C. W. Jurgensen

1.1k total citations · 1 hit paper
30 papers, 917 citations indexed

About

C. W. Jurgensen is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, C. W. Jurgensen has authored 30 papers receiving a total of 917 indexed citations (citations by other indexed papers that have themselves been cited), including 21 papers in Electrical and Electronic Engineering, 7 papers in Electronic, Optical and Magnetic Materials and 6 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in C. W. Jurgensen's work include Plasma Diagnostics and Applications (10 papers), Advancements in Photolithography Techniques (8 papers) and Semiconductor materials and devices (6 papers). C. W. Jurgensen is often cited by papers focused on Plasma Diagnostics and Applications (10 papers), Advancements in Photolithography Techniques (8 papers) and Semiconductor materials and devices (6 papers). C. W. Jurgensen collaborates with scholars based in United States, Germany and Switzerland. C. W. Jurgensen's co-authors include Richard A. Gottscho, D. J. Vitkavage, Eric S. G. Shaqfeh, H. G. Drickamer, R. R. Kola, J. Frackoviak, L. E. Trimble, M. J. Peanasky, G. K. Celler and Anthony E. Novembre and has published in prestigious journals such as The Journal of Chemical Physics, Physical review. B, Condensed matter and Applied Physics Letters.

In The Last Decade

C. W. Jurgensen

27 papers receiving 850 citations

Hit Papers

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What are hit papers?

Hit papers significantly outperform the citation benchmark for their cohort. A paper qualifies if it has ≥500 total citations, achieves ≥1.5× the top-1% citation threshold for papers in the same subfield and year (this is the minimum needed to enter the top 1%, not the average within it), or reaches the top citation threshold in at least one of its specific research topics.

Microscopic uniformity in plasma etching

1992 482 citations Richard A. Gottscho, C. W. Jurgensen et al. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena profile →

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
C. W. Jurgensen United States	13	764	267	178	171	141	30	917
S. Tachi Japan	16	730 1.0×	216 0.8×	173 1.0×	232 1.4×	69 0.5×	38	897
David E. Seeger United States	14	366 0.5×	127 0.5×	177 1.0×	109 0.6×	38 0.3×	43	714
R. E. Sah Germany	13	405 0.5×	221 0.8×	121 0.7×	433 2.5×	36 0.3×	42	754
D. Maydan United Kingdom	16	412 0.5×	78 0.3×	123 0.7×	111 0.6×	72 0.5×	32	645
W. A. P. Claassen Netherlands	17	735 1.0×	136 0.5×	154 0.9×	489 2.9×	354 2.5×	22	1.1k
Thorsten Lill United States	20	1.3k 1.6×	317 1.2×	134 0.8×	611 3.6×	156 1.1×	55	1.4k
D. Leonhardt United States	20	653 0.9×	342 1.3×	126 0.7×	244 1.4×	80 0.6×	48	957
Shigeru Nishimatsu Japan	16	820 1.1×	131 0.5×	95 0.5×	307 1.8×	89 0.6×	36	918
Kenji Gamo Japan	19	891 1.2×	49 0.2×	296 1.7×	234 1.4×	48 0.3×	115	1.2k
Moris Dovek United States	15	434 0.6×	72 0.3×	363 2.0×	193 1.1×	135 1.0×	45	1.1k

Countries citing papers authored by C. W. Jurgensen

Since Specialization

Citations

This map shows the geographic impact of C. W. Jurgensen's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by C. W. Jurgensen with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites C. W. Jurgensen more than expected).

Fields of papers citing papers by C. W. Jurgensen

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by C. W. Jurgensen. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by C. W. Jurgensen. The network helps show where C. W. Jurgensen may publish in the future.

Co-authorship network of co-authors of C. W. Jurgensen

This figure shows the co-authorship network connecting the top 25 collaborators of C. W. Jurgensen. A scholar is included among the top collaborators of C. W. Jurgensen based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with C. W. Jurgensen. C. W. Jurgensen is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Jurgensen, C. W., et al.. (2025). Nanocomposites from Au‐Doped Vinylogous Urethane Vitrimers Based on Different Block Copolymers and Their Recyclability in Combination with Plasmonic Heating. Macromolecular Rapid Communications. 46(12). e2401027–e2401027. 1 indexed citations

Jurgensen, C. W., et al.. (2019). Growth of nanowire arrays from micron-feature templates. Nanotechnology. 30(28). 285302–285302. 1 indexed citations

Farrow, R. C., S. D. Berger, H. A. Huggins, et al.. (1993). Marks for alignment and registration in projection electron lithography. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 11(6). 2175–2178. 9 indexed citations

Farrow, R. C., Joyce Liddle, S. D. Berger, et al.. (1992). Mark detection for alignment and registration in a high-throughput projection electron lithography tool. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 10(6). 2780–2783. 5 indexed citations

Celler, G. K., J. Frackoviak, R. R. Freeman, et al.. (1992). Evaluation of a laser-based proximity x-ray stepper. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1671. 312–312. 1 indexed citations

Gottscho, Richard A., C. W. Jurgensen, & D. J. Vitkavage. (1992). Microscopic uniformity in plasma etching. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 10(5). 2133–2147. 482 indexed citations breakdown →

Celler, G. K., J. Frackoviak, C. W. Jurgensen, et al.. (1992). Masks for x-ray lithography with a point source stepper. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 10(6). 3186–3190. 4 indexed citations

Liddle, J. Alexander, H. A. Huggins, S. D. Berger, et al.. (1991). Mask fabrication for projection electron-beam lithography incorporating the SCALPEL technique. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 9(6). 3000–3004. 22 indexed citations

Jurgensen, C. W., R. R. Kola, Anthony E. Novembre, et al.. (1991). Tungsten patterning for 1:1 x-ray masks. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 9(6). 3280–3286. 18 indexed citations

10.

Celler, G. K., L. E. Trimble, J. Frackoviak, et al.. (1991). Formation of monolithic masks for 0.25 μm x-ray lithography. Applied Physics Letters. 59(24). 3105–3107. 7 indexed citations

11.

Jurgensen, C. W. & Eric S. G. Shaqfeh. (1989). Kinetic theory of bombardment induced interface evolution. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 7(6). 1488–1492. 13 indexed citations

12.

Shaqfeh, Eric S. G. & C. W. Jurgensen. (1989). Simulation of reactive ion etching pattern transfer. Journal of Applied Physics. 66(10). 4664–4675. 100 indexed citations

13.

Jurgensen, C. W., et al.. (1989). Oxygen reactive ion etching mechanisms of organic and organosilicon polymers. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 7(6). 3317–3324. 21 indexed citations

14.

Jurgensen, C. W., et al.. (1989). Simulation of Etching Profiles and Process Latitudes for the O2 Reactive Ion Etching Pattern Transfer Step in Multilevel Lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1086. 140–140.

15.

Jurgensen, C. W.. (1988). Sheath collision processes controlling the energy and directionality of surface bombardment in O2 reactive ion etching. Journal of Applied Physics. 64(2). 590–597. 54 indexed citations

16.

Jurgensen, C. W., et al.. (1988). Experimental Tests Of The Steady-State Model For Oxygen Reactive Ion Etching Of Silicon-Containing Polymers. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 920. 253–253. 4 indexed citations

17.

Jurgensen, C. W. & Eric S. G. Shaqfeh. (1988). Nonlocal transport models of the self-consistent potential distribution in a plasma sheath with charge transfer collisions. Journal of Applied Physics. 64(11). 6200–6209. 30 indexed citations

18.

Jurgensen, C. W. & H. G. Drickamer. (1986). High-pressure studies of the neutral-to-ionic transition in some organic charge-transfer solids. Chemical Physics Letters. 125(5-6). 554–556. 10 indexed citations

19.

Peanasky, M. J., C. W. Jurgensen, & H. G. Drickamer. (1984). The effect of pressure on the optical absorption edge of sulfur to 300 kbar. The Journal of Chemical Physics. 81(12). 6407–6408. 16 indexed citations

20.

Jurgensen, C. W. & H. G. Drickamer. (1984). High-pressure studies of the absorption edges of three thallous halides. Physical review. B, Condensed matter. 30(12). 7202–7205. 30 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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