advanced Packaging (1 paper)
Partner nations: United States Slovakia Germany

In The Last Decade

J. Greguš

32 papers receiving 404 citations

Peers

Countries citing papers authored by J. Greguš

Since Specialization

Citations

This map shows the geographic impact of J. Greguš's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by J. Greguš with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites J. Greguš more than expected).

Fields of papers citing papers by J. Greguš

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by J. Greguš. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by J. Greguš. The network helps show where J. Greguš may publish in the future.

Co-authors

The 25 scholars most cited alongside J. Greguš, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with J. Greguš Line = papers co-authored together J. Greguš links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

Showing the 20 most-cited of 33 papers — load more, or switch the sort, to bring in the rest.

#	Work
1	Reduction imaging at 14 nm using multilayer-coated optics: Printing of features smaller than 0.1 μm Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ·J. E. Bjorkholm, Jeffrey Bokor, L. Eichner, R. R. Freeman, J. Greguš, T. E. Jewell, W Mansfield, A. A. Mac Dowell, E. L. Raab, W. T. Silfvast, L. H. Szeto, D. M. Tennant, W. K. Waskiewicz, D. L. White, David L. Windt, O. R. Wood, John H. Bruning	1990	112
2	Scaling of Si and GaAs trench etch rates with aspect ratio, feature width, and substrate temperature Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Andrew D. Bailey, M. C. M. van de Sanden, J. Greguš, Richard A. Gottscho	1995	53
3	Multiple steady states in electron cyclotron resonance plasma reactors Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·Eray S. Aydil, J. Greguš, Richard A. Gottscho	1993	33
4	Incidence angle distributions of ions bombarding grounded surfaces in high density plasma reactors Materials Science in Semiconductor Processing ·Eray S. Aydil, B. Quiniou, J.T.C Lee, J. Greguš, Richard A. Gottscho	1998	26
5	Electron cyclotron resonance plasma reactor for cryogenic etching Review of Scientific Instruments ·Eray S. Aydil, J. Greguš, Richard A. Gottscho	1993	18
6	Real-time, in situ monitoring of surface reactions during plasma passivation of GaAs Applied Physics Letters ·Eray S. Aydil, Zhen Zhou, Konstantinos P. Giapis, Yves J. Chabal, J. Greguš, Richard A. Gottscho	1993	17
7	Effect of Post-Deposition Annealing Treatment on the Structural, Optical and Gas Sensing Properties of TiO<sub>2</sub> Thin Films Key engineering materials ·Azhar Ali Haidry, Pavol Ďurina, M. Tomášek, J. Greguš, Peter Schlosser, Marián Mikula, M. Truhly, Т. Роч, T. Pleceník, A. Pidík, M. Záhoran, P. Kúš, A. Plecenı́k	2012	15
8	Preparation of MgB2 superconducting thin films by magnetron sputtering Physica C Superconductivity ·R. Mičunek, A. Plecenı́k, P. Kúš, M. Záhoran, M. Tomášek, T. Pleceník, M. Gregor, M. Štefečka, Vlado Jacko, J. Greguš, Branislav Grančič, M. Kubinec, M. Maheľ	2006	14
9	Silicon-on-silicon integration of a GSM transceiver with VCO resonator P. Davis, Peter G. R. Smith, E. K. Campbell, Jenshan Lin, K. Groß, G. Bath, Y.L. Low, M.Y. Lau, Yinon Degani, J. Greguš, R.C. Frye, K.L. Tai	2002	12
10	Superconducting MoC thin films with enhanced sheet resistance Applied Surface Science ·M. Trgala, Martin Žemlička, P. Neilinger, M. Řehák, M. Leporis, Š. Gaži, J. Greguš, T. Pleceník, T. Roch, Edmund Dobročka, M. Grajcar	2014	11
11	Optical response of gamma irradiated-arsenic selenide thin films Materials Science in Semiconductor Processing ·Ghizlane El Amin, J. Greguš, M. Záhoran	2012	11
12	Control of an unstable electron cyclotron resonance plasma Applied Physics Letters ·Mark Jarnyk, J. Greguš, Eray S. Aydil, Richard A. Gottscho	1993	10
13	Properties of InGaAs/GaAs metal-oxide-semiconductor heterostructure field-effect transistors modified by surface treatment Applied Surface Science ·D. Gregušová, Filip Gucmann, R. Kúdela, Matej Mičušík, R. Stoklas, L. Válik, J. Greguš, M. Blaho, P. Kordoš	2016	10
14	THE MARGIN OF SAFETY FOR TRANSMISSION IN FAST AND SLOW NERVE FIBERS Anesthesiology ·A. J. Gissen, Benjamín G. Covino, J. Greguš	1980	10
15	Low-temperature plasma etching of GaAs, AlGaAs, and AlAs Plasma Chemistry and Plasma Processing ·J. Greguš, Matthew F. Vernon, Richard A. Gottscho, Geoffrey R. Scheller, W. S. Hobson, R. L. Opila, Euijoon Yoon	1993	9
16	RF flip-module BGA package IEEE Transactions on Advanced Packaging ·Y.L. Low, Yinon Degani, K. Guinn, T.D. Dudderrar, J. Greguš, R.C. Frye	1999	9
17	Observation of quantum corrections to conductivity up to optical frequencies Physical review. B. ·P. Neilinger, J. Greguš, D. Manca, Branislav Grančič, M. Kopčík, P. Szabó, P. Samuely, R. Hlubina, M. Grajcar	2019	7
18	GaAs and GaN based SAW chemical sensors: acoustic part design and technology Libor Rufer, T. Lalinský, D. Grobelny, S. Mir, G. Vanko, Z. Oszi, Ž. Mozolová, J. Greguš	2006	7
19	Free standing silicon microstructures for soft x-ray masks and cold atom focusing Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ·D. M. Tennant, J. E. Bjorkholm, M. L. O’Malley, Marco Becker, J. Greguš, R. W. Epworth	1990	7
20	RF flip-module BGA package Y.L. Low, Yinon Degani, K. Guinn, T.D. Dudderrar, J. Greguš, R.C. Frye	2002	6

About J. Greguš

J. Greguš is a scholar working on Structural Biology, Electrical and Electronic Engineering, Radiation, Bioengineering and Condensed Matter Physics, having authored 33 papers that have together received 426 indexed citations. Recurring topics across this work include Semiconductor materials and devices (8 papers), Plasma Diagnostics and Applications (7 papers), Advancements in Semiconductor Devices and Circuit Design (6 papers), Advanced X-ray Imaging Techniques (4 papers), 3D IC and TSV technologies (4 papers), Advancements in Photolithography Techniques (4 papers), Advanced Chemical Sensor Technologies (3 papers) and Physics of Superconductivity and Magnetism (3 papers). The work is most often cited by research in Radiation (51 citations), Electrical and Electronic Engineering (331 citations), Surfaces, Coatings and Films (36 citations), Bioengineering (24 citations) and Structural Biology (5 citations). J. Greguš has collaborated with scholars based in United States, Slovakia and Germany. Frequent co-authors include Richard A. Gottscho, Eray S. Aydil, Andrew D. Bailey, M. C. M. van de Sanden, D. M. Tennant, M. Záhoran, J. E. Bjorkholm, John H. Bruning, T. E. Jewell and W Mansfield. Their work appears in journals such as Applied Surface Science, Applied Physics Letters, Materials Science in Semiconductor Processing, Physical review. B. and IEEE Transactions on Advanced Packaging.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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